Energy spectrum in the inversion layer of a disordered oxide-semiconductor interface

1987 ◽  
Vol 179 (2-3) ◽  
pp. 527-539
Author(s):  
C. Papatriantafillou ◽  
A. Papakitsos ◽  
C. Paraskevaidis
Keyword(s):  
Energy Spectrum ◽  
Inversion Layer ◽  
Oxide Semiconductor ◽  
Semiconductor Interface

Energy spectrum in the inversion layer of a disordered oxide-semiconductor interface

1987 ◽  
Vol 179 (3) ◽  
pp. A20
Author(s):  
C. Papatriantafillou ◽  
A. Papakitsos ◽  
C. Paraskevaidis
Keyword(s):  
Energy Spectrum ◽  
Inversion Layer ◽  
Oxide Semiconductor ◽  
Semiconductor Interface

Study on Fabrication and Fast Switching of High Voltage SiC JFET

2013 ◽  
Vol 827 ◽  
pp. 282-286
Author(s):  
Gang Chen ◽  
Song Bai ◽  
Run Hua Huang ◽  
Yong Hong Tao ◽  
Ao Liu
Keyword(s):  
Gate Voltage ◽  
Room Temperature ◽  
Inversion Layer ◽  
Oxide Semiconductor ◽  
Low Loss ◽  
Semiconductor Interface ◽  
Fast Switching ◽  
High Temperature Operation ◽  
Off Time ◽  
Channel Region

SiC devices have excellent properties such as ultra low loss, high withstand voltage, large capacity, high frequency, and high temperature operation compared with Si devices. The SiC JFET is expected to be appropriate for the power device because a JFET has no oxide-semiconductor interface in the channel region and does not use the low mobility SiC MOSFET inversion layer as a channel. Forward I-V up to 4A for SiC VJFET, Gate voltage from 2V to 3.5V by step 0.5V. Reverse I-V characteristics up to 4500V (VG=-8V) for SiC VJFET, Gate voltage from-4V to-8V by step-2V. Turn-off characteristics are studied and fast turn-off time of 136ns at room temperature under DC voltage of 600V is successfully demonstrated.

Improving the accuracy of the charge-sheet model for the long-channel metal-oxide semiconductor field-effect transistor

1987 ◽  
Vol 65 (8) ◽  
pp. 995-998
Author(s):  
N. G. Tarr
Keyword(s):  
Metal Oxide ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Inversion Layer ◽  
Potential Drop ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Analytic Approximation ◽  
Effect Transistor ◽  
Long Channel

It is shown that the accuracy of the charge-sheet model for the long-channel metal-oxide-semiconductor field-effect transistor can be improved by allowing for the small potential drop across the inversion layer, and by using a more accurate analytic approximation for the charge stored in the depletion region.

scholarly journals A comparative study of hole and electron inversion layer quantization in MOS structures

2010 ◽  
Vol 7 (2) ◽  
pp. 185-193 ◽  
Author(s):  
Amit Chaudhry ◽  
Nath Roy
Keyword(s):  
Charge Density ◽  
Marked Decrease ◽  
Inversion Layer ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Gate Capacitance ◽  
Variation Approach ◽  
Inversion Charge ◽  
Mos Structures ◽  
Good Agreement

In this paper, an analytical model has been developed to study inversion layer quantization in nanoscale Metal Oxide Semiconductor Field Effect Oxide p-(MOSFET). n-MOSFETs have been studied using the variation approach and the p-MOSFETs have been studied using the triangular well approach. The inversion charge density and gate capacitance analysis for both types of transistors has been done. There is a marked decrease in the inversion charge density and the capacitance of the p-MOSFET as compared to n-MOSFETs. The results are compared with the numerical results showing good agreement.

Quantum Modelling of Nanoscale Silicon Gate-All-Around Field Effect Transistor

2020 ◽  
Vol 64 ◽  
pp. 115-122
Author(s):  
P. Vimala ◽  
N.R. Nithin Kumar
Keyword(s):  
Analytical Model ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Inversion Layer ◽  
Drain Current ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Effect Transistor ◽  
Quantum Mechanical Effects ◽  
Novel Devices

The paper introduces an analytical model for gate all around (GAA) or Surrounding Gate Metal Oxide Semiconductor Field Effect Transistor (SG-MOSFET) inclusive of quantum mechanical effects. The classical oxide capacitance is replaced by the capacitance incorporating quantum effects by including the centroid parameter. The quantum variant of inversion charge distribution function, inversion layer capacitance, drain current, and transconductance expressions are modeled by employing this model. The established analytical model results agree with the simulated results, verifying these models' validity and providing theoretical supports for designing and applying these novel devices.

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