Low-Cement Refractory Concretes of Aluminum Silicate Composition Based on Submicron Aluminum Oxide Grade NK-Alumina 14

This article discusses structural analysis in Laksanamekar Village, Bandung. The sample is in the form of andesite D and A *. Sample size (1 x 1) cm, with thickness (x) 0.4 cm. Sample D comes from the mountains of Laksanamekar Village Bandung at depths (15-20) m and samples (A *) from the Code River Yogyakarta. The results showed that the sample was a type of dry andesite rock and had layers in the grain. Andesite D has a denser composition, higher iron content and smoother surface texture than A*. The XRD results are known to be phase-identified andesite A * Sodium aluminum Silicate with a composition of 46.5% and andesite D phase of Titanium Calcium Sodium Magnesium Iron Manganese Silicon Aluminum Oxide of 10% so that andesite rocks have higher quality than A * samples.

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Metalorganic chemical vapor deposition of aluminum oxide on silicon nitride

MRS Proceedings ◽

10.1557/proc-751-z3.45 ◽

2002 ◽

Vol 751 ◽

Author(s):

Anindya Dasgupta ◽

Abhijit Roy Chowdhuri ◽

Christos G. Takoudis

Keyword(s):

Thin Films ◽

Silicon Nitride ◽

Aluminum Oxide ◽

Silicon Oxide ◽

Chemical Vapor ◽

Aluminum Silicate ◽

Excess Oxygen ◽

Silicon Substrates ◽

Interfacial Layers ◽

Film Substrate

ABSTRACTThin films of aluminum oxide were deposited on silicon nitride thin films using trimethylaluminum and oxygen at 0.5 Torr and 300 °C. Fourier transform infrared (FTIR) and x-ray photoelectron spectroscopic (XPS) analyses of these films showed no aluminum silicate phase at the film-substrate interface. The O/Al ratio in the deposited film was found to be higher than that in stoichiometric Al2O3 indicating the presence of excess oxygen. FTIR spectroscopy and XPS of the annealed samples did not show any formation of silicon oxide, oxynitride or silicate at the aluminum oxide/silicon nitride interface. In contrast to aluminum oxide on clean silicon substrates, using ultrathin silicon nitride as a barrier layer could prevent excess oxygen migration towards the Si substrate and formation of any interfacial layers.

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In situ X-ray observation of decomposition of hydrous aluminum silicate AlSiO3OH and aluminum oxide hydroxide d-AlOOH at high pressure and temperature

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2003.12.015 ◽

2004 ◽

Vol 65 (8-9) ◽

pp. 1547-1554 ◽

Cited By ~ 52

Author(s):

Asami Sano ◽

Eiji Ohtani ◽

Tomoaki Kubo ◽

Ken-ichi Funakoshi

Keyword(s):

High Pressure ◽

Aluminum Oxide ◽

Aluminum Silicate ◽

High Pressure And Temperature ◽

X Ray ◽

Oxide Hydroxide

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The influence of heat treatment on the fiber/matrix interface in a SiC-reinforced glassceramic

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100105771 ◽

1988 ◽

Vol 46 ◽

pp. 742-743

Author(s):

E. Bischoff ◽

O. Sbaizero

Keyword(s):

Heat Treatment ◽

Aluminum Silicate ◽

Lithium Aluminum ◽

Interfacial Region ◽

Specimen Preparation ◽

Crack Wake ◽

Pull Out ◽

Annealed Material ◽

Ultrasonic Drilling ◽

Fiber Matrix Interface

Fiber or whisker reinforced ceramics show improved toughness and strength. Bridging by intact fibers in the crack wake and fiber pull-out after failure contribute to the additional toughness. These processes are strongly influenced by the sliding and debonding resistance of the interfacial region. The present study examines the interface in a laminated 0/90 composite consisting of SiC (Nicalon) fibers in a lithium-aluminum-silicate (LAS) glass-ceramic matrix. The material shows systematic changes in sliding resistance upon heat treatment.As-processed samples were annealed in air at 800 °C for 2, 4, 8, 16 and 100 h, and for comparison, in helium at 800 °C for 4 h. TEM specimen preparation of as processed and annealed material was performed with special care by cutting along directions having the fibers normal and parallel to the section plane, ultrasonic drilling, dimpling to 100 pm and final ionthinning. The specimen were lightly coated with Carbon and examined in an analytical TEM operated at 200 kV.

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