Analytical model of drain current of cylindrical surrounding gate p-n-i-n TFET

2015 ◽  
Vol 111 ◽  
pp. 171-179 ◽  
Author(s):  
Wanjie Xu ◽  
Hei Wong ◽  
Hiroshi Iwai
Keyword(s):  
Analytical Model ◽  
Drain Current ◽  
Surrounding Gate

Analytical modeling of quantization effects in surrounding-gate MOSFETs

2013 ◽  
Vol 33 (1/2) ◽  
pp. 630-644 ◽  
Author(s):  
Vimala Palanichamy ◽  
N.B. Balamurugan
Keyword(s):  
Analytical Model ◽  
Drain Current ◽  
Quantum Effects ◽  
Physical Models ◽  
Threshold Region ◽  
Content Type ◽  
Surrounding Gate ◽  
Inversion Charge ◽  
The Impact ◽  
Device Operation

Purpose – The purpose of this paper is to present an analytical model and simulation for cylindrical gate all around MOSFTEs including quantum effects. Design/methodology/approach – To incorporating the impact of quantum effects, the authors have used variational method for solving the Poisson and Schrodinger equations. The accuracy of the results obtained using this model is verified by comparing them with simulation results. Findings – This model is developed to provide an analytical expression for inversion charge distribution function for all regions of device operation. This expression is used to calculate the other important parameters like inversion charge centroid, threshold voltage, inversion charge, gate capacitance and drain current. The calculated expressions for the above parameters are simple and accurate. The validity of this model was checked for the devices with different dimensions and bias voltages. Practical implications – Simulation based on the compact physical models reduces the cost of developing a sophisticated fabrication technology and shortens the time-to-market. They may also be utilized to explore innovative device structures. Originality/value – This paper presents, for the first time, a compact quantum analytical model for cylindrical surrounding gate MOSFETs which predicts the device characteristics reasonably well over the entire range of device operation (above threshold as well as sub-threshold region).

scholarly journals An analytical model for the current voltage characteristics of GaN-capped AlGaN/GaN and AlInN/GaN HEMTs including thermal and self-heating effects

2020 ◽  
Vol 10 (2) ◽  
pp. 1791
Author(s):  
A. Bellakhdar ◽  
A. Telia ◽  
J. L. Coutaz
Keyword(s):  
Analytical Model ◽  
Drain Current ◽  
High Electron Mobility Transistors ◽  
Published Data ◽  
High Electron ◽  
Self Heating ◽  
Heating Effects ◽  
Cap Layer ◽  
Gan Hemts ◽  
Sheet Density

We present an analytical model for the I-V characteristics of AlGaN/GaN and AlInN/GaN high electron mobility transistors (HEMT). Our study focuses on the influence of a GaN capping layer, and of thermal and self-heating effects. Spontaneous and piezoelectric polarizations at Al (Ga,In)N/GaN and GaN/Al(Ga,In)N interfaces have been incorporated in the analysis. Our model permits to fit several published data. Our results indicate that the GaN cap layer reduces the sheet density of the two-dimensional electron gas (2DEG), leading to a decrease of the drain current, and that n+-doped GaN cap layer provides a higher sheet density than undoped one. In n+GaN/AlInN/GaN HEMTs, the sheet carrier concentration is higher than in n+GaN/AlGaN/GaN HEMTs, due to the higher spontaneous polarization charge and conduction band discontinuity at the substrate/barrier layer interface.

Quantum Modelling of Nanoscale Silicon Gate-All-Around Field Effect Transistor

2020 ◽  
Vol 64 ◽  
pp. 115-122
Author(s):  
P. Vimala ◽  
N.R. Nithin Kumar
Keyword(s):  
Analytical Model ◽  
Field Effect ◽  
Field Effect Transistor ◽  
Inversion Layer ◽  
Drain Current ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Effect Transistor ◽  
Quantum Mechanical Effects ◽  
Novel Devices

The paper introduces an analytical model for gate all around (GAA) or Surrounding Gate Metal Oxide Semiconductor Field Effect Transistor (SG-MOSFET) inclusive of quantum mechanical effects. The classical oxide capacitance is replaced by the capacitance incorporating quantum effects by including the centroid parameter. The quantum variant of inversion charge distribution function, inversion layer capacitance, drain current, and transconductance expressions are modeled by employing this model. The established analytical model results agree with the simulated results, verifying these models' validity and providing theoretical supports for designing and applying these novel devices.

A Drain Current and Transconductance Analytical Model for Symmetric Double Gate Junctionless FENT

2020 ◽  
Vol 65 ◽  
pp. 39-50
Author(s):  
N. Bora ◽  
N. Deka ◽  
R. Subadar
Keyword(s):  
Analytical Model ◽  
Field Effect ◽  
Drain Current ◽  
Double Gate ◽  
Double Integral ◽  
Electrical Parameters ◽  
Continuity Equations ◽  
Nanowire Transistor ◽  
Drain Conductance ◽  
Tcad Simulations

This paper presents an analytical model of various electrical parameters for an ultra thin symmetric double gate (SDG) junctionless field effect nanowire transistor (JLFENT). The model works for all the regions of operation of the nanowire transistor without using any fitting parameter. The surface potential is derived based on the solutions of Poisson’s and current continuity equations by using appropriate boundary conditions. The Pao–Sah double integral was used to obtain the drain current, transconductance and drain conductance. The results obtained from analytical model are validated by comparing with GENIUS 3D TCAD simulations. The simplicity of the model makes it appropriate to be a SPICE compatible model.

Nouvelle approche de modélisation des transistors micro-ondes MESFET et HEMT

2001 ◽  
Vol 79 (8) ◽  
pp. 1075-1084 ◽  
Author(s):  
R Touhami ◽  
M CE Yagoub ◽  
H Baudrand
Keyword(s):  
Analytical Model ◽  
Optimization Algorithm ◽  
Drain Current ◽  
Mathematical Function ◽  
Precision Level ◽  
The One ◽  
Current Drain

The authors present an analytical model of current drain–source based on the one established by Chalmers. As the precision of parameters is directly bound to the measured maximal value of the transconductance, a precision level of 25 % is obtained. To improve this precision, the combined optimization algorithm with the Chalmers model is elaborated. The results obtained are very satisfactory. For a mathematical function ψ, with three terms in the saturated region, the influence of the temperature represents correctly the drain current for the voltage near a pinch-off voltage.

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