Observation of in situ oxidation dynamics of vanadium thin film with ambient pressure X-ray photoemission spectroscopy

2016 ◽  
Vol 120 (20) ◽  
pp. 205305 ◽  
Author(s):  
Geonhwa Kim ◽  
Joonseok Yoon ◽  
Hyukjun Yang ◽  
Hojoon Lim ◽  
Hyungcheol Lee ◽  
...  
2008 ◽  
Vol 103 (4) ◽  
pp. 044104 ◽  
Author(s):  
Massimiliano Rossi ◽  
Bongjin S. Mun ◽  
Yoshiharu Enta ◽  
Charles S. Fadley ◽  
Ki-Suk Lee ◽  
...  

2013 ◽  
Vol 253 ◽  
pp. 110-118 ◽  
Author(s):  
Takashi Tsuchiya ◽  
Shogo Miyoshi ◽  
Yoshiyuki Yamashita ◽  
Hideki Yoshikawa ◽  
Kazuya Terabe ◽  
...  

2021 ◽  
Vol 4 (1) ◽  
Author(s):  
Marc Benjamin Hahn ◽  
Paul M. Dietrich ◽  
Jörg Radnik

AbstractIonizing radiation damage to DNA plays a fundamental role in cancer therapy. X-ray photoelectron-spectroscopy (XPS) allows simultaneous irradiation and damage monitoring. Although water radiolysis is essential for radiation damage, all previous XPS studies were performed in vacuum. Here we present near-ambient-pressure XPS experiments to directly measure DNA damage under water atmosphere. They permit in-situ monitoring of the effects of radicals on fully hydrated double-stranded DNA. The results allow us to distinguish direct damage, by photons and secondary low-energy electrons (LEE), from damage by hydroxyl radicals or hydration induced modifications of damage pathways. The exposure of dry DNA to x-rays leads to strand-breaks at the sugar-phosphate backbone, while deoxyribose and nucleobases are less affected. In contrast, a strong increase of DNA damage is observed in water, where OH-radicals are produced. In consequence, base damage and base release become predominant, even though the number of strand-breaks increases further.


2016 ◽  
Vol 23 (5) ◽  
pp. 1110-1117 ◽  
Author(s):  
M. V. Vitorino ◽  
Y. Fuchs ◽  
T. Dane ◽  
M. S. Rodrigues ◽  
M. Rosenthal ◽  
...  

A compact high-speed X-ray atomic force microscope has been developed forin situuse in normal-incidence X-ray experiments on synchrotron beamlines, allowing for simultaneous characterization of samples in direct space with nanometric lateral resolution while employing nanofocused X-ray beams. In the present work the instrument is used to observe radiation damage effects produced by an intense X-ray nanobeam on a semiconducting organic thin film. The formation of micrometric holes induced by the beam occurring on a timescale of seconds is characterized.


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