Reconstruction of the Au (001) surface

1991 ◽  
Vol 49 ◽  
pp. 640-641
Author(s):  
D.N. Dunn ◽  
J.P. Zhang ◽  
L.D. Marks
Keyword(s):  
Electron Microscope Study ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Common Elements ◽  
Transmission Electron ◽  
Unit Cells ◽  
Transmission Electron Microscope Study ◽  
The Common ◽  
Reconstructed Surface ◽  
Surface Domains

The Au (100) surface has been a widely studied surface producing a variety of reconstructions using several different techniques. LEED has determined the clean surface reconstruction to consist of (5x20)1 and (26x68)2 surface domains. More recently an ultra high vacuum transmission electron microscope study of small Au(001) crystallites has found a reconstructed surface with (28x5)3 slightly rotated surface unit cells. The common elements in all these studies seem to be that the ‘5’ dimension is a hard dimension and does not seem to vary from study to study save one. It is also generally accepted that this surface can be thought of as the an hexagonal layer superimposed on a bulk terminated surface. Generally the long dimension is representative of an average number taken from the analysis of many domains. We have found the Au (001) surface to reconstruct into (5xn) domains where the ‘5’ dimension is a hard dimension while the ‘n’ is a soft dimension ranging between 15 and 21.

UHV Microscopy of the Reconstructed Au (001) Surface

1990 ◽  
Vol 208 ◽  
Author(s):  
D. N. Dunn ◽  
L. D. Marks ◽  
J. P. Zhang
Keyword(s):  
Single Crystal ◽  
Crystal Surface ◽  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Bulk Single Crystal ◽  
Transmission Electron ◽  
Dark Field Microscopy ◽  
Reconstructed Surface ◽  
Diffraction Patterns

ABSTRACTWe investigate the evolution of the microstructure of a reconstructed Au (001) single crystal surface using ultra high vacuum transmission electron microscopy (UHV-TEM). Bulk single crystal Au (001) surfaces were prepared via standard metallographic techniques and sputter anneal cycles. After a clean surface was obtained, the (001) surface was found to reconstruct into two nearly orthogonal domains of dimensions (5 × ∼ 20 ) along the <110> directions of the unreconstructed F.C.C. (001) surface. Transmission electron diffraction patterns (TED) and dark field microscopy are the two primary techniques used to determine the symmetry and dimensions of the reconstructed surface.

UHV-TEM imaging of surface reconstructions in B-doped Si

1991 ◽  
Vol 49 ◽  
pp. 618-619
Author(s):  
T. S. Savage ◽  
R. Ai ◽  
L. D. Marks
Keyword(s):  
High Vacuum ◽  
Single Crystal Silicon ◽  
Ultra High Vacuum ◽  
Limiting Factor ◽  
Crystal Silicon ◽  
Transmission Electron ◽  
Surface Reconstructions ◽  
Northwestern University ◽  
Reconstructed Surface

A variety of techniques including LEED, STM and RHEED have been used to study surface reconstructions on the silicon <111> surface. Additionally, ultra high vacuum-transmission electron microscopy (UHV-TEM) has been used for a limited number of studies most notably on the 7x7 reconstructed surface. The limiting factor in these studies has been the availability of microscopes capable of in-situ sample preparation and imaging in a UHV environment. The Hitachi UHV-H9000 located at Northwestern University has recently been used to observe several surface reconstructions on a single crystal silicon <111> thin film. Transmission electron diffraction (TED) patterns were obtained for 7x7, and 5x1 surface reconstructions.

The High Resolution Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 316-317
Author(s):  
A. V. Crewe
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
High Vacuum ◽  
Scanning Transmission Electron Microscope ◽  
Ultra High Vacuum ◽  
Resolving Power ◽  
Imaging Characteristics ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

A Field Emission System For Transmission Electron Microscopy

1973 ◽  
Vol 31 ◽  
pp. 298-299
Author(s):  
Michel Troyonal ◽  
Huei Pei Kuoal ◽  
Benjamin M. Siegelal
Keyword(s):  
Electron Microscope ◽  
Field Emission ◽  
Optical System ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Objective Lens ◽  
Electron Optical System ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Emission System

A field emission system for our experimental ultra high vacuum electron microscope has been designed, constructed and tested. The electron optical system is based on the prototype whose performance has already been reported. A cross-sectional schematic illustrating the field emission source, preaccelerator lens and accelerator is given in Fig. 1. This field emission system is designed to be used with an electron microscope operated at 100-150kV in the conventional transmission mode. The electron optical system used to control the imaging of the field emission beam on the specimen consists of a weak condenser lens and the pre-field of a strong objective lens. The pre-accelerator lens is an einzel lens and is operated together with the accelerator in the constant angular magnification mode (CAM).

