Automated Oxygen Flow Titration to Maintain Constant Oxygenation

2012 ◽  
Vol 57 (8) ◽  
pp. 1254-1262 ◽  
Author(s):  
François Lellouche ◽  
Erwan L’Her
Keyword(s):  
2012 ◽  
Vol 106 (11) ◽  
pp. 1544-1550 ◽  
Author(s):  
Raúl Galera ◽  
Raquel Casitas ◽  
Elisabet Martínez ◽  
Vanesa Lores ◽  
Blas Rojo ◽  
...  

2020 ◽  
Vol 55 (11) ◽  
pp. 3180-3188
Author(s):  
Jean‐Michel Roué ◽  
Juliette Delpeut ◽  
Alix d‘Hennezel ◽  
Tess Tierrie ◽  
Audrey Barzic ◽  
...  

2013 ◽  
Vol 690-693 ◽  
pp. 1702-1706 ◽  
Author(s):  
Shuang Jun Nie ◽  
Hao Geng ◽  
Jun Bao Wang ◽  
Lai Sen Wang ◽  
Zhen Wei Wang ◽  
...  

NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emucm-3, which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.


2011 ◽  
Vol 110-116 ◽  
pp. 1094-1098
Author(s):  
Haleh Kangarlou ◽  
Mehdi Bahrami Gharahasanloo ◽  
Akbar Abdi Saray ◽  
Reza Mohammadi Gharabagh

Ti films of same thickness, and near normal deposition angle, and same deposition rate were deposited on glass substrates, at room temperature, under UHV conditions. Different annealing temperatures as 393K, 493K and 593K with uniform 8 cm3/sec, oxygen flow, were used for producing titanium oxide layers. Their nanostructures were determined by AFM and XRD methods. Roughness of the films changed due to annealing process. The gettering property of Ti and annealing temperature can play an important role in the nanostructure of the films.


1993 ◽  
Vol 76 (4) ◽  
pp. 915???917
Author(s):  
Toshiyuki Okutomi ◽  
Satoshi Watanabe ◽  
Fudo Goto

2004 ◽  
Vol 44 (1) ◽  
pp. L34-L37 ◽  
Author(s):  
Kazuo Satoh ◽  
Yoshiharu Kakehi ◽  
Akio Okamoto ◽  
Shuichi Murakami ◽  
Fumihiro Uratani ◽  
...  

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