Point defect generation during the oxidation of silicon
The interstitial defects created during ion-implantation in silicon condense out during annealing to form extrinsically faulted Frank loops and perfect dislocation loops. The annealing behaviour of these defects has been investigated by annealing electron microscope thin foils. It was found that the loops shrink and eventually disappear after annealing in the temperature range 900-1020° C in vacuum. Figure 1a shows faulted and perfect loops after implanting with 10 15 boron ions cm-2 at 40kV and bulk annealing for 50 minutes in nitrogen at 950° C. The thin foil was then annealed for 30 minutes at 1000° C in vacuum and figure 1b shows that the loops have shrunk during this treatment.The loop shrinkage is caused by the diffusion of interstitial point defects from the loop to the surface and the driving force for this process is provided by the self energy of the loops. The rate of shrinkage is given bywhere A is a geometrical factor, Ds is the coefficient of self diffusion and ΔF is the change in the free energy of the loop per emitted interstitial.