Nucleation and initial growth of Pd2Si crystals on Si(111)

1993 ◽  
Vol 51 ◽  
pp. 844-845
Author(s):  
Xianghong Tong ◽  
Oliver Pohland ◽  
J. Murray Gibson
Keyword(s):  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Initial Growth ◽  
Surface And Interface ◽  
Dark Field Imaging ◽  
Transmission Electron ◽  
Initial Stage ◽  
Effect Of Surface

The nucleation and initial stage of Pd2Si crystals on Si(111) surface is studied in situ using an Ultra-High Vacuum (UHV) Transmission Electron Microscope (TEM). A modified JEOL 200CX TEM is used for the study. The Si(111) sample is prepared by chemical thinning and is cleaned inside the UHV chamber with base pressure of 1x10−9 τ. A Pd film of 20 Å thick is deposited on to the Si(111) sample in situ using a built-in mini evaporator. This room temperature deposited Pd film is thermally annealed subsequently to form Pd2Si crystals. Surface sensitive dark field imaging is used for the study to reveal the effect of surface and interface steps.The initial growth of the Pd2Si has three stages: nucleation, growth of the nuclei and coalescence of the nuclei. Our experiments shows that the nucleation of the Pd2Si crystal occurs randomly and almost instantaneously on the terraces upon thermal annealing or electron irradiation.

On the Faceting of Polar Ceramic Surfaces: Microscopy and Holography Studies of MGO(111) Surfaces

1996 ◽  
Vol 54 ◽  
pp. 366-367
Author(s):  
M. Gajdardziska-Josifovska ◽  
B. G. Frost ◽  
E. Völkl ◽  
L. F. Allard
Keyword(s):  
Electron Microscopy ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Electron Holography ◽  
Flat Surfaces ◽  
Transmission Electron ◽  
Excess Surface ◽  
Polar Surfaces ◽  
Salt Structure ◽  
Crystallographic Planes

Polar surfaces are those crystallographic faces of ionically bonded solids which, when bulk terminated, have excess surface charge and a non-zero dipole moment perpendicular to the surface. In the case of crystals with a rock salt structure, {111} faces are the exemplary polar surfaces. It is commonly believed that such polar surfaces facet into neutral crystallographic planes to minimize their surface energy. This assumption is based on the seminal work of Henrich which has shown faceting of the MgO(111) surface into {100} planes giving rise to three sided pyramids that have been observed by scanning electron microscopy. These surfaces had been prepared by mechanical polishing and phosphoric acid etching, followed by Ar+ sputtering and 1400 K annealing in ultra-high vacuum (UHV). More recent reflection electron microscopy studies of MgO(111) surfaces, annealed in the presence of oxygen at higher temperatures, have revealed relatively flat surfaces stabilized by an oxygen rich reconstruction. In this work we employ a combination of optical microscopy, transmission electron microscopy, and electron holography to further study the issue of surface faceting.

Transmission Electron Microscopy of Epitaxial silicides grown by ultra high vacuum deposition

1989 ◽  
Vol 47 ◽  
pp. 462-463
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Transmission Electron

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.

Modifications of a JEOL 2000EX TEM for insSitu surface studies

1993 ◽  
Vol 51 ◽  
pp. 640-641
Author(s):  
Michael T. Marshall ◽  
Xianghong Tong ◽  
J. Murray Gibson
Keyword(s):  
Electron Diffraction ◽  
Surface Science ◽  
Film Growth ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Transmission Electron ◽  
Fundamental Insight

We have modified a JEOL 2000EX Transmission Electron Microscope (TEM) to allow in-situ ultra-high vacuum (UHV) surface science experiments as well as transmission electron diffraction and imaging. Our goal is to support research in the areas of in-situ film growth, oxidation, and etching on semiconducter surfaces and, hence, gain fundamental insight of the structural components involved with these processes. The large volume chamber needed for such experiments limits the resolution to about 30 Å, primarily due to electron optics. Figure 1 shows the standard JEOL 2000EX TEM. The UHV chamber in figure 2 replaces the specimen area of the TEM, as shown in figure 3. The chamber is outfitted with Low Energy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), Residual Gas Analyzer (RGA), gas dosing, and evaporation sources. Reflection Electron Microscopy (REM) is also possible. This instrument is referred to as SHEBA (Surface High-energy Electron Beam Apparatus).The UHV chamber measures 800 mm in diameter and 400 mm in height. JEOL provided adapter flanges for the column.

scholarly journals Au(100) as a Template for Pentacene Monolayer

Molecules ◽  
2021 ◽  
Vol 26 (8) ◽  
pp. 2393
Author(s):  
Artur Trembułowicz ◽  
Agata Sabik ◽  
Miłosz Grodzicki
Keyword(s):  
Self Assembly ◽  
Molecular Layer ◽  
High Vacuum ◽  
Gold Surface ◽  
Ultra High Vacuum ◽  
Scanning Tunneling ◽  
Tunneling Microscopy ◽  
Height Difference ◽  
Characteristic Features ◽  
Reconstructed Surface

The surface of quasi-hexagonal reconstructed Au(100) is used as the template for monolayer pentacene (PEN) self-assembly. The system is characterized by means of scanning tunneling microscopy at room temperature and under an ultra-high vacuum. A new modulated pattern of molecules with long molecular axes (MA) arranged along hex stripes is found. The characteristic features of the hex reconstruction are preserved herein. The assembly with MA across the hex rows leads to an unmodulated structure, where the molecular layer does not recreate the buckled hex phase. The presence of the molecules partly lifts the reconstruction—i.e., the gold hex phase is transformed into a (1×1) phase. The arrangement of PEN on the gold (1×1) structure is the same as that of the surrounding molecular domain on the reconstructed surface. The apparent height difference between phases allows for the distinction of the state of the underlying gold surface.

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