Influences of substrate temperatures on etch rates of PECVD-SiN thin films with a CF4/H2 plasma
1989 ◽
Vol 47
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pp. 172-173
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2011 ◽
Vol 23
(5)
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pp. 1094-1098
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2015 ◽
Vol 75
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pp. 012023
2010 ◽
Vol 405
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pp. 2226-2231
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Vol 40
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pp. 013410