Simulation of the impact of heavy charged particles on the characteristics of field-effect silicon-on-insulator transistors

2015 ◽  
Vol 60 (10) ◽  
pp. 1134-1140 ◽  
Author(s):  
A. A. Glushko ◽  
L. A. Zinchenko ◽  
V. A. Shakhnov
2017 ◽  
Vol 9 (4) ◽  
pp. 14-16
Author(s):  
Konstantin Zolnikov ◽  
Vera Meerson ◽  
A. Yankov ◽  
V. Kryukov

Author(s):  
P.S. Gromova ◽  
◽  
A.S. Tararaksin ◽  
A.S. Kolosova ◽  
D.V. Boychenko ◽  
...  

Doklady BGUIR ◽  
2020 ◽  
Vol 18 (7) ◽  
pp. 55-62
Author(s):  
I. Yu. Lovshenko ◽  
V. R. Stempitsky ◽  
V. T. Shandarovich

The use of microelectronic products in outer space is possible if protection is provided against special external influencing factors, including radiation effect. For digital integrated circuits manufactured using submicron CMOS processes, the greatest influence is exerted by radiation effects caused by exposure to a heavy charged particle. The use of special design tools in the development of dual-purpose microcircuits, with increased resistance to the impact of heavy charged particles, prevents single events from occurring. Thus, the use of modern software products for device and technological modeling in microelectronics when developing the element base of radiation-resistant microcircuits for space purposes will cut the time to develop new products and make it possible to modernize (improve performance) already existing device and circuitry solutions. The paper delivers the results of modeling the impacts of heavy charged particles with a magnitude of linear energy transfer equal to 1.81, 10.1, 18.8, 55.0 MeV·cm2/mg, corresponding to nitrogen ions 15N+4 with an energy E = 1,87 MeV; argon 40Ar+12 with an energy E = 372 MeV; ferrum 56Fe+15 with an energy E = 523 MeV; xenon 131Xe+35 with an energy E = 1217 MeV, on electrical characteristics of n-MOSFET device structure. The dependences of the maximum drain current IС on the motion trajectory of a heavy charged particle and the ambient temperature are shown.


2016 ◽  
Vol 8 (4) ◽  
pp. 10-12 ◽  
Author(s):  
Грошев ◽  
A. Groshev ◽  
Чубур ◽  
K. Chubur ◽  
Яньков ◽  
...  

Considered a comparison of experimental and theoretical results is the number of failures at the chip under the influence of heavy charged particles. Comparison of the results showed good agreement.


2002 ◽  
Vol 80 (2) ◽  
pp. 109-117 ◽  
Author(s):  
Z Abou-Moussa

This work displays a study of the compound multiplicity characteristics of 4.1 A GeV/c 22Ne–emulsion interactions, where the number of shower and grey particles taken together is termed as compound multiplicity, Nc. The present data are compared with the corresponding ones obtained for other projectiles at nearly the same momentum per nucleon. It is observed that while the average compound multiplicity depends on the mass number of the projectile, Ap, the value of the ratio <Nc>/D(Nc) seems to be independent of Ap. The impact parameter is found to affect the shape of the compound multiplicity distribution. A positive linear dependence of the compound multiplicity on both the black and heavy charged particles is also noted. Finally, the results indicate that the value of <Nc> depends also on the target mass number. PACS No.: 25.70


2019 ◽  
Vol 9 (4) ◽  
pp. 504-511
Author(s):  
Sikha Mishra ◽  
Urmila Bhanja ◽  
Guru Prasad Mishra

Introduction: A new analytical model is designed for Workfunction Modulated Rectangular Recessed Channel-Silicon On Insulator (WMRRC-SOI) MOSFET that considers the concept of groove gate and implements an idea of workfunction engineering. Methods: The impact of Negative Junction Depth (NJD) and oxide thickness (tox) are analyzed on device performances such as Sub-threshold Slope (SS), Drain Induced Barrier Lowering (DIBL) and threshold voltage. Results: The results of the proposed work are evaluated with the Rectangular Recessed Channel-Silicon On Insulator (RRC-SOI) MOSFET keeping the metal workfunction constant throughout the gate region. Furthermore, an analytical model is developed using 2D Poisson’s equation and threshold voltage is estimated in terms of minimum surface potential. Conclusion: In this work, the impact of Negative Junction Depth (NJD) on minimum surface potential and the drain current are also evaluated. It is observed from the analysis that the analog switching performance of WMRRC-SOI MOSFET surpasses RRC-SOI MOSFET in terms of better driving capability, high Ion/Ioff ratio, minimized Short Channel Effects (SCEs) and hot carrier immunity. Results are simulated using 2D Sentaurus TCAD simulator for validation of the proposed structure.


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