Electrical characterization of junctions and bipolar transistors formed with in situ doped low-temperature (800 degrees C) epitaxial silicon

1991 ◽  
Vol 38 (1) ◽  
pp. 128-134
Author(s):  
S. Ohi ◽  
W.R. Burger ◽  
R. Reif
2018 ◽  
Vol 86 (16) ◽  
pp. 47-53
Author(s):  
Sylvain Lemettre ◽  
Clément Bessouet ◽  
Philippe Coste ◽  
Helene Lecoq ◽  
Thierry Sauvage ◽  
...  

1991 ◽  
Vol 241 ◽  
Author(s):  
Bijan Tadayon ◽  
Mohammad Fatemi ◽  
Saied Tadayon ◽  
F. Moore ◽  
Harry Dietrich

ABSTRACTWe present here the results of a study on the effect of substrate temperature, Ts, on the electrical and physical characteristics of low temperature (LT) molecular beam epitaxy GaAs layers. Hall measurements have been performed on the asgrown samples and on samples annealed at 610 °C and 850 °C. Si implantation into these layers has also been investigated.


AIP Advances ◽  
2014 ◽  
Vol 4 (11) ◽  
pp. 117126 ◽  
Author(s):  
L. Arzubiaga ◽  
F. Golmar ◽  
R. Llopis ◽  
F. Casanova ◽  
L. E. Hueso

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