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Short Channel Effects Characterization of 3-D FinFET for High-k Gate Dielectrics
2018 International Conference on Innovations in Science, Engineering and Technology (ICISET)
◽
10.1109/iciset.2018.8745562
◽
2018
◽
Author(s):
Zunaid Ahmed Zaki
◽
Noshin Tanjila
◽
Jibesh K. Saha
Keyword(s):
Gate Dielectrics
◽
Short Channel Effects
◽
Short Channel
◽
High K
◽
Channel Effects
Download Full-text
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Suppression of short channel effects in FinFETs using crystalline ZrO2 high-K/Al2O3 buffer layer gate stack for low power device applications
Semiconductor Science and Technology
◽
10.1088/1361-6641/aaab01
◽
2018
◽
Vol 33
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◽
pp. 035013
◽
Cited By ~ 2
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Meng-Chen Tsai
◽
Chin-I Wang
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Kai-Shin Li
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...
Keyword(s):
Low Power
◽
Buffer Layer
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Power Device
◽
Short Channel Effects
◽
Gate Stack
◽
Short Channel
◽
High K
◽
Channel Effects
◽
Device Applications
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Short-Channel Effects in N- and P-Channel Polysilicon Thin Film Transistors with Very Thin ECR N2O-Plasma Gate Dielectrics
10.7567/ssdm.1997.c-9-5
◽
1997
◽
Author(s):
Jin-Woo Lee
◽
Nae-In Lee
◽
Chul-Hi Han
Keyword(s):
Thin Film
◽
Thin Film Transistors
◽
Gate Dielectrics
◽
Short Channel Effects
◽
Short Channel
◽
Channel Effects
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3-D analytical modeling of high-k gate stack dual-material tri-gate strained silicon-on-nothing MOSFET with dual-material bottom gate for suppressing short channel effects
Journal of Computational Electronics
◽
10.1007/s10825-017-1002-y
◽
2017
◽
Vol 16
(3)
◽
pp. 631-639
◽
Cited By ~ 16
Author(s):
Pritha Banerjee
◽
Subir Kumar Sarkar
Keyword(s):
Analytical Modeling
◽
Strained Silicon
◽
Short Channel Effects
◽
Gate Stack
◽
Short Channel
◽
High K
◽
Channel Effects
◽
Dual Material
◽
Bottom Gate
Download Full-text
Reverse short channel effects in high-k gated nMOSFETs
Microelectronics Reliability
◽
10.1016/j.microrel.2004.11.049
◽
2005
◽
Vol 45
(5-6)
◽
pp. 783-785
Author(s):
J.-P. Han
◽
S.M. Koo
◽
E.M. Vogel
◽
E.P. Gusev
◽
C. D’Emic
◽
...
Keyword(s):
Short Channel Effects
◽
Short Channel
◽
High K
◽
Channel Effects
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Analytical modeling and simulation of multigate FinFET devices and the impact of high-k dielectrics on short channel effects (SCEs)
Superlattices and Microstructures
◽
10.1016/j.spmi.2015.06.004
◽
2015
◽
Vol 85
◽
pp. 357-369
◽
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Author(s):
Vadthiya Narendar
◽
R.A. Mishra
Keyword(s):
Modeling And Simulation
◽
Analytical Modeling
◽
Short Channel Effects
◽
Short Channel
◽
High K
◽
Channel Effects
◽
The Impact
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Detailed Characterization of Contact Resistance, Gate-Bias-Dependent Field-Effect Mobility, and Short-Channel Effects with Microscale Elastomeric Single-Crystal Field-Effect Transistors
Advanced Functional Materials
◽
10.1002/adfm.200990031
◽
2009
◽
Vol 19
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◽
pp. NA-NA
◽
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Author(s):
Colin Reese
◽
Zhenan Bao
Keyword(s):
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◽
Field Effect Transistors
◽
Short Channel Effects
◽
Field Effect Mobility
◽
Short Channel
◽
Detailed Characterization
◽
Crystal Field Effect
◽
Channel Effects
◽
Dependent Field
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Controlling of short channel effects in pocket implanted Ge channel pMOSFETs with high-k gate stacks
10.1117/12.926880
◽
2012
◽
Author(s):
Chandrima Mondal
◽
Abhijit Biswas
Keyword(s):
Short Channel Effects
◽
Gate Stacks
◽
Short Channel
◽
High K
◽
Channel Effects
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Effect of high k-dielectric as gate oxide on short channel effects of junction-less transistor
2013 2nd International Conference on Advances in Electrical Engineering (ICAEE)
◽
10.1109/icaee.2013.6750316
◽
2013
◽
Cited By ~ 1
Author(s):
Ayed Al Sayem
◽
Yeasir Arafat
◽
Md. Mushfiqur Rahman
Keyword(s):
Gate Oxide
◽
Short Channel Effects
◽
Short Channel
◽
High K
◽
Channel Effects
◽
High K Dielectric
Download Full-text
Simulation and optimization of lightly-doped ultra-thin Triple Metal Double Gate (TM-DG) MOSFET with high-K dielectric for diminished short channel effects
2011 2nd International Conference on Computer and Communication Technology (ICCCT-2011)
◽
10.1109/iccct.2011.6075167
◽
2011
◽
Cited By ~ 4
Author(s):
Santosh Kumar Gupta
◽
Achinta Baidya
◽
S. Baishya
Keyword(s):
Double Gate
◽
Short Channel Effects
◽
Short Channel
◽
Simulation And Optimization
◽
High K
◽
Dg Mosfet
◽
Channel Effects
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High K Dielectric
Download Full-text
Short channel effects (SCEs) characterization of underlaped dual-K spacer in dual-metal gate FinFET device
2016 International Conference on Control, Computing, Communication and Materials (ICCCCM)
◽
10.1109/iccccm.2016.7918265
◽
2016
◽
Author(s):
Lucky Agarwal
◽
Brijesh Kumar Singh
◽
R. A. Mishra
◽
Shweta Tripathi
Keyword(s):
Short Channel Effects
◽
Metal Gate
◽
Short Channel
◽
Channel Effects
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Dual Metal
Download Full-text
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