Measurements and modeling of the impact of radical recombination on silicon nitride growth in microwave plasma assisted atomic layer deposition

2018 ◽  
Vol 36 (1) ◽  
pp. 01A111 ◽  
Author(s):  
Toshihiko Iwao ◽  
Peter L. G. Ventzek ◽  
Rochan Upadhyay ◽  
Laxminarayan L. Raja ◽  
Hirokazu Ueda ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Microwave Plasma ◽  
Atomic Layer ◽  
Radical Recombination ◽  
Layer Deposition ◽  
The Impact

Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

2015 ◽  
Vol 51 (86) ◽  
pp. 15692-15695 ◽  
Author(s):  
A. Delabie ◽  
M. Caymax ◽  
B. Groven ◽  
M. Heyne ◽  
K. Haesevoets ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Atomic Layer ◽  
Reducing Agents ◽  
Layer Deposition ◽  
Temperature Deposition ◽  
The Impact

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors.

Reactivity of different surface sites with silicon chlorides during atomic layer deposition of silicon nitride

RSC Advances ◽  
2016 ◽  
Vol 6 (72) ◽  
pp. 68515-68524 ◽  
Author(s):  
Luchana L. Yusup ◽  
Jae-Min Park ◽  
Yong-Ho Noh ◽  
Sun-Jae Kim ◽  
Won-Jun Lee ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Surface Sites ◽  
Thermodynamics And Kinetics ◽  
Layer Deposition ◽  
Kinetics Of

The reactivity of surface sites plays a very important role to determine the thermodynamics and kinetics of ALD processes.

Improvement of the photocatalytic degradation property of atomic layer deposited ZnO thin films: the interplay between film properties and functional performances

2015 ◽  
Vol 3 (21) ◽  
pp. 11453-11461 ◽  
Author(s):  
V. Rogé ◽  
N. Bahlawane ◽  
G. Lamblin ◽  
I. Fechete ◽  
F. Garin ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Photocatalytic Degradation ◽  
Atomic Layer ◽  
Photocatalytic Properties ◽  
Zno Thin Films ◽  
Film Properties ◽  
Layer Deposition ◽  
The Impact

In this work, we have evidenced the impact of stoichiometry on the photocatalytic properties of ZnO nanofilms grown by atomic layer deposition (ALD).

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