Tuning the Plasmonic Response of AuGe Nanoparticles on GaAs Substrates: Implications for Photodetectors

2021 ◽  
Vol 4 (9) ◽  
pp. 9566-9583
Author(s):  
Lavi Tyagi ◽  
Mahesh Kumar ◽  
Sritoma Paul ◽  
Shubham Mondal ◽  
Nagendra S. Chauhan ◽  
...  
Keyword(s):  
Gaas Substrates

Microstructure studies of tungsten silicide schottky contacts on Gaas

1987 ◽  
Vol 45 ◽  
pp. 328-329
Author(s):  
Yih-Cheng Shih ◽  
E. L. Wilkie
Keyword(s):  
Thermal Stability ◽  
Field Effect Transistors ◽  
Schottky Contact ◽  
Schottky Contacts ◽  
Excellent Thermal Stability ◽  
Barrier Heights ◽  
Gaas Substrates ◽  
Film Adhesion ◽  
Threshold Voltages ◽  
Thermal Stability Of

Tungsten silicides (WSix) have been successfully used as the gate materials in self-aligned GaAs metal-semiconductor-field- effect transistors (MESFET). Thermal stability of the WSix/GaAs Schottky contact is of major concern since the n+ implanted source/drain regions must be annealed at high temperatures (∼ 800°C). WSi0.6 was considered the best composition to achieve good device performance due to its low stress and excellent thermal stability of the WSix/GaAs interface. The film adhesion and the uniformity in barrier heights and ideality factors of the WSi0.6 films have been improved by depositing a thin layer of pure W as the first layer on GaAs prior to WSi0.6 deposition. Recently WSi0.1 has been used successfully as the gate material in 1x10 μm GaAs FET's on the GaAs substrates which were sputter-cleaned prior to deposition. These GaAs FET's exhibited uniform threshold voltages across a 51 mm wafer with good film adhesion after annealing at 800°C for 10 min.

Charging microscopy and cathodoluminescence imaging of semi-insulating gallium arsenide

1986 ◽  
Vol 44 ◽  
pp. 816-817
Author(s):  
T.C. Sheu ◽  
S. Myhajlenko ◽  
D. Davito ◽  
J.L. Edwards ◽  
R. Roedel ◽  
...  
Keyword(s):  
Integrated Circuits ◽  
Secondary Electron ◽  
Crystal Defects ◽  
Device Performance ◽  
Gaas Wafer ◽  
Surface Charging ◽  
Gaas Substrates ◽  
Voltage Contrast ◽  
Cathodoluminescence Imaging ◽  
Scanning Electron

Liquid encapsulated Czochralski (LEC) semi-insulating (SI) GaAs has applications in integrated optics and integrated circuits. Yield and device performance is dependent on the homogeniety of the wafers. Therefore, it is important to characterise the uniformity of the GaAs substrates. In this respect, cathodoluminescence (CL) has been used to detect the presence of crystal defects and growth striations. However, when SI GaAs is examined in a scanning electron microscope (SEM), there will be a tendency for the surface to charge up. The surface charging affects the backscattered and secondary electron (SE) yield. Local variations in the surface charge will give rise to contrast (effectively voltage contrast) in the SE image. This may be associated with non-uniformities in the spatial distribution of resistivity. Wakefield et al have made use of “charging microscopy” to reveal resistivity variations across a SI GaAs wafer. In this work we report on CL imaging, the conditions used to obtain “charged” SE images and some aspects of the contrast behaviour.

Structural properties of GaAs/InGaAs/GaAs (001) and InGaAs/GaAs (001) heterostructures and correlation with electronic properties

1990 ◽  
Vol 48 (4) ◽  
pp. 602-603
Author(s):  
J.M. Bonar ◽  
R. Hull ◽  
R. Malik ◽  
R. Ryan ◽  
J.F. Walker
Keyword(s):  
Band Gap ◽  
Electronic Properties ◽  
Gaas Substrate ◽  
Critical Thickness ◽  
Lattice Mismatch ◽  
Band Offset ◽  
Misfit Dislocations ◽  
Gaas Substrates ◽  
Gaas Structure ◽  
Low X

