Structure of uniform and high-quality Al-doped ZnO films by magnetron sputter deposition at low temperatures

2018 ◽  
Vol 665 ◽  
pp. 109-116 ◽  
Author(s):  
Fanping Meng ◽  
Shou Peng ◽  
Genbao Xu ◽  
Yun Wang ◽  
Fangfang Ge ◽  
...  
Keyword(s):  
Low Temperatures ◽  
Sputter Deposition ◽  
Zno Films ◽  
High Quality ◽  
Magnetron Sputter Deposition ◽  
Doped Zno ◽  
Magnetron Sputter

Macro-Trench Studies of Surface Reaction Probability of a-Si:H Film Growth

1992 ◽  
Vol 258 ◽  
Author(s):  
A. Nuruddin ◽  
J. R. Doyle ◽  
J. R. Abelson
Keyword(s):  
Hollow Cathode ◽  
Surface Reaction ◽  
Film Growth ◽  
State Of The Art ◽  
Sputter Deposition ◽  
Reactive Magnetron ◽  
High Quality ◽  
Mitigating Factors ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

ABSTRACTUsing a “macro-trench” technique, the surface reaction probabilities β of the a-Si:H growth precursors for remote hollow cathode silane discharge (HC) and reactive magnetron sputter deposition (RMS) are measured. Both deposition methods produce state of the art photo-electronic quality a-Si:H. For the HC case, β= 0.28 ± 0.05, whereas for RMS deposition β ≈ 0.97 ± 0.05. We conclude that β is not universally correlated with film quality, and discuss mitigating factors present in RMS deposition that permit high quality film to be deposited despite the high film precursor reactivity.

Energetic particle fluxes in magnetron sputter deposition of a-Si:H

1991 ◽  
Vol 137-138 ◽  
pp. 783-786 ◽  
Author(s):  
Alan M. Myers ◽  
James R. Doyle ◽  
G. Jeff Feng ◽  
Nagi Maley ◽  
David L. Ruzic ◽  
...  
Keyword(s):  
Energetic Particle ◽  
Sputter Deposition ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Particle Fluxes
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