Publisher’s Note: “Growth of residual stress-free ZnO films on SiO2/Si substrate at room temperature for MEMS devices” [AIP Advances 5, 067140 (2015)]

This paper describes an experimental investigation on the infrared radiative properties of heavily-doped silicon (Si) at room temperature. Lightly-doped Si wafers were ion implanted with boron and phosphorus atoms to doping concentrations of 1×1020 and 1×1021 cm−3. Rapid thermal annealing was performed to activate the implanted dopants. A Fourier-transform infrared spectrometer was employed to measure the normal transmittance as well as reflectance of the samples in the spectral region from 2 to 20 μm. Accurate carrier mobility and ionization models were identified after carefully reviewing the available literature, and then incorporated into Drude model to predict the dielectric function of doped Si. The radiative properties of doped Si samples were calculated by treating the doped region as multilayer thin films of different doping concentrations on a thick Si substrate. The measured spectral transmittance and reflectance agree well with the model predictions. The results obtained from this study will facilitate the future applications of heavily-doped Si in semiconductor as well as MEMS devices.

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A crystallographic analysis of the CoSi/Si(111) interface using Transmission Electron Microscopy

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100176009 ◽

1990 ◽

Vol 48 (4) ◽

pp. 574-575

Author(s):

A.C. Daykin ◽

C.J. Kiely ◽

R.C. Pond ◽

J.L. Batstone

Keyword(s):

Electron Microscopy ◽

Transmission Electron Microscopy ◽

Defect Structure ◽

Room Temperature ◽

Theoretical Method ◽

Crystallographic Analysis ◽

Si Substrate ◽

Transmission Electron ◽

Theoretical Predictions

When CoSi2 is grown onto a Si(111) surface it can form in two distinct orientations. A-type CoSi2 has the same orientation as the Si substrate and B-type is rotated by 180° degrees about the [111] surface normal.One method of producing epitaxial CoSi2 is to deposit Co at room temperature and anneal to 650°C.If greater than 10Å of Co is deposited then both A and B-type CoSi2 form via a number of intermediate silicides .The literature suggests that the co-existence of A and B-type CoSi2 is in some way linked to these intermediate silicides analogous to the NiSi2/Si(111) system. The phase which forms prior to complete CoSi2 formation is CoSi. This paper is a crystallographic analysis of the CoSi2/Si(l11) bicrystal using a theoretical method developed by Pond. Transmission electron microscopy (TEM) has been used to verify the theoretical predictions and to characterise the defect structure at the interface.

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Characterization of the order-annealing response of nanostructured iron-palladium based ferromagnetic thin-films

MRS Proceedings ◽

10.1557/proc-703-v3.4 ◽

2001 ◽

Vol 703 ◽

Author(s):

Huiping Xu ◽

Adam T. Wise ◽

Timothy J. Klemmer ◽

Jörg M. K. Wiezorek

Keyword(s):

Thin Films ◽

Grain Growth ◽

Room Temperature ◽

Si Substrate ◽

Ferromagnetic Thin Films ◽

Precipitation Reactions ◽

Post Deposition ◽

Xrd And Tem ◽

Iron Palladium

ABSTRACTA combination of XRD and TEM techniques have been used to characterize the response of room temperature magnetron sputtered Fe-Pd thin films on Si-susbtrates to post-deposition order-annealing at temperatures between 400-500°C. Deposition produced the disordered Fe-Pd phase with (111)-twinned grains approximately 18nm in size. Ordering occurred for annealing at 450°C and 500°C after 1.8ks, accompanied by grain growth (40-70nm). The ordered FePd grains contained (111)-twins rather than {101}-twins typical of bulk ordered FePd. The metallic overlayers and underlayers selected here produced detrimental dissolution (Pt into Fe-Pd phases) and precipitation reactions between Pd and the Si substrate.

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