In this study we have examined a series of strained heteropeitaxial GaAs/InGaAs/GaAs and InGaAs/GaAs structures, both on (001) GaAs substrates. These heterostructures are potentially very interesting from a device standpoint because of improved band gap properties (InAs has a much smaller band gap than GaAs so there is a large band offset at the InGaAs/GaAs interface), and because of the much higher mobility of InAs. However, there is a 7.2% lattice mismatch between InAs and GaAs, so an InxGa1-xAs layer in a GaAs structure with even relatively low x will have a large amount of strain, and misfit dislocations are expected to form above some critical thickness. We attempt here to correlate the effect of misfit dislocations on the electronic properties of this material.The samples we examined consisted of 200Å InxGa1-xAs layered in a hetero-junction bipolar transistor (HBT) structure (InxGa1-xAs on top of a (001) GaAs buffer, followed by more GaAs, then a layer of AlGaAs and a GaAs cap), and a series consisting of a 200Å layer of InxGa1-xAs on a (001) GaAs substrate.

Growth behavior on V-grooved high Miller index GaAs substrates by metalorganic chemical vapor deposition

1995 ◽  
Vol 146 (1-4) ◽  
pp. 482-488 ◽  
Author(s):  
Moo-Sung Kim ◽  
Yong Kim ◽  
Min-Suk Lee ◽  
Young Ju Park ◽  
Seong-II Kim ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Growth Behavior ◽  
Miller Index ◽  
Gaas Substrates ◽  
Metalorganic Chemical

Realization of high detectivity mid-infrared photodiodes based on highly mismatched AlInSb on GaAs substrates

2021 ◽  
Vol 129 (5) ◽  
pp. 053106
Author(s):  
H. Fujita ◽  
Y. Sakurai ◽  
D. Yasuda ◽  
O. Morohara ◽  
H. Geka ◽  
...  
Keyword(s):  
Mid Infrared ◽  
Gaas Substrates ◽  
Infrared Photodiodes

The effect of deposition mechanism on the properties of epitaxial PbS films grown from acidic bath

2021 ◽  
Vol 5 (6) ◽  
pp. 2860-2866
Author(s):  
Maayan Perez ◽  
Michael Shandalov ◽  
Yuval Golan ◽  
Tzvi Templeman ◽  
Vladimir Ezersky ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Deposition Mechanism ◽  
Gaas Substrates ◽  
Acidic Bath

Monocrystalline, epitaxial PbS thin films were deposited from acidic bath on GaAs substrates. The effect of deposition mechanism on the optical properties of the films was analyzed using the Urbach theory.

Material characteristics of metalorganic chemical vapor deposition of Bi2Te3 films on GaAs substrates

2006 ◽  
Vol 290 (2) ◽  
pp. 441-445 ◽  
Author(s):  
Yong-Chul Jung ◽  
Jeong-Hun Kim ◽  
Sang-Hee Suh ◽  
Byeong-Kwon Ju ◽  
Jin-Sang Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Gaas Substrates ◽  
Material Characteristics ◽  
Metalorganic Chemical

Molecular-beam-epitaxial growth of Ga1−xInxSb on GaAs substrates

1997 ◽  
Vol 175-176 ◽  
pp. 883-887 ◽  
Author(s):  
J.H. Roslund ◽  
O. Zsebők ◽  
G. Swenson ◽  
T.G. Andersson
Keyword(s):  
Epitaxial Growth ◽  
Molecular Beam ◽  
Molecular Beam Epitaxial ◽  
Gaas Substrates ◽  
Molecular Beam Epitaxial Growth

The facet evolution during metalorganic vapor phase epitaxial growth on V-grooved high Miller index GaAs substrates

1994 ◽  
Vol 139 (3-4) ◽  
pp. 231-237 ◽  
Author(s):  
Moo-Sung Kim ◽  
Yong Kim ◽  
Min-Suk Lee ◽  
Young Ju Park ◽  
Seong-Il Kim ◽  
...  
Keyword(s):  
Epitaxial Growth ◽  
Vapor Phase ◽  
Miller Index ◽  
Gaas Substrates

Observation of peripheral charge induced low frequency capacitance-voltage behaviour in metal-oxide-semiconductor capacitors on Si and GaAs substrates

2012 ◽  
Vol 111 (12) ◽  
pp. 124104 ◽  
Author(s):  
É. O’Connor ◽  
K. Cherkaoui ◽  
S. Monaghan ◽  
D. O’Connell ◽  
I. Povey ◽  
...  
Keyword(s):  
Metal Oxide ◽  
Low Frequency ◽  
Metal Oxide Semiconductor ◽  
Oxide Semiconductor ◽  
Gaas Substrates ◽  
Capacitance Voltage
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