Characterization of Germanium Nanowires-Flexible Substrate Assemblies Integrated via Direct Synthesis Methods

Author(s):  
Justin Rodgers ◽  
Julia Edel ◽  
Johan Rivera ◽  
Ongi Englander

Nanowires are successfully synthesized directly on two types of flexible substrates, Kapton and silicone, to yield integrated compliant assemblies. Reduced temperature catalyst-assisted chemical vapor deposition techniques enable the direct integration processes. The mechanical properties of these assemblies are evaluated using bending tests where tensile or compressive strains are applied to the samples. Crack formation in the form of channeling or debonding, typical of thin films on substrates, is observed. The allowable strain prior to mechanical failure is assessed.

MRS Advances ◽  
2017 ◽  
Vol 2 (60) ◽  
pp. 3709-3714
Author(s):  
Gustavo A. Saenz ◽  
Carlos de Anda Orea ◽  
Anupama B. Kaul

ABSTRACTTwo-dimensional layered materials, materials with weak out-of-plane van der Waals bonding and strong in-plane covalent bonding, have attracted special attention in recent years since the isolation and characterization of monolayer graphite, the graphene. The electrical bandgap in Transition Metal Di-Chalcogenides (TMDCs), non-existent in graphene, make them a good alternative family of materials for novel electronic and optoelectronic applications. 2H- MoS2, one of the most stable TMDCs, has been extensively studied, including the synthesis methods, and its potential applications in photodetection. The chemical vapor deposition (CVD) synthesis method has increased its potential over the years. The advantages of this method are scalability compared to micromechanical exfoliation, common process used in research laboratories, and the maintenance of the quality and intrinsic properties of the material compared to the liquid exfoliation methods. In this work, we synthesized high quality pristine 2H-MoS2 via atmospheric pressure chemical vapor deposition (APCVD) by vapor phase reaction of MoO3 and S powder precursors. The samples were characterized via Raman and photoluminescence (PL) spectroscopy and compared to mechanically exfoliated MoS2 crystal by measuring the full-width half maxima (FWHM) of monolayer and few-layer mesoscopic flakes. In addition, the CVD synthesized single and few-layered MoS2 domains were transferred to different substrates using a high yield process, including a flexible substrate, preserving the quality of the material. Finally, and mechanically exfoliated MoS2 two-terminal photodetector was designed, fabricated, and measured. Demonstrating thus the capability of heterostructure fabrication and the quality of our synthesis and device fabrication process.


Sensors ◽  
2019 ◽  
Vol 19 (23) ◽  
pp. 5190 ◽  
Author(s):  
Miriam Alvarado ◽  
Silvia De La Flor ◽  
Eduard Llobet ◽  
Alfonso Romero ◽  
José Luis Ramírez

Many sensors are developed over flexible substrates to be used as wearables, which does not guarantee that they will actually withstand being bent. This work evaluates the gas sensing performance of metal oxide devices of three different types, before and after having undergone automated, repetitive bending tests. These tests were aimed at demonstrating that the fabricated sensors were actually flexible, which cannot be taken for granted beforehand. The active layer in these sensors consisted of WO3 nanowires (NWs) grown directly over a Kapton foil by means of the aerosol-assisted chemical vapor deposition. Their response to different H2 concentrations was measured at first. Then, they were cyclically bent, and finally, their response to H2 was measured again. Sensors based on pristine WO3-NWs over Ag electrodes and on Pd-decorated NWs over Au electrodes maintained their performance after having been bent. Ag electrodes covered with Pd-decorated NWs became fragile and lost their usefulness. To summarize, two different types of truly flexible metal oxide gas sensor were fabricated, whereas a third one was not flexible, despite being grown over a flexible substrate following the same method. Finally, we recommend that one standard bending test procedure should be established to clearly determine the flexibility of a sensor considering its intended application.


2006 ◽  
Vol 21 (11) ◽  
pp. 2882-2887 ◽  
Author(s):  
Hai Ni ◽  
Xiaodong Li ◽  
Guosheng Cheng ◽  
Robert Klie

The deformation behavior of single-crystal GaN nanowires was studied by directly performing three-point bending tests on each individual nanowire in an atomic force microscope. The elastic modulus calculated from the load–displacement response of the nanowires was 43.9 ± 2.2 GPa. Single-crystal GaN nanowires investigated in this study were synthesized by chemical vapor deposition techniques based on the vapor–liquid–solid growth mechanism and had a diameter range from 60 to 110 nm. Crystalline GaN nanowires did not show obvious plastic deformation in bending and usually failed in a brittle manner.


