Regulating Interfacial Desolvation and Deposition Kinetics Enables Durable Zn Anodes with Ultrahigh Utilization of 80%

Small ◽  
2021 ◽  
pp. 2106441
Author(s):  
Hongrun Jin ◽  
Simin Dai ◽  
Kefeng Xie ◽  
Yongxin Luo ◽  
Kaisi Liu ◽  
...  
Keyword(s):  
Deposition Kinetics

scholarly journals Films and Materials Derived from Aminomalononitrile

Processes ◽  
2021 ◽  
Vol 9 (1) ◽  
pp. 82
Author(s):  
Helmut Thissen ◽  
Richard A. Evans ◽  
Vincent Ball
Keyword(s):  
Surface Chemistry ◽  
Surface Functionalization ◽  
State Of The Art ◽  
Chemical Reactivity ◽  
The State ◽  
Deposition Kinetics ◽  
Conformal Coating ◽  
Early Atmosphere ◽  
Living Organisms ◽  
Hypothetical Structure

In recent years major advances in surface chemistry and surface functionalization have been performed through the development, most often inspired by living organisms, of versatile methodologies. Among those, the contact of substrates with aminomalononitrile (AMN) containing solutions at pH = 8.5 allows a conformal coating to be deposited on the surface of all known classes of material. Since AMN is a molecule probably formed in the early atmosphere of our planet and since HCN-based compounds have been detected on many comets and Titan (Saturn’s largest moon) it is likely that such molecules will open a large avenue in surface functionalization mostly for bio-applications. This mini review describes the state of the art of AMN-based coatings from their deposition kinetics, composition, chemical reactivity, hypothetical structure to their first applications as biomaterials. Finally, the AMN-based versatile coatings are compared to other kinds of versatile coating based on catecholamines and polyphenols.

Supercritical Fluid Deposition of Ruthenium Thin Films: A Kinetic Study

2007 ◽  
Vol 992 ◽  
Author(s):  
Christos F. Karanikas ◽  
James J. Watkins
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Deposition Temperature ◽  
Zero Order ◽  
Measurable Effect ◽  
Deposition Rates ◽  
Reaction Pressure ◽  
Deposition Kinetics ◽  
First Order ◽  
Kinetics Of

AbstractThe kinetics of the deposition of ruthenium thin films from the hydrogen assisted reduction of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II), [Ru(tmhd)2cod], in supercritical carbon dioxide was studied in order to develop a rate expression for the growth rate as well as to determine a mechanism for the process. The deposition temperature was varied from 240°C to 280°C and the apparent activation energy was 45.3 kJ/mol. Deposition rates up to 30 nm/min were attained. The deposition rate dependence on precursor concentrations between 0 and 0.2 wt. % was studied at 260°C with excess hydrogen and revealed first order deposition kinetics with respect to precursor at concentrations lower then 0.06 wt. % and zero order dependence at concentrations above 0.06 wt. %. The effect of reaction pressure on the growth rate was studied at a constant reaction temperature of 260°C and pressures between 159 bar to 200 bar and found to have no measurable effect on the growth rate.

Gas products and carbon deposition kinetics in chemical vapor deposition from propylene

2010 ◽  
Vol 25 (1) ◽  
pp. 35-40 ◽  
Author(s):  
Cui-ying LU ◽  
Lai-fei CHENG ◽  
Li-tong ZHANG ◽  
Chun-nian ZHAO
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Deposition ◽  
Chemical Vapor ◽  
Deposition Kinetics ◽  
Gas Products

The Influence of Temperature and Concentration on Copper Deposition Kinetics in Supercritical Carbon Dioxide

2004 ◽  
Vol 812 ◽  
Author(s):  
Yinfeng Zong ◽  
James J. Watkins
Keyword(s):  
Carbon Dioxide ◽  
Supercritical Carbon Dioxide ◽  
Supercritical Fluids ◽  
Zero Order ◽  
Copper Deposition ◽  
Deposition Kinetics ◽  
Zero Order Kinetics ◽  
Concentration Interval ◽  
Kinetics Of ◽  
Supercritical Carbon

AbstractThe kinetics of copper deposition by the hydrogen-assisted reduction of bis(2,2,7- trimethyloctane-3,5-dionato)copper in supercritical carbon dioxide was studied as a function of temperature and precursor concentration. The growth rate was found to be as high as 31.5 nm/min. Experiments between 220 °C and 270 °C indicated an apparent activation energy of 51.9 kJ/mol. The deposition kinetics were zero order with respect to precursor at 250 °C and 134 bar and precursor concentrations between 0.016 and 0.38 wt.% in CO2. Zero order kinetics over this large concentration interval likely contributes to the exceptional step coverage obtained from Cu depositions from supercritical fluids.

Study on deposition kinetics of high-K materials by X-ray fluorescence techniques

2004 ◽  
Vol 59 (8) ◽  
pp. 1183-1187 ◽  
Author(s):  
Caterina Carpanese ◽  
Barbara Crivelli ◽  
Massimo Caniatti
Keyword(s):  
X Ray ◽  
Deposition Kinetics ◽  
Fluorescence Techniques ◽  
High K ◽  
High K Materials ◽  
Kinetics Of
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