TIME-RESOLVED IN SITU GISAXS EXPERIMENT OF EVAPORATION-INDUCED SELF-ASSEMBLY OF CTAB TEMPLATED SILICA THIN FILMS UNDER CONTROLLED HUMIDITY

2005 ◽  
Vol 04 (05n06) ◽  
pp. 873-878 ◽  
Author(s):  
S. DOURDAIN ◽  
M. COLAS ◽  
J. F. BARDEAU ◽  
O. GANG ◽  
B. OCKO ◽  
...  

The influence of controlled humidity on the phase transformation of CTAB templated silica thin films is studied by time-resolved in situ GISAXS measurements. It is shown that during a short period of time the silica matrix is flexible enough to follow the morphologic changes of the cylindrical micelles into spherical ones. During this time water can be uptaken and outtaken from the film. The evolution of the lattice parameters upon cycling dry and humid air is presented and discussed.

2019 ◽  
Author(s):  
Hao Wu ◽  
Jeffrey Ting ◽  
Siqi Meng ◽  
Matthew Tirrell

We have directly observed the <i>in situ</i> self-assembly kinetics of polyelectrolyte complex (PEC) micelles by synchrotron time-resolved small-angle X-ray scattering, equipped with a stopped-flow device that provides millisecond temporal resolution. This work has elucidated one general kinetic pathway for the process of PEC micelle formation, which provides useful physical insights for increasing our fundamental understanding of complexation and self-assembly dynamics driven by electrostatic interactions that occur on ultrafast timescales.


2017 ◽  
Vol 111 (8) ◽  
pp. 082907 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Hiroshi Funakubo ◽  
Takao Shimizu ◽  
Daichi Ichinose ◽  
...  

2001 ◽  
Vol 16 (10) ◽  
pp. 2934-2938 ◽  
Author(s):  
G. Compagnini ◽  
M. M. Fragal´ ◽  
L. D'Urso ◽  
C. Spinella ◽  
O. Puglisi

Silver nanoparticles (10–20 nm) embedded into silica thin films have been obtained through the use of a silver organometallic precursor compound dissolved in Spin-On-Glass and subsequently spinned onto suitable substrates. In this paper we present a study of the shape, size, and distribution of silver particles through the use of microscopes, x-ray diffraction, and optical extinction. It has been observed that the obtained films are stable for annealing up to 500 °C with a progressive degradation above this temperature. Furthermore it is possible to obtain high-density silver particles up to 15% in weight without affecting the cluster size and shape.


Langmuir ◽  
2012 ◽  
Vol 28 (50) ◽  
pp. 17477-17493 ◽  
Author(s):  
Florentin Michaux ◽  
Niki Baccile ◽  
Marianne Impéror-Clerc ◽  
Luca Malfatti ◽  
Nicolas Folliet ◽  
...  

RSC Advances ◽  
2021 ◽  
Vol 11 (18) ◽  
pp. 10710-10726
Author(s):  
Akanksha Pragya ◽  
Suhas Mutalik ◽  
Muhammad Waseem Younas ◽  
Siu-Kwong Pang ◽  
Pui-Kin So ◽  
...  

In situ, time-resolved characterisation of an alginate–acrylamide tough hydrogel dynamic formation process indicate routes to intervention and modification of chemo-physico-mechanical properties.


2016 ◽  
Vol 8 (1) ◽  
pp. 122-127 ◽  
Author(s):  
Sang Hoon Choi ◽  
Seok-Jun Seo ◽  
Dan Zhao ◽  
Kyoung-Tae Park ◽  
Bum Sung Kim ◽  
...  

2003 ◽  
Vol 788 ◽  
Author(s):  
Andrew M. Dattelbaum ◽  
Meri L. Amweg ◽  
Julia D. Ruiz ◽  
Laurel E. Ecke ◽  
Andrew P. Shreve ◽  
...  

ABSTRACTIn recent years, methods have been developed for the generation of complex ordered nanocomposite materials through organic templating of inorganic structures. One approach involves preparation of composite materials by an evaporation induced self-assembly process involving organization of organic surfactants and formation of inorganic silica from soluble precursors. Recently, we have shown that deep-UV light (185–254nm) is efficient at removing the surfactant microphase for a routine production of well-ordered mesoporous silica thin films. Here we probe the evolution of surfactant removal from nanocomposite thin film silica mesophases as a function of deep-UV exposure using a combined application of FTIR and single wavelength ellipsometry. Taken together, these data indicate that surfactant removal occurs in a step-wise fashion with the formation of oxidized intermediates prior to complete removal of the surfactant from the thin film.


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