A comparative study on the evolution of the interface chemistry and electrical performance of ALD-driven HfxTiyAlzO nanolaminates
Keyword(s):
Ternary HfTiO and TiAlO films and quaternary HfTiAlO films prepared with different stoichiometric ratios via atomic layer deposition were deposited on Si substrates. HfTiAlO possesses more excellent interface performance and electrical properties than HfTiO and TiAlO.
2008 ◽
Vol 155
(4)
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pp. H267
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2005 ◽
Vol 20
(10)
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pp. 1044-1051
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2006 ◽
Vol 252
(24)
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pp. 8506-8509
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2012 ◽
Vol 12
(7)
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pp. 5598-5603
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2016 ◽
Vol 129
(1a)
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pp. A-36-A-40
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2020 ◽
Vol 8
(4)
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pp. 1344-1352
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