Atomic layer deposited TiN capping layer for sub-10 nm ferroelectric Hf0.5Zr0.5O2 with large remnant polarization and low thermal budget

2021 ◽  
Vol 570 ◽  
pp. 151152
Author(s):  
Chin-I Wang ◽  
Chun-Yuan Wang ◽  
Teng-Jan Chang ◽  
Yu-Sen Jiang ◽  
Jing-Jong Shyue ◽  
...  
Keyword(s):  
Remnant Polarization ◽  
Atomic Layer ◽  
Thermal Budget ◽  
Capping Layer ◽  
Low Thermal Budget ◽  
Large Remnant Polarization

Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition

2020 ◽  
Vol 12 (39) ◽  
pp. 44225-44237
Author(s):  
Elham Rafie Borujeny ◽  
Oles Sendetskyi ◽  
Michael D. Fleischauer ◽  
Kenneth C. Cadien
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Thermal Budget ◽  
Layer Deposition ◽  
Low Thermal Budget

scholarly journals Si surface passivation by Al2O3 thin films deposited using a low thermal budget atomic layer deposition process

2013 ◽  
Vol 102 (13) ◽  
pp. 131603 ◽  
Author(s):  
G. Seguini ◽  
E. Cianci ◽  
C. Wiemer ◽  
D. Saynova ◽  
J. A. M. van Roosmalen ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Passivation ◽  
Atomic Layer ◽  
Deposition Process ◽  
Thermal Budget ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Low Thermal Budget

Low Thermal Budget Monolithic Integration of Evanescent-Coupled Ge-on-SOI Photodetector on Si CMOS Platform

2010 ◽  
Vol 16 (1) ◽  
pp. 106-113 ◽  
Author(s):  
Kah-Wee Ang ◽  
Tsung-Yang Liow ◽  
Ming-Bin Yu ◽  
Qing Fang ◽  
Junfeng Song ◽  
...  
Keyword(s):  
Monolithic Integration ◽  
Thermal Budget ◽  
Low Thermal Budget
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