Reliability and Improved Performance of AlGaN/GaN High Electron Mobility Transistor Structures

Author(s):  
Svetlana A. Vitusevich ◽  
Andrey M. Kurakin ◽  
Norbert Klein ◽  
Michail V. Petrychuk ◽  
Andrey.V. Naumov ◽  
...  
2008 ◽  
Vol 44 (12) ◽  
pp. 771 ◽  
Author(s):  
L.-Y. Chen ◽  
S.-Y. Cheng ◽  
K.-Y. Chu ◽  
C.-W. Hung ◽  
T.-P. Chen ◽  
...  

2021 ◽  
Vol 13 (1) ◽  
pp. 30-35
Author(s):  
Ching-Hong Chang ◽  
Yue-Chang Lin ◽  
Jing-Shiuan Niu ◽  
Wen-Shiung Lour ◽  
Jung-Hui Tsai ◽  
...  

In this work, an AlGaN/GaN enhancement-mode high electron mobility transistor (HEMT) with two-step gate recess and electroless plating (EP) approaches is reported. Scanning electron microscopy and atomic force microscopy surface analysis are used to analysis the related properties of the EP-gate structure. A positive threshold voltage Vthof 0.68 V is obtained for the enhancement-mode EP-HEMT. In addition, a traditional HEMT based on thermal-evaporation gate is compared for the demonstration of the studied EP-HEMT with the improved performance, such as a higher maximum drain saturation current of 228.9 mA/mm, a higher maximum transconductance of 107.2 mS/mm, a lower gate leakage current of 1.2 × 10–7 mA/mm, and a higher ON/OFF drain current ratio of 4.57 × 105.


Author(s):  
T. D. Subash ◽  
T. Gnanasekaran ◽  
P. Deepthi Nair

The performance of AlInSb/InSb heterostructure with various parameters is considered with T-Cad simulation. As the heterojunctions are having more advantageous properties that is a real support for so many application such as solar cells, semiconductor cells and transistors. Special properties of semiconductors are discussed here with various parameters that are depending up on the performance of accurate device [Pardeshi H., Pati S. K., Raj G., Mohankumar N., Sarkar C. K., J. Semicond. 33(12):124001-1–124001-7, 2012]. The maximum drain current density is achieved with improving the density of two-dimensional electron gas (2DEG) and with high velocity. High electron mobility transistor (HEMT) structure is used with the different combinations of layers which have different bandgaps. Parameters such as electron mobility, bandgap, dielectric constant, etc., are considered differently for each layer [Zhang A., Zhang L., Tang Z., IEEE Trans. Electron Devices 61(3):755–761, 2014]. The high electron mobility electrons are now widely used in so many applications. The proposed work of AlInSb/InSb heterostructure implements the same process which will be a promise for future research works.


2019 ◽  
Vol 217 (7) ◽  
pp. 1900694
Author(s):  
Uiho Choi ◽  
Donghyeop Jung ◽  
Kyeongjae Lee ◽  
Taemyung Kwak ◽  
Taehoon Jang ◽  
...  

2006 ◽  
Vol 45 (No. 35) ◽  
pp. L932-L934 ◽  
Author(s):  
Li-Hsin Chu ◽  
Heng-Tung Hsu ◽  
Edward-Yi Chang ◽  
Tser-Lung Lee ◽  
Sze-Hung Chen ◽  
...  

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