scholarly journals Transferable micromachined piezoresistive force sensor with integrated double-meander-spring system

2017 ◽  
Vol 6 (1) ◽  
pp. 121-133 ◽  
Author(s):  
Gerry Hamdana ◽  
Maik Bertke ◽  
Lutz Doering ◽  
Thomas Frank ◽  
Uwe Brand ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
High Reliability ◽  
Three Dimensional ◽  
High Sensitivity ◽  
Force Sensor ◽  
Silicon On Insulator ◽  
Basic Material ◽  
Inductively Coupled ◽  
Sensor Properties ◽  
Micro Force Sensor

Abstract. A developed transferable micro force sensor was evaluated by comparing its response with an industrially manufactured device. In order to pre-identify sensor properties, three-dimensional (3-D) sensor models were simulated with a vertically applied force up to 1000 µN. Then, controllable batch fabrication was performed by alternately utilizing inductively coupled plasma (ICP) reactive ion etching (RIE) and photolithography. The assessments of sensor performance were based on sensor linearity, stiffness and sensitivity. Analysis of the device properties revealed that combination of a modest stiffness value (i.e., (8.19 ± 0.07) N m−1) and high sensitivity (i.e., (15.34 ± 0.14) V N−1) at different probing position can be realized using a meander-spring configuration. Furthermore, lower noise voltage is obtained using a double-layer silicon on insulator (DL-SOI) as basic material to ensure high reliability and an excellent performance of the sensor.

The Design of Three-Dimensional Vibration Sensor Based on SOI Microfabbrication

2010 ◽  
Vol 148-149 ◽  
pp. 152-156
Author(s):  
Gui Xiong Shi ◽  
Guo Jun Zhang ◽  
Jiao Xu ◽  
Xiao Yao Wang
Keyword(s):  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
High Sensitivity ◽  
Measurement Range ◽  
Low Noise ◽  
Vibration Sensor ◽  
Etching Depth ◽  
Inductively Coupled ◽  
Vibration Sensors ◽  
Micro Vibration

Compared with the traditional vibration sensors, the micro-vibration sensor have many advantages, such as small size, high sensitivity and low noise which is based on micro-fabbrication.This paper introduced the micro-vibration sensors which sensitive structure are cilium and micro-elastic beams. The micro-vibration sensors were produced by the inductively coupled plasma technology (ICP), the maximal etching depth of which can be greater than 300μm, the thickness of beam is less than 20μm and the longth of cilium are more than 3000um.The sensitivity of the sensor is 102.5μV/g, the measurement range to +20g, and the resonant frequency is 2KHz.

Research on PVDF Micro-Force Sensor

2014 ◽  
Vol 599-601 ◽  
pp. 1135-1138
Author(s):  
Chao Zhe Ma ◽  
Jin Song Du ◽  
Yi Yang Liu
Keyword(s):  
Power Dissipation ◽  
Polyvinylidene Fluoride ◽  
High Sensitivity ◽  
Force Sensor ◽  
Calibration Method ◽  
Pvdf Film ◽  
Force Sensors ◽  
Low Power Dissipation ◽  
Micro Force Sensor ◽  
Processing Circuit

At present, sub-micro-Newton (sub-μN) micro-force in micro-assembly and micro-manipulation is not able to be measured reliably. The piezoelectric micro-force sensors offer a lot of advantages for MEMS applications such as low power dissipation, high sensitivity, and easily integrated with piezoelectric micro-actuators. In spite of many advantages above, the research efforts are relatively limited compared to piezoresistive micro-force sensors. In this paper, Sensitive component is polyvinylidene fluoride (PVDF) and the research object is micro-force sensor based on PVDF film. Moreover, the model of micro-force and sensor’s output voltage is built up, signal processing circuit is designed, and a novel calibration method of micro-force sensor is designed to reliably measure force in the range of sub-μN. The experimental results show the PVDF sensor is designed in this paper with sub-μN resolution.

A REVERSIBLE OPTICAL SENSOR BASED ON CHITOSAN FILM FOR THE SELECTIVE DETECTION OF COPPER IONS

2012 ◽  
Vol 24 (05) ◽  
pp. 453-459 ◽  
Author(s):  
Shenhsiung Lin ◽  
Chia-Chen Chang ◽  
Chii-Wann Lin
Keyword(s):  
Functional Groups ◽  
Inductively Coupled Plasma ◽  
Copper Ions ◽  
Three Dimensional ◽  
Copper Ion ◽  
Chitosan Film ◽  
Detection Limits ◽  
Dimensional Structure ◽  
Optical Detectors ◽  
Inductively Coupled

