Height Measurement Using High-Precision Atomic Force Microscope Scanner Combined with Laser Interferometers

2006 ◽  
Vol 45 (11) ◽  
pp. 8832-8838 ◽  
Author(s):  
Ken Murayama ◽  
Satoshi Gonda ◽  
K. Kinoshita ◽  
Hajime Koyanagi ◽  
Tsuneo Terasawa ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
High Precision ◽  
Height Measurement ◽  
Atomic Force ◽  
Laser Interferometers

CASIMIR FORCE EXPERIMENTS IN AIR: TWO BIRDS WITH ONE STONE

2010 ◽  
Vol 25 (11) ◽  
pp. 2231-2239 ◽  
Author(s):  
S. DE MAN ◽  
K. HEECK ◽  
K. SMITH ◽  
R. J. WIJNGAARDEN ◽  
D. IANNUZZI
Keyword(s):  
Atomic Force Microscope ◽  
High Precision ◽  
Electrostatic Potential ◽  
Casimir Force ◽  
Hydrodynamic Force ◽  
Force Sensor ◽  
Force Measurements ◽  
Atomic Force ◽  
Potential Measure ◽  
Interacting Surfaces

We present a short overview of the recent efforts of our group in the design of high precision Casimir force setups. We first describe our Atomic Force Microscope based technique that allows one to simultaneously and continuously calibrate the instrument, compensate for a residual electrostatic potential, measure the Casimir force, and, in the presence of a fluid in the gap between the interacting surfaces, measure the hydrodynamic force. Then we briefly discuss a new force sensor that adapts well to Casimir force measurements in critical environments.

Large scale high precision nano-oxidation using an atomic force microscope

2004 ◽  
Vol 566-568 ◽  
pp. 343-348 ◽  
Author(s):  
H. Kuramochi ◽  
K. Ando ◽  
T. Tokizaki ◽  
M. Yasutake ◽  
F. Pérez-Murano ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
High Precision ◽  
Large Scale ◽  
Atomic Force

scholarly journals Metrological atomic force microscope and traceable measurement of nano-dimension structures

ACTA IMEKO ◽  
2013 ◽  
Vol 2 (1) ◽  
pp. 12 ◽  
Author(s):  
Sitian Gao ◽  
Mingzhen Lu ◽  
Wei Li ◽  
Yushu Shi ◽  
Qi Li
Keyword(s):  
Atomic Force Microscope ◽  
Line Width ◽  
Semiconductor Industry ◽  
Step Height ◽  
Optical Instrument ◽  
Font Size ◽  
Height Measurement ◽  
Dimensional Measurement ◽  
Atomic Force ◽  
Width Measurement

<span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-GB; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-GB">The quantity assurance in semiconductor industry development requires dimensional measurement with nanometer accuracy. A metrological AFM is designed to establish a traceable standard with nanometer uncertainty. The principle and design of the instrument is introduced in this paper. The displacement of the sample is traced to the SI unit by interferometers. The metrological AFM is applied to step height and line width measurement. The results are compared with optical instrument and profilometer. The metrological AFM is used to step height measurement in an international comparison and the result shows an uncertainty less than </span><span style="font-family: &quot;Times New Roman&quot;; font-size: 10pt; mso-fareast-font-family: 宋体; mso-ansi-language: EN-CA; mso-fareast-language: ZH-CN; mso-bidi-language: AR-SA; mso-bidi-font-size: 12.0pt;" lang="EN-CA">2 nm. The application of metrological AFM in line width and pitch are also introduced.</span>

Nanometric lateral scale development using an atomic force microscope with directly traceable laser interferometers

2006 ◽  
Vol 17 (7) ◽  
pp. 2041-2047 ◽  
Author(s):  
I Misumi ◽  
S Gonda ◽  
O Sato ◽  
K Sugawara ◽  
K Yoshizaki ◽  
...  
Keyword(s):  
Scale Development ◽  
Atomic Force Microscope ◽  
Atomic Force ◽  
Laser Interferometers ◽  
Lateral Scale

Design of High-Precision Signal Acquisition Module in Atomic Force Microscope

2015 ◽  
Vol 10 (2) ◽  
pp. 104-108
Author(s):  
Ke Xu ◽  
Yuanwei Qi ◽  
Zhijun Gao ◽  
Xiaoting Yu ◽  
Xiyang Liu ◽  
...  
Keyword(s):  
Atomic Force Microscope ◽  
High Precision ◽  
Signal Acquisition ◽  
Atomic Force

Universal Designed Structures for Strict Pitch Measurements Using Scanning Probe Microscopes

2008 ◽  
Vol 381-382 ◽  
pp. 605-606
Author(s):  
Kentaro Sugawara ◽  
Osamu Sato ◽  
K. Yoshizaki ◽  
Ichiko Misumi ◽  
S. Gonda
Keyword(s):  
Atomic Force Microscope ◽  
Scanning Probe ◽  
Two Dimensional ◽  
Atomic Force ◽  
Laser Interferometers

An innovative two-dimensional (2D) grating was designed for precision pitch measurement using an atomic force microscope with laser interferometers (DLI-AFM). Two kinds of 2D gratings, cylindrical and octagonal pattern, were investigated and compared. In pitch analyses of these patterns, the latter octagonal pattern showed smaller fluctuation of pitch values, less than 0.1 nm. Therefore, one of the major uncertainty components, filtering parameter, was reduced dramatically. We propose the octagonal pattern is probably the most preferable pattern for accurate calibration on 2D gratings.

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