Adaptation of an X‐Ray Diffractometer for Thin Film Studies by Total Reflection of X Rays

In the EPMA of soft x rays anomalies in the background are found for several elements. In the literature extremely high backgrounds in the region of the OKα line are reported for C, Al, Si, Mo, and Zr. We found the same effect also for Boron (Fig. 1). For small glancing angles θ, the background measured using a LdSte crystal is significantly higher for B compared with BN and C, although the latter are of higher atomic number. It would be expected, that , characteristic radiation missing, the background IB (bremsstrahlung) is proportional Zn by variation of the atomic number of the target material. According to Kramers n has the value of unity, whereas Rao-Sahib and Wittry proposed values between 1.12 and 1.38 , depending on Z, E and Eo. In all cases IB should increase with increasing atomic number Z. The measured values are in discrepancy with the expected ones.

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Problems in Thin-Film X-ray Quantification

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100135897 ◽

1990 ◽

Vol 48 (2) ◽

pp. 458-459

Author(s):

J N Chapman ◽

W A P Nicholson

Keyword(s):

Thin Film ◽

Specimen Thickness ◽

X Rays ◽

Characteristic Peak ◽

Local Composition ◽

X Ray ◽

Measured Ratio ◽

Path Lengths ◽

Composition Changes

Energy dispersive x-ray microanalysis (EDX) is widely used for the quantitative determination of local composition in thin film specimens. Extraction of quantitative data is usually accomplished by relating the ratio of the number of atoms of two species A and B in the volume excited by the electron beam (nA/nB) to the corresponding ratio of detected characteristic photons (NA/NB) through the use of a k-factor. This leads to an expression of the form nA/nB = kAB NA/NB where kAB is a measure of the relative efficiency with which x-rays are generated and detected from the two species.Errors in thin film x-ray quantification can arise from uncertainties in both NA/NB and kAB. In addition to the inevitable statistical errors, particularly severe problems arise in accurately determining the former if (i) mass loss occurs during spectrum acquisition so that the composition changes as irradiation proceeds, (ii) the characteristic peak from one of the minority components of interest is overlapped by the much larger peak from a majority component, (iii) the measured ratio varies significantly with specimen thickness as a result of electron channeling, or (iv) varying absorption corrections are required due to photons generated at different points having to traverse different path lengths through specimens of irregular and unknown topography on their way to the detector.

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How to Use the Features of Total Reflection of X-Rays for Energy Dispersive XRF

Advances in X-ray Analysis ◽

10.1154/s037603080002036x ◽

1988 ◽

Vol 32 ◽

pp. 105-114 ◽

Cited By ~ 2

Author(s):

H. Schwenke ◽

W. Berneike ◽

J. Knoth ◽

U. Weisbrod

Keyword(s):

Thin Films ◽

Penetration Depth ◽

Fluorescence Analysis ◽

Total Reflection ◽

X Rays ◽

X Ray ◽

Characteristic Features ◽

Respective Characteristic ◽

Nanometer Regime ◽

Sensitive Method

AbstractThe total reflection of X-rays is mainly determined by three parameters , that is the orltical angle, the reflectivity and the penetration depth. For X-ray fluorescence analysis the respective characteristic features can be exploited in two rather different fields of application. In the analysis of trace elements in samples placed as thin films on optical flats, detection limits as low as 2 pg or 0.05 ppb, respectively, have been obtained. In addition, a penetration depth in the nanometer regime renders Total Reflection XRF an inherently sensitive method for the elemental analysis of surfaces. This paper outlines the main physical and constructional parameters for instrumental design and quantitation in both branches of TXRF.

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X–ray absorption fine structure (XAFS) of Si wafer measured using total reflection X–rays

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/s0584-8547(98)00209-2 ◽

1999 ◽

Vol 54 (1) ◽

pp. 215-222 ◽

Cited By ~ 7

Author(s):

Jun Kawai ◽

Shinjiro Hayakawa ◽

Yoshinori Kitajima ◽

Yohichi Gohshi

Keyword(s):

Fine Structure ◽

Total Reflection ◽

X Rays ◽

X Ray ◽

Absorption Fine ◽

X Ray Absorption ◽

Si Wafer

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Synchrotron X-ray Microdiffraction Images of Polarization Switching in Epitaxial PZT Capacitors with Pt and SrRuO3 Top Electrodes

MRS Proceedings ◽

10.1557/proc-784-c6.4 ◽

2003 ◽

Vol 784 ◽

Author(s):

Dal-Hyun Do ◽

Dong Min Kim ◽

Chang-Beom Eom ◽

Eric M. Dufresne ◽

Eric D. Isaacs ◽

...

