Geochemical characteristics affecting the cultivation and quality of Longjing Tea

1995 ◽  
Vol 55 (1-3) ◽  
pp. 183-191 ◽  
Author(s):  
Guohua Zhou ◽  
Lixin Zhu ◽  
Tianxiang Ren ◽  
Liansheng Zhang ◽  
Jinqiu Gu
2021 ◽  
Vol 47 (2) ◽  
pp. 535-551
Author(s):  
Charles D Moye ◽  
Michael M Msabi

This study focused on the mineralogical and geochemical characteristics of graphite-bearing rocks at Chenjere area by conducting surface geological mapping, geochemical and petrographical analyses with the intention of characterizing the nature of graphite occurrence in these lithological units. This paper presents results of the flake size, grade and mineralization extension of graphite in the graphitic gneiss. Field observations, petrographic investigation and comparison with other studies indicate that graphite occurrence at the Chenjere area is of sedimentary origin which fall under syngenetic type. The petrographic study revealed that nature of metamorphism of rocks in the Chenjere area is of high grade (amphibolite facies). Both field observations and petrographic studies indicate that minerals in the rock associated with graphite include quartz, feldspar (mostly K-feldspar) and biotite. Further, the mineralized zones are concordant to the rest of the lithologies of the area and biotite gneiss is forming the hangingwall and footwall. The rocks’ foliation is generally NE striking and dipping SE with the dip amount ranging from 30 to 60 degrees. The graphite mineralization at the study area occurs as medium to coarse grained crystalline, flake type graphite with long axis of up to 1000 micrometres in size. Graphite flakes are disseminated and oriented in the host rock that represents a normal metamorphic fabric. Geochemical results indicate that graphite contents in the host graphitic gneiss range from 3.03 wt.% to 16.00 wt.%. Mineralogy and texture of the graphite at Chenjere area meet the standards required for industrial applications in various advanced technologies. Keywords: Graphite Mineralization, Flake Graphite, Chenjere Area


Author(s):  
Hiep Hoang Van ◽  
Nguyen Dinh Nguyen

The geochemical characteristics of seawater and surface sediment represent the stability of seawater quality. There is a lack of information on geochemical characteristics of elements in seawater well as sediment in the sea area of Quang Binh province. The objective of this paper is to study and determine the characteristics of the marine environment through elemental geochemistry in seawater and surface sediments of Quang Binh area to assess the stability and quality of seawater in this area. The results show that seawater environment is characterized by a shallow sea with rare effect on continental water. The difference in salinity values, Eh, pH,...at different depth is indistinguishable. The sedimentary environment is weak alkaline, the environment from decontamination to strong oxidation. Cu and As elements distributed in sediments are mostly concentrated in the center of the study area.


Author(s):  
K. T. Tokuyasu

During the past investigations of immunoferritin localization of intracellular antigens in ultrathin frozen sections, we found that the degree of negative staining required to delineate u1trastructural details was often too dense for the recognition of ferritin particles. The quality of positive staining of ultrathin frozen sections, on the other hand, has generally been far inferior to that attainable in conventional plastic embedded sections, particularly in the definition of membranes. As we discussed before, a main cause of this difficulty seemed to be the vulnerability of frozen sections to the damaging effects of air-water surface tension at the time of drying of the sections.Indeed, we found that the quality of positive staining is greatly improved when positively stained frozen sections are protected against the effects of surface tension by embedding them in thin layers of mechanically stable materials at the time of drying (unpublished).


Author(s):  
L. D. Jackel

Most production electron beam lithography systems can pattern minimum features a few tenths of a micron across. Linewidth in these systems is usually limited by the quality of the exposing beam and by electron scattering in the resist and substrate. By using a smaller spot along with exposure techniques that minimize scattering and its effects, laboratory e-beam lithography systems can now make features hundredths of a micron wide on standard substrate material. This talk will outline sane of these high- resolution e-beam lithography techniques.We first consider parameters of the exposure process that limit resolution in organic resists. For concreteness suppose that we have a “positive” resist in which exposing electrons break bonds in the resist molecules thus increasing the exposed resist's solubility in a developer. Ihe attainable resolution is obviously limited by the overall width of the exposing beam, but the spatial distribution of the beam intensity, the beam “profile” , also contributes to the resolution. Depending on the local electron dose, more or less resist bonds are broken resulting in slower or faster dissolution in the developer.


Author(s):  
G. Lehmpfuhl

Introduction In electron microscopic investigations of crystalline specimens the direct observation of the electron diffraction pattern gives additional information about the specimen. The quality of this information depends on the quality of the crystals or the crystal area contributing to the diffraction pattern. By selected area diffraction in a conventional electron microscope, specimen areas as small as 1 µ in diameter can be investigated. It is well known that crystal areas of that size which must be thin enough (in the order of 1000 Å) for electron microscopic investigations are normally somewhat distorted by bending, or they are not homogeneous. Furthermore, the crystal surface is not well defined over such a large area. These are facts which cause reduction of information in the diffraction pattern. The intensity of a diffraction spot, for example, depends on the crystal thickness. If the thickness is not uniform over the investigated area, one observes an averaged intensity, so that the intensity distribution in the diffraction pattern cannot be used for an analysis unless additional information is available.


Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.


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