Effect of barrier layers on the properties of indium tin oxide thin films on soda lime glass substrates

2009 ◽  
Vol 517 (14) ◽  
pp. 4074-4077 ◽  
Author(s):  
Jung-Min Lee ◽  
Byung-Hyun Choi ◽  
Mi-Jung Ji ◽  
Yong-Tae An ◽  
Jung-Ho Park ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Soda Lime ◽  
Soda Lime Glass ◽  
Oxide Thin Films ◽  
Barrier Layers ◽  
Glass Substrates

Evolution of Atomically Stepped Surface of Indium Tin Oxide Thin Films Grown on Nanoimprinted Glass Substrates

2011 ◽  
Vol 4 (3) ◽  
pp. 035201 ◽  
Author(s):  
Yasuyuki Akita ◽  
Yumiko Miyake ◽  
Hirokazu Nakai ◽  
Hideo Oi ◽  
Masahiro Mita ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Thin Films ◽  
Glass Substrates ◽  
Stepped Surface

Dynamic Hardness of Thin Films and its Thickness Dependence

1997 ◽  
Vol 505 ◽  
Author(s):  
Mikio Iwasa ◽  
Koji Tanaka ◽  
John A. Barnard ◽  
Richard C. Bradt
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Resonance Method ◽  
Soda Lime ◽  
Dynamic Hardness ◽  
Nano Indentation ◽  
Glass Substrates ◽  
Influence Of Substrate

ABSTRACTThin films of indium tin oxide, silica and chromium were deposited on the soda-lime-silica glass substrates with the thickness ranging from 50 to 2000 nano-meter. Their dynamic hardness were measured by the nano-indentation method with the indentation depth from 50 to 200 nano-meter. The hardness of indium tin oxide film increased and that of silica decreased with increasing film thickness. The hardness of chromium was almost constant regardless of film thickness. When the hardness of thin film was higher than that of substrate, the influence of substrate was greater compared with the reverse case. The dynamic hardness of engineering ceramics were about fifty percent higher than the ordinary Vickers hardness, but the ranking order was in good agreement. The Young's modulus from nano-indentation were a little higher than those by resonance method.

scholarly journals Properties and Stability of Bismuth Doped Tin Oxide Thin Films Deposited on Various Types of Glass Substrates

1996 ◽  
Vol 424 ◽  
Author(s):  
V. Foglietti ◽  
A. D′ Alessandro ◽  
A. Galbato ◽  
A. Alessandri ◽  
R. Beccherelli ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Soda Lime ◽  
High Resistivity ◽  
Oxide Thin Films ◽  
Large Area ◽  
Glass Substrates ◽  
Liquid Crystal Matrix ◽  
The Stability

AbstractThis work reports on deposition of transparent semi-insulating tin oxide thin films deposited by spray-pyrolysis over large area glass substrates. The precursors used are based on diluted chloride solutions. Bi-doped high resistivity tin oxide thin films are required in the fabrication process of an analog grey scale ferroelectric liquid crystal matrix display. Various parameters have been optimized in order to achieve good reproducibility and uniformity of the electrical and optical properties. Deposition temperature and the properties of the glass substrates have been found as the most critical variables which affect the deposition rate and the quality of the deposited films. The different substrates used, borosilicates and soda-lime glasses, lead to different electrical properties. A further investigation on the stability of the film properties versus different kind of aging procedures have been conducted. Preliminary results of the operation of the complete display making use of our films are shown.

RF aerosol plasma fabrication of indium tin oxide and tin oxide thin films

1996 ◽  
Vol 11 (4) ◽  
pp. 895-903 ◽  
Author(s):  
D. H. Lee ◽  
K. D. Vuong ◽  
J. A. A. Williams ◽  
J. Fagan ◽  
R. A. Condrate ◽  
...  
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Plasma Deposition ◽  
Soda Lime ◽  
Float Glass ◽  
Atmospheric Environment ◽  
Oxide Thin Films ◽  
Near Surface ◽  
Ito Films

Transparent, conductive indium-tin oxide (ITO) and tin oxide thin films were deposited on soda-lime-silicate (SLS) float glass and silica glass substrates by an RF aerosol plasma technique in an atmospheric environment. The ITO films were deposited from solutions with various In: Sn ratios. The dependence of the film properties on the substrate temperature, deposition time, and tin concentration has been studied. The films were characterized by several techniques including XRD, EDS, electrical resistivity, SEM, optical (IR-UV-Vis transmission), Mössbauer, and infrared spectroscopy. The results showed that film phase, morphology, thickness, crystallite size, and conductivity depend on the solution composition and deposition parameters. XRD revealed that In2O3 was present in the film when a In: Sn ratio of 5: 5 or higher was used; otherwise only SnO2 shown. SEM analysis showed that dense and uniform films were formed with particle sizes ranging from approximately 50 nm to 150 nm. The resistivity of the ITO films ranged from 0.12 to 5.0 ohm-cm at room temperature. Optical transmission of the ITO-coated glasses was not different from the uncoated samples. Infrared results indicated that the structure of the near surface of the glasses was significantly modified with a higher indium concentration. The advantages of the atmospheric, RF aerosol plasma deposition process over other techniques are discussed.

Plasma-assisted deposition of indium tin oxide thin films by sublimation using an anodic vacuum arc discharge

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Oxide Thin Films
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