Effect of O2/Ar flow ratio and heat treatment on the structure and properties of SiO2 film prepared by magnetron sputtering

TiAlLaN coatings were deposited on the cemented carbide substrates by mid-frequency magnetron sputtering system. The effects of Ar/N2 flow ratio on the composition, structure, adhesion and hardness followed with elastic modulus and H/E ratio were investigated systematically. Results indicate that all the Ti/Al ratios of the coatings were higher than that of the Ti/Al ratio in the target; however, the Ti/Al ratio increased with the Ar/N2 flow ratio changed. XRD patterns show that the intensity of (111) peak was elevated with the Ar/N2 flow ratio increased. Meanwhile, the peak shifted to lower angles, which implied increases of the lattice parameter. The TiAlLaN coating under the Ar/N2 flow ratio of 3:1 showed the best adhesion, the highest hardness and the lowest H/E ratio which indicated perfect wear resistance.

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Influence of flow ratio of N2 to (N2+Ar) mixture on the structure and properties of zirconium nitride films prepared by radio frequency magnetron sputtering

Journal of Materials Research ◽

10.1557/jmr.2009.0383 ◽

2009 ◽

Vol 24 (10) ◽

pp. 3206-3212 ◽

Cited By ~ 2

Author(s):

Yingrui Sui ◽

Jiukai Liu ◽

Bo Liu ◽

Lihong Wang ◽

B. Yao

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Lattice Constant ◽

Radio Frequency Magnetron ◽

Zirconium Nitride ◽

Structure And Properties ◽

Flow Ratio ◽

Radio Frequency Magnetron Sputtering ◽

Pure Nitrogen ◽

Rocksalt Structure

Zr–N films were grown on glass and Si (100) substrate by radio-frequency magnetron sputtering using a mixture of high pure nitrogen and argon as sputtering gases. The structure and properties of Zr–N compounds in the films change with N2/(N2+Ar) flow ratio (RN2). At low RN2, a ZrN alloy with the rocksalt structure (denoted as γ-ZrNx) is formed. The N concentration x and lattice constant increases with increasing RN2, and x reaches 1 when the RN2 goes up to 20%. As the RN2 exceeds 20%, the film is composed of γ-ZrN and Zr3N4 phase with Th3P4 structure (denoted as c-Zr3N4). The relative content decreases for the γ-ZrN but increases for the c-Zr3N4 with increasing RN2, and a single phase of c-Zr3N4 was deposited on glass at RN2 of 100%. The c-Zr3N4 behaves with p-type conductivity with a band gap of 2.8 eV. The lattice constant of the c-Zr3N4 was measured to be ∼0.674 nm. The mechanism of the phase transition from γ-ZrN to c-Zr3N4 with increasing RN2 was suggested.

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The Structure and Magnetic Properties of NiZn-Ferrite Films Deposited by Magnetron Sputtering at Room Temperature

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.690-693.1702 ◽

2013 ◽

Vol 690-693 ◽

pp. 1702-1706 ◽

Cited By ~ 2

Author(s):

Shuang Jun Nie ◽

Hao Geng ◽

Jun Bao Wang ◽

Lai Sen Wang ◽

Zhen Wei Wang ◽

...

Keyword(s):

Thin Films ◽

Magnetic Properties ◽

Magnetron Sputtering ◽

Saturation Magnetization ◽

Room Temperature ◽

Oxygen Flow ◽

Flow Ratio ◽

Study Results ◽

Ferrite Thin Films ◽

Ferrite Films

NiZn-ferrite thin films were deposited onto silicon and glass substrates by radio frequency magnetron sputtering at room temperature. The effects of the relative oxygen flow ratio on the structure and magnetic properties of the thin films were investigated. The study results reveal that the films deposited under higher relative oxygen flow ratio show a better crystallinity. Static magnetic measurement results indicated that the saturation magnetization of the films was greatly affected by the crystallinity, grain dimension, and cation distribution in the NiZn-ferrite films. The NiZn-ferrite thin films with a maximum saturation magnetization of 151 emucm-3, which is about 40% of the bulk NiZn ferrite, was obtained under relative oxygen flow ratio of 60%.

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Influence of Applied Bias Voltage on the Composition, Structure, and Properties of Ti:Si-Codoped a-C:H Films Prepared by Magnetron Sputtering

Journal of Nanomaterials ◽

10.1155/2014/937068 ◽

2014 ◽

Vol 2014 ◽

pp. 1-7 ◽

Cited By ~ 3

Author(s):

Jinlong Jiang ◽

Qiong Wang ◽

Yubao Wang ◽

Zhang Xia ◽

Hua Yang ◽

...

Keyword(s):

Mechanical Properties ◽

Surface Roughness ◽

Magnetron Sputtering ◽

Bias Voltage ◽

Tribological Properties ◽

Structure And Properties ◽

Applied Bias ◽

Applied Bias Voltage ◽

Methane Mixture ◽

Composition Structure

The titanium- and silicon-codoped a-C:H films were prepared at different applied bias voltage by magnetron sputtering TiSi target in argon and methane mixture atmosphere. The influence of the applied bias voltage on the composition, surface morphology, structure, and mechanical properties of the films was investigated by XPS, AFM, Raman, FTIR spectroscopy, and nanoindenter. The tribological properties of the films were characterized on an UMT-2MT tribometer. The results demonstrated that the film became smoother and denser with increasing the applied bias voltage up to −200 V, whereas surface roughness increased due to the enhancement of ion bombardment as the applied bias voltage further increased. The sp3carbon fraction in the films monotonously decreased with increasing the applied bias voltage. The film exhibited moderate hardness and the superior tribological properties at the applied bias voltage of −100 V. The tribological behaviors are correlated to the H/E or H3/E2ratio of the films.

