Opportunities and Challenges in MOCVD of βGa2O3 for Power Electronic Devices
2019 ◽
Vol 28
(01n02)
◽
pp. 1940007
◽
Keyword(s):
Recent breakthroughs in bulk crystal growth of β-Ga2O3 by the edge-defined film-fed technique has led to the commercialization of large-area β-Ga2O3 substrates. Standard epitaxy approaches are being utilized to develop various thin-film β-Ga2O3 based devices including lateral transistors. This article will discuss the challenges for metal organic chemical vapor deposition (MOCVD) of β-Ga2O3 and the design criteria for use of this material system in power electronic device structures.
2019 ◽
Vol 28
(01n02)
◽
pp. 1940006
◽
2016 ◽
Vol 34
(3)
◽
pp. 031501
◽
Keyword(s):
1994 ◽
2003 ◽
Vol 32
(5)
◽
pp. 371-374
◽