Low-frequency noise analysis of Si/SiGe channel pMOSFETs

2002 ◽  
Vol 46 (12) ◽  
pp. 2281-2285 ◽  
Author(s):  
P.W Li ◽  
W.M Liao
2011 ◽  
Vol 50 (1R) ◽  
pp. 011501 ◽  
Author(s):  
Myoung-Sun Lee ◽  
Jung-Kyu Lee ◽  
Hyun-Sang Hwang ◽  
Hyung-Cheol Shin ◽  
Byung-Gook Park ◽  
...  

2011 ◽  
Vol 324 ◽  
pp. 441-444 ◽  
Author(s):  
Jalal Jomaah ◽  
Majida Fadlallah ◽  
Gerard Ghibaudo

A review of recent results concerning the low frequency noise in modern CMOS devices is given. The approaches such as the carrier number and the Hooge mobility fluctuations used for the analysis of the noise sources are illustrated through experimental data obtained on advanced CMOS generations. Furthermore, the impact on the electrical noise of the shrinking of CMOS devices in the deep submicron range is also shown.


2016 ◽  
Vol 598 ◽  
pp. 109-114 ◽  
Author(s):  
Young-Uk Ko ◽  
Ho-Jin Yun ◽  
Kwang-Seok Jeong ◽  
Yu-Mi Kim ◽  
Seung-Dong Yang ◽  
...  

2013 ◽  
Vol 60 (11) ◽  
pp. 3794-3798 ◽  
Author(s):  
Tzung-Te Chen ◽  
Han-Kuei Fu ◽  
Chun-Fan Dai ◽  
Chien-Ping Wang ◽  
Chun-Wen Chu ◽  
...  

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