Measuring Human Eye Tolerance Towards the Digital Typography Sharpness on a High-Density Pixel Computer Screen: An Indicative Study

2021 ◽  
Author(s):  
Yulius Yulius ◽  
Malini Mittal Bishnoi ◽  
Anshu Singh
Keyword(s):  
High Density ◽  
Computer Screen ◽  
Human Eye

scholarly journals Amblyopia

2019 ◽  
Vol 2 (19) ◽  
pp. 14
Author(s):  
Paula Gortázar ◽  
Ramón Esparza
Keyword(s):  
Gravure Printing ◽  
Computer Screen ◽  
Human Eye ◽  
Complex Term ◽  
Printing Processes ◽  
Printing Techniques

But like everything related to our vision, amblyopia is certainly complex term both to delimite and define. What does it exactly mean to ‘see right’? At present, I am writing this text as I see it through my computer screen, which has a resolution way higher than that of the analogue television we used to watch during our childhood years. But higher resolution undoubtly involves more information that needs to be captured by our sight and later processed by our brains.  Just like it happens when comparing old gravure printing techniques with high-end image printing processes from the present time, the reproduction of certain details in the image and the range of colorous and tones prensent in contemporary photographic prints are often wider than those which the human eye is able to perceive. But would have short-sighted people had the need to use spectacles two centuries ago? Or was the level of deail present in printed (and painted) material vague enough to be perceived by a much larger scope of the population?

scholarly journals Screening Transgenic Mouse Models of Human Eye Diseases with CMOS High-Density Microelectrode Arrays

2016 ◽  
Vol 10 ◽  
Author(s):  
Fiscella Michele ◽  
Yonehara Keisuke ◽  
Drinnenberg Antonia ◽  
Franke Felix ◽  
Mu�ller Jan ◽  
...  
Keyword(s):  
Transgenic Mouse ◽  
Mouse Models ◽  
Microelectrode Arrays ◽  
Eye Diseases ◽  
High Density ◽  
Transgenic Mouse Models ◽  
Human Eye

scholarly journals Human eye-inspired soft optoelectronic device using high-density MoS2-graphene curved image sensor array

2017 ◽  
Vol 8 (1) ◽  
Author(s):  
Changsoon Choi ◽  
Moon Kee Choi ◽  
Siyi Liu ◽  
Min Sung Kim ◽  
Ok Kyu Park ◽  
...  
Keyword(s):  
Sensor Array ◽  
Optoelectronic Device ◽  
Image Sensor ◽  
High Density ◽  
Human Eye ◽  
Image Sensor Array

A New System For Optomanual Semiautomatic Quantitative Image Analysis

1977 ◽  
Vol 35 ◽  
pp. 210-211
Author(s):  
H.P. Rohr
Keyword(s):  
Image Analysis ◽  
Volume Density ◽  
List Type ◽  
Distribution Analysis ◽  
Type Number ◽  
Point Counting ◽  
Human Eye ◽  
Quantitative Image ◽  
Point Density ◽  
Electronic Counting

Today, in image analysis the broadest possible rationalization and economization have become desirable. Basically, there are two approaches for image analysis: The image analysis through the so-called scanning methods which are usually performed without the human eye and the systems of optical semiautomatic analysis completely relying on the human eye.The new MOP AM 01 opto-manual system (fig.) represents one of the very promising approaches in this field. The instrument consists of an electronic counting and storing unit, which incorporates a microprocessor and a keyboard for choice of measuring parameters, well designed for easy use.Using the MOP AM 01 there are three possibilities of image analysis:the manual point counting,the opto-manual point counting andthe measurement of absolute areas and/or length (size distribution analysis included).To determine a point density for the calculation of the corresponding volume density the intercepts lying within the structure are scanned with the light pen.

Planar defects in ordered (Ga,In)P

1988 ◽  
Vol 46 ◽  
pp. 902-903
Author(s):  
S. McKernan ◽  
C. B. Carter ◽  
D. Bour ◽  
J. R. Shealy
Keyword(s):  
Electron Diffraction ◽  
Vapor Phase ◽  
Growth Direction ◽  
High Density ◽  
Ordered Structure ◽  
Planar Defects ◽  
Diffraction Patterns ◽  
Ternary Semiconductors ◽  
Anion Species ◽  
Metallic Vapor

The growth of ternary III-V semiconductors by organo-metallic vapor phase epitaxy (OMVPE) is widely practiced. It has been generally assumed that the resulting structure is the same as that of the corresponding binary semiconductors, but with the two different cation or anion species randomly distributed on their appropriate sublattice sites. Recently several different ternary semiconductors including AlxGa1-xAs, Gaxln-1-xAs and Gaxln1-xP1-6 have been observed in ordered states. A common feature of these ordered compounds is that they contain a relatively high density of defects. This is evident in electron diffraction patterns from these materials where streaks, which are typically parallel to the growth direction, are associated with the extra reflections arising from the ordering. However, where the (Ga,ln)P epilayer is reasonably well ordered the streaking is extremely faint, and the intensity of the ordered spot at 1/2(111) is much greater than that at 1/2(111). In these cases it is possible to image relatively clearly many of the defects found in the ordered structure.

Quantitative defect studies in semiconductor TEM samples prepared by low angle ion milling

1995 ◽  
Vol 53 ◽  
pp. 512-513
Author(s):  
L. Mulestagno ◽  
J.C. Holzer ◽  
P. Fraundorf
Keyword(s):  
Sample Preparation ◽  
Milling Time ◽  
High Density ◽  
Low Density ◽  
Ion Milling ◽  
High Quality ◽  
Variable Angle ◽  
Major Disadvantage ◽  
Induced Defects

Due to the wealth of information, both analytical and structural that can be obtained from it TEM always has been a favorite tool for the analysis of process-induced defects in semiconductor wafers. The only major disadvantage has always been, that the volume under study in the TEM is relatively small, making it difficult to locate low density defects, and sample preparation is a somewhat lengthy procedure. This problem has been somewhat alleviated by the availability of efficient low angle milling.Using a PIPS® variable angle ion -mill, manufactured by Gatan, we have been consistently obtaining planar specimens with a high quality thin area in excess of 5 × 104 μm2 in about half an hour (milling time), which has made it possible to locate defects at lower densities, or, for defects of relatively high density, obtain information which is statistically more significant (table 1).

Using the scanning electron microscope for failure analysis of high density magnetic media

1987 ◽  
Vol 45 ◽  
pp. 392-393
Author(s):  
Evelyn R. Ackerman ◽  
Gary D. Burnett
Keyword(s):  
Electron Microscope ◽  
Scanning Electron Microscope ◽  
Failure Analysis ◽  
High Density ◽  
Magnetic Media ◽  
Specific Data ◽  
Retrieval Systems ◽  
Operating Environments ◽  
The Media ◽  
Scanning Electron

Advancements in state of the art high density Head/Disk retrieval systems has increased the demand for sophisticated failure analysis methods. From 1968 to 1974 the emphasis was on the number of tracks per inch. (TPI) ranging from 100 to 400 as summarized in Table 1. This emphasis shifted with the increase in densities to include the number of bits per inch (BPI). A bit is formed by magnetizing the Fe203 particles of the media in one direction and allowing magnetic heads to recognize specific data patterns. From 1977 to 1986 the tracks per inch increased from 470 to 1400 corresponding to an increase from 6300 to 10,800 bits per inch respectively. Due to the reduction in the bit and track sizes, build and operating environments of systems have become critical factors in media reliability.Using the Ferrofluid pattern developing technique, the scanning electron microscope can be a valuable diagnostic tool in the examination of failure sites on disks.

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