2017 ◽  
Vol 10 (1) ◽  
pp. 371-380 ◽  
Author(s):  
Qian Shen ◽  
Annie Ng ◽  
Zhiwei Ren ◽  
Huseyin Cem Gokkaya ◽  
Aleksandra B. Djurišić ◽  
...  

2011 ◽  
Vol 208 (10) ◽  
pp. 2443-2449 ◽  
Author(s):  
Justin Rodgers ◽  
Julia Edel ◽  
Johan Rivera ◽  
Ongi Englander

2006 ◽  
Vol 929 ◽  
Author(s):  
Nicholas Ndiege ◽  
Vaidyanathan Subramanian ◽  
Mark Shannon ◽  
Rich Masel

ABSTRACTFilm deposition methods have been the focus of renewed interest in the past decade due to calls for cheaper and more environment friendly deposition techniques as well as better quality of films. This paper describes a novel deposition technique: Microwave assisted chemical vapor deposition (MACVD). This technique utilizes inexpensive equipment and works at temperatures close to room temperature and ambient pressures. Deposition rates are very high (>1 micron a minute) and the resulting films are of high quality i.e. high density, stability. Conventional deposition techniques such as epitaxy, e-beam evaporation and LPCVD can achieve high quality films but the financial and environmental costs are high. This study considers the MACVD of a high k dielectric film (Ta2O5) on silicon for dielectric and insulation applications. Films generated are dense and stable with thicknesses varying from 60 nm to 62 microns. Depth profile studies of 575nm thick MACVD derived films show results similar to that of high quality films generated via MOCVD. Characterization of the resulting films was done using XRD, SEM, XPS, AES and profilometry techniques.


2013 ◽  
Vol 842 ◽  
pp. 289-292
Author(s):  
Wen Bin Huang ◽  
Guang Long Wang ◽  
Feng Qi Gao ◽  
Zhong Tao Qiao ◽  
Gang Wang ◽  
...  

Three-dimensional graphene foam (GF) is synthesized by chemical vapor deposition (CVD) at ~1000°C under ambient pressure. Then it is characterized by scanning electron microscopy (SEM) and laser Raman spectroscopy, the results indicate that GF has changed the surface morphology of Ni foam, and ~ 98% of the GF are fewlayer. At last, the surface wettability of GF is investigated, which shows that it is hydrophobic. The special three-dimensional structure and excellent properties of GF make it a candidate for a range of applications.


MRS Bulletin ◽  
1994 ◽  
Vol 19 (9) ◽  
pp. 33-38 ◽  
Author(s):  
Masashi Kawasaki ◽  
Masashi Nantoh

Epitaxial thin-film growth of high-critical-temperature (Tc) superconductors has been intensively studied not only because it is one of the key technologies for electronic application but also because it provides suitable specimens for elucidating the superconducting mechanism. For simply making thick (>100 nm) epitaxial films, various deposition techniques such as sputtering, pulsed laser deposition (PLD), evaporation, including molecular beam epitaxy (MBE), and chemical vapor deposition (CVD) have been verified as applicable. For instance, high-quality YBa2Cu3O7–δ (YBCO) films, in terms of superconducting properties (Tc and critical current Jc), can be made by adjusting the cationic composition and choosing the right deposition conditions, e.g., oxygen pressure and temperature close to the decomposition line in the phase diagram. The knowledge and techniques accumulated in the high Tc field have been successfully transferred for the film growth of such oxides as dielectric, ferroelectric, magnetic, and optically functional materials. Pulsed laser deposition, especially, is now widely used for those materials and was addressed in a previous issue of the MRS Bulletin. However, as the demand for film quality increases, allowing films to be used in complex heterostructures like Josephson tunnel junctions and in well-designed physics studies, the meaning of the term “highquality film” has been changing.


Author(s):  
Marylyn Bennett-Lilley ◽  
Thomas T.H. Fu ◽  
David D. Yin ◽  
R. Allen Bowling

Chemical Vapor Deposition (CVD) tungsten metallization is used to increase VLSI device performance due to its low resistivity, and improved reliability over other metallization schemes. Because of its conformal nature as a blanket film, CVD-W has been adapted to multiple levels of metal which increases circuit density. It has been used to fabricate 16 MBIT DRAM technology in a manufacturing environment, and is the metallization for 64 MBIT DRAM technology currently under development. In this work, we investigate some sources of contamination. One possible source of contamination is impurities in the feed tungsten hexafluoride (WF6) gas. Another is particle generation from the various reactor components. Another generation source is homogeneous particle generation of particles from the WF6 gas itself. The purpose of this work is to investigate and analyze CVD-W process-generated particles, and establish a particle characterization methodology.


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