Heavy metals greatly influence animal physiology, even at small doses. Among these metals, the copper ion is of great concern due to its effects on humans and wide applications in industry. Compared to atomic absorption spectroscopy and inductively coupled plasma-mass spectrometry, which destroy the samples that are analyzed, optical techniques do not decompose the analyte and have become a popular field of recent research. In this paper, we combined a novel optical detector that did not require sample-labeling, called surface plasmon resonance (SPR), with chitosan to detect copper ions by modifying the functional groups of chitosan through pH modification. Compared to other optical detectors, the SPR system was relatively fast and involved fewer experimental confounding factors. The three-dimensional structure of chitosan was used to obtain lower detection limits. Moreover, modification of the chitosan functional groups resulted in efficient regeneration by controlling the pH. A detection limit of 0.1 μM was obtained (linear range: 0.5–10 μM, R2 = 0.976), and the specificity was certified by comparing the copper ion with six other ions. Additionally, we successfully regenerated the SPR chips by modifying the functional groups. In conclusion, the chitosan–SPR system detected copper ions with improved detection limits using a quick and simple regeneration method.

scholarly journals Measurement of CeO2 Nanoparticles in Natural Waters Using a High Sensitivity, Single Particle ICP-MS

Molecules ◽  
2020 ◽  
Vol 25 (23) ◽  
pp. 5516
Author(s):  
Ibrahim Jreije ◽  
Agil Azimzada ◽  
Madjid Hadioui ◽  
Kevin J. Wilkinson
Keyword(s):  
Single Particle ◽  
Inductively Coupled Plasma ◽  
Natural Waters ◽  
High Sensitivity ◽  
Au Nps ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Mean Diameter ◽  
Plasma Mass Spectrometry ◽  
St Lawrence River

As the production and use of cerium oxide nanoparticles (CeO2 NPs) increases, so does the concern of the scientific community over their release into the environment. Single particle inductively coupled plasma mass spectrometry is emerging as one of the best techniques for NP detection and quantification; however, it is often limited by high size detection limits (SDL). To that end, a high sensitivity sector field ICP-MS (SF-ICP-MS) with microsecond dwell times (50 µs) was used to lower the SDL of CeO2 NPs to below 4.0 nm. Ag and Au NPs were also analyzed for reference. SF-ICP-MS was then used to detect CeO2 NPs in a Montreal rainwater at a concentration of (2.2 ± 0.1) × 108 L−1 with a mean diameter of 10.8 ± 0.2 nm; and in a St. Lawrence River water at a concentration of ((1.6 ± 0.3) × 109 L−1) with a higher mean diameter (21.9 ± 0.8 nm). SF-ICP-MS and single particle time of flight ICP-MS on Ce and La indicated that 36% of the Ce-containing NPs detected in Montreal rainwater were engineered Ce NPs.

Comparison of Antimony Determination Methods in Drinking Water

2013 ◽  
Vol 706-708 ◽  
pp. 478-482
Author(s):  
Nan Chen ◽  
Yong Sheng Shi ◽  
Meng Zhao ◽  
Meng Ru Xuan
Keyword(s):  
Inductively Coupled Plasma ◽  
Graphite Furnace ◽  
Low Cost ◽  
Water Environment ◽  
Hydride Generation ◽  
High Sensitivity ◽  
Atomic Fluorescence Spectrometry ◽  
Element Analysis ◽  
Inductively Coupled ◽  
Low Sensitivity

Antimony distributes widely in the environment. And antimony pollution in the water environment is becoming serious. How to detect the content of the antimony correctly and effectively is very important. Graphite furnace atomic absorption method is simple, but low sensitivity; hydride generation atomic fluorescence spectrometry, low cost, good reproducibility, but is harmful to the introduction of substances; inductively coupled plasma mass spectrometry for simultaneous multi-element analysis, high sensitivity, but the operation is cumbersome; inductively coupled plasma spectrometry has low detection limit, high accuracy, but the equipment is expensive, and cost of analysis is high.

Three-Dimensional Discharge Simulation of Inductively Coupled Plasma Etcher

2007 ◽  
Author(s):  
Jia Cheng ◽  
Yu Zhu ◽  
Guanghong Duan ◽  
Yangying Chen
Keyword(s):  
Electron Temperature ◽  
Inductively Coupled Plasma ◽  
Three Dimensional ◽  
Argon Plasma ◽  
Plasma Parameters ◽  
Inductively Coupled ◽  
Parameters Selection ◽  
Dimensional Distribution ◽  
Discharge Model ◽  
Discharge Simulation

Based on the commercial software, CFD-ACE+, a three-dimensional discharge model of an inductively coupled plasma (ICP) etcher was built. The spatial distributions of the electron temperature and the electron number density (END) of the argon plasma were simulated at 10 mTorr, 200 W and 200 sccm. One-dimensional distribution profiles of the plasma parameters above the wafer’s surface at different pressures and powers were compared. These results demonstrate that the END increases with both pressure and power. And the electron temperature decreases with pressure. The methods and conclusions can be used to provide some reference for the configurations of the chamber and the coil of the ICP equipment design and improvement and process parameters selection.

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