Keyword(s):

Thin Film ◽

Bottom Electrode ◽

Sputter Deposition ◽

Ferroelectric Polarization ◽

X Rays ◽

X Ray ◽

Pzt Film ◽

Thin Film Capacitors ◽

Pzt Thin Film ◽

Switchable Polarization

ABSTRACTThe evolution of stored ferroelectric polarization in PZT thin film capacitors was imaged using synchrotron x-ray microdiffraction with a submicron-diameter focused incident x-ray beam. To form the capacitors, an epitaxial Pb(Zr,Ti)O3 (PZT) thin film was deposited on an epitaxially-grown conductive SrRuO3 (SRO) bottom electrode on a SrTiO3 (STO) (001) substrate. Polycrystalline SRO or Pt top electrodes were prepared by sputter deposition through a shadow mask and subsequent annealing. The intensity of x-ray reflections from the PZT film depended on the local ferroelectric polarization. With 10 keV x-rays, regions of opposite polarization differed in intensity by 26% in our PZT capacitor with an SRO top electrode. Devices with SRO electrodes showed just a 25% decrease in the remnant polarization after 107 switching cycles. In devices with Pt top electrodes, however, the switchable polarization decreased a by 70% after only 5×104 cycles.

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Nanofocusing Optics for an X-Ray Free-Electron Laser Generating an Extreme Intensity of 100 EW/cm2 Using Total Reflection Mirrors

Applied Sciences ◽

10.3390/app10072611 ◽

2020 ◽

Vol 10 (7) ◽

pp. 2611

Author(s):

Hirokatsu Yumoto ◽

Yuichi Inubushi ◽

Taito Osaka ◽

Ichiro Inoue ◽

Takahisa Koyama ◽

...

Keyword(s):

Photon Energy ◽

Pulse Energy ◽

Free Electron ◽

Free Electron Laser ◽

Total Reflection ◽

Experimental Chamber ◽

X Rays ◽

X Ray ◽

Set Up ◽

Focused Beam

A nanofocusing optical system—referred to as 100 exa—for an X-ray free-electron laser (XFEL) was developed to generate an extremely high intensity of 100 EW/cm2 (1020 W/cm2) using total reflection mirrors. The system is based on Kirkpatrick-Baez geometry, with 250-mm-long elliptically figured mirrors optimized for the SPring-8 Angstrom Compact Free-Electron Laser (SACLA) XFEL facility. The nano-precision surface employed is coated with rhodium and offers a high reflectivity of 80%, with a photon energy of up to 12 keV, under total reflection conditions. Incident X-rays on the optics are reflected with a large spatial acceptance of over 900 μm. The focused beam is 210 nm × 120 nm (full width at half maximum) and was evaluated at a photon energy of 10 keV. The optics developed for 100 exa efficiently achieved an intensity of 1 × 1020 W/cm2 with a pulse duration of 7 fs and a pulse energy of 150 μJ (25% of the pulse energy generated at the light source). The experimental chamber, which can provide different stage arrangements and sample conditions, including vacuum environments and atmospheric-pressure helium, was set up with the focusing optics to meet the experimental requirements.

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Grazing-incidence X-ray scattering of lamellar thin films

Journal of Applied Crystallography ◽

10.1107/s1600576719000402 ◽

2019 ◽

Vol 52 (2) ◽

pp. 247-251

Author(s):

Detlef-M. Smilgies

Keyword(s):

Thin Film ◽

Thin Films ◽

Small Molecules ◽

Film Studies ◽

Grazing Incidence ◽

Semicrystalline Polymers ◽

X Ray ◽

X Ray Scattering ◽

Incident Plane ◽

Ray Scattering

Recently, surface and thin-film studies using area detectors have become prevalent. An important class of such systems are lamellar thin films formed by small molecules, liquid crystals or semicrystalline polymers. Frequently, the lamellae align more or less parallel to the substrate. Such structures can be easily discerned by their characteristic X-ray scattering close to the incident plane. This paper describes how such patterns can be simulated, in order to extract morphological information about the thin film.

