Record low SiO2/Si interface state density for low temperature oxides prepared by direct plasma‐enhanced chemical vapor deposition
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1993 ◽
Vol 36
(2)
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pp. 279-284
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1998 ◽
Keyword(s):
1998 ◽
Vol 16
(5)
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pp. 2931-2940
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High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2006 ◽
Vol 10
(3)
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pp. 457-466
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