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Changes in the structure and properties produced in polyester yarn by the heat treatment in the texturing process

Fibre Chemistry ◽

10.1007/bf00543059 ◽

1973 ◽

Vol 4 (2) ◽

pp. 179-181 ◽

Cited By ~ 1

Author(s):

L. P. Sebina ◽

V. A. Usenko ◽

B. A. Nefedov ◽

V. K. Smirnov

Keyword(s):

Heat Treatment ◽

Structure And Properties ◽

Polyester Yarn

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The effect of heat-treatment temperature on structure and properties of TiB2/C composites

Carbon ◽

10.1016/j.carbon.2007.02.017 ◽

2007 ◽

Vol 45 (6) ◽

pp. 1200-1211 ◽

Cited By ~ 7

Author(s):

Changjun Zhou ◽

William S. Kinman ◽

Paul J. McGinn

Keyword(s):

Heat Treatment ◽

Heat Treatment Temperature ◽

Treatment Temperature ◽

Structure And Properties

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Influence of Oxygen Flow Ratio on Properties of Zn2SnO4Thin Films Deposited by RF Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.l34 ◽

2004 ◽

Vol 44 (1) ◽

pp. L34-L37 ◽

Cited By ~ 38

Author(s):

Kazuo Satoh ◽

Yoshiharu Kakehi ◽

Akio Okamoto ◽

Shuichi Murakami ◽

Fumihiro Uratani ◽

...

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Oxygen Flow ◽

Flow Ratio

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The structure and properties of sheets from the new alloy V-1381 of the Al – Mg – Si system

Perspektivnye Materialy ◽

10.30791/1028-978x-2021-5-18-27 ◽

2021 ◽

Vol 5 ◽

pp. 18-27

Author(s):

A. A. Selivanov ◽

◽

K. V. Antipov ◽

Yu. S. Oglodkova ◽

A. S. Rudchenko ◽

...

Keyword(s):

Heat Treatment ◽

Arc Welding ◽

Structure And Properties ◽

Strengthening Phase ◽

Critical Rate ◽

Corrosion Properties ◽

Β Phase ◽

Mechanical And Corrosion Properties ◽

20 Nm ◽

6Xxx Series

The results of the development of a new alloy of the Al – Mg – Si system of the 6xxx series, which received the V-1381 grade, are presented. The influence of the composition and modes of heat treatment on the mechanical and corrosion properties of sheets with a thickness of 1,0 and 3,0 mm, manufactured under the conditions of FSUE “VIAM”, was investigated. Average level of sheet properties: UTS = 410 MPa, YTS = 360 MPa, El = 11.5 %; fatigue crack growth (dl/dN) = 0,59 mm/kcycle at ΔK = 18,6 MPa·m1/2, intergranular corrosion ≤ 0,15 mm, exfoliation corrosion 4 points. It was found that the structure of the sheets is recrystallized, the main strengthening phase is the coherent matrix β’(Mg2Si)-phase evenly distributed in the volume of grains with a high density. There is also a heterogeneous origin of β′-phase on dislocations and dispersoids. At grain boundaries there are zones free from emissions with a width of 15 – 20 nm. Dispersoids of various morphologies are observed in the tested samples. Temperature and heat values of phase transformations in ingots and sheets are determined and established liquidus and solidus points. The sheet weldability was evaluated by automatic argon-arc welding and the critical rate of deformation of the weld metal during crystallization was determined, at which no cracks were formed in it. Laser welding mode has been developed to ensure optimal formation of geometric parameters of the weld.

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Microstructure and Electrical Properties of ITO Films Deposited Using Various ITO Targets by Magnetron Sputtering

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.124-126.431 ◽

2007 ◽

Vol 124-126 ◽

pp. 431-434

Author(s):

Joon Hong Park ◽

Sang Chul Lee ◽

Jin Ho Lee ◽

Pung Keun Song

Keyword(s):

Magnetron Sputtering ◽

Substrate Temperature ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Target Surface ◽

Flow Ratio ◽

Dc Power ◽

Alkali Glass ◽

Oxygen Ratio ◽

Ito Films

Indium Tin Oxide (ITO) films were deposited on non-alkali glass substrate by magnetron sputtering using commercial ITO target (target A) and improved ITO target (target B). Depositions were carried out at total gas pressure (Ptot) of 0.5 Pa, substrate temperature (Ts) of RT ~ 300 °C, oxygen flow ratio [O2/(O2+Ar)] of 0 ~ 1.0% and dc power of 100W. Target B showed relatively higher stability in film resistivity with increasing sputtering time, i.e., erosion ratio of target surface. Optimum oxygen ratio to obtain the lowest resistivity was decreased with increasing substrate temperature. The lowest resistivity was 1.06x10-4 6cm for the film deposited using target B at O2/(O2+Ar) ratio of 0.05% and at Ts =300 °C.

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