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Energy distribution of μd1s muonic atom and its spin states effecting on muonic X-Ray transfer yield in solid thin film method

International Journal of Modern Physics E ◽

10.1142/s0218301314500062 ◽

2014 ◽

Vol 23 (02) ◽

pp. 1450006 ◽

Cited By ~ 1

Author(s):

R. Gheisari ◽

M. Afshari ◽

K. Khorshidian

Keyword(s):

Thin Film ◽

Energy Distribution ◽

Muonic Atom ◽

Rate Equations ◽

Spin States ◽

X Rays ◽

X Ray ◽

Solid Deuterium ◽

Molecular Formation ◽

Film Method

We have investigated the energy distribution of [Formula: see text] and its spin states (F) effecting on muonic X-ray transfer yield in the solid thin film method. Argon ( Ar ) ion has been considered as the implanted ion in solid deuterium (s D 2) layer at a temperature of T = 3 K. A kinetics model has been used, the corresponding rate equations have been constructed and our results of X-ray yield have been compared with recent measured data. The μd1s muonic atoms, which can take part in resonant molecular formation, have been separated from atoms participating in nonresonant reactions. On this basis, the integrated number of X-rays has been calculated. The results show that the effect of μd1s energy distribution on the number of X-photons is not serious, while its spin states strongly affect the muonic X-ray yield.

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Energy Dispersive Grazing Incidence X-ray Diffraction Study on Organic Thin Films EpitaxiaHy Grown on Crystalline Substrate

Advances in X-ray Analysis ◽

10.1154/s0376030800023090 ◽

1995 ◽

Vol 39 ◽

pp. 659-664 ◽

Cited By ~ 1

Author(s):

Kenji Ishida ◽

Akinori Kita ◽

Kouichi Hayashi ◽

Toshihisa Horiuchi ◽

Shoichi Kal ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Film Studies ◽

Organic Thin Films ◽

Grazing Incidence ◽

X Ray Diffraction ◽

X Ray ◽

Structural Evaluation ◽

Crystalline Substrate ◽

Scattering Volume

Thin film technology is rapidly evolving today, and the characterization of the thin film and its surface have become very important issue not only from scientific but also technological viewpoints. Although x-ray diffraction measurements have been used as suitable evaluation methods in crystallography studies, its application to the structural evaluation of the thin films, especially organic one having the low electron densities, is not easy due to the small amounts of scattering volume and the high obstructive scattering noise from the substrate. However, the x-ray diffraction measurements under grazing incidence will aid not only in overcoming the such problems but also in analyzing in-plane structure of the thin films. Therefore, so-called grazing incidence x-ray diffraction (GIXD) has been recognized as one of the most powerful tools for the surface and thin film studies.

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Measurements of Soft and Ultrasoft X-Rays with Total Reflection Monochromator

Advances in X-ray Analysis ◽

10.1154/s0376030800021315 ◽

1986 ◽

Vol 30 ◽

pp. 213-223

Author(s):

Tomoya Arai

Keyword(s):

Gas Flow ◽

Bragg Reflection ◽

Optical Resolution ◽

Fluorescence Analysis ◽

Total Reflection ◽

X Rays ◽

Light Elements ◽

Lower Intensity ◽

Measured Intensity ◽

X Ray

The development of X-ray spectrographic analysis of light elements, which are O, C and B, has bee n performed for many applications using an end-window type X-ray tube with Rh-target and thin Be-window, wavelength dispersing devices, which are synthetic multilayers or total reflection mirror (with a specific filter) and a gas flow proportional counter with a thin film window. In Fig. 1 factors related to the intensity measurements in X-ray fluorescence analysis are shown. The excitation efficiency in the soft and ultrasoft X-ray region is very low because of the lower intensity of primary X-rays and low fluorescence yield of light elements. Instead of the wavelength dispersive method of Bragg reflection, having high resolution and low reflectivity, monochromatization combining total reflection by a selected mirror and an appropriate filter offered an alternate approach in order to increase measured intensity with reasonable optical resolution. Synthetic multilayers which have higher resolution and lower intensity compared with the performance of the mirror method have become popular for the detection of soft and ultrasoft X-ray region.

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