scholarly journals The Calculation of Two Dimensional Spatial Profile of Electromagnetic Field for Capacitively Coupled Plasma Source

2008 ◽  
Vol 17 (5) ◽  
pp. 400-407
Author(s):  
Y.I. Kim ◽  
N.S. Yoon
2017 ◽  
Vol 17 (11) ◽  
pp. 8411-8417 ◽  
Author(s):  
YoungDo Jeong ◽  
Young Jun Lee ◽  
Deuk-Chul Kwon ◽  
Sang-Jin Lee ◽  
Jae-Hong Jeon ◽  
...  

2012 ◽  
Vol 79 (5) ◽  
pp. 467-472
Author(s):  
K. T. A. L. BURM

AbstractAn argon plasma is created from a general capacitively coupled plasma source and monitored by optical emission spectroscopy. A relation between the line intensity and the applied voltage is obtained and discussed. The plasma shows paraelectric behavior. A linear relation exists between the electric capacity of the capacitively coupled plasma and the applied voltage. This linear relation can be used in a new voltage measurement technique in which the applied voltage can be calculated from the measured line intensity.


2005 ◽  
Vol 33 (2) ◽  
pp. 382-383 ◽  
Author(s):  
K. Bera ◽  
D. Hoffman ◽  
S. Shannon ◽  
G. Delgadino ◽  
Yan Ye

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