scholarly journals A Study on the Effect of Oxygen Flow Rate on Optical Properties of RF Sputtered a-GaOx Thin Films on Corning Glass Substrate

2021 ◽  
Author(s):  
Keerthana C S ◽  
Anjana S Nair ◽  
Jisha Elsa Abraham ◽  
Santhosh Kumar A ◽  
Unnikrishnan N V ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Flow Rate ◽  
Glass Substrate ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Corning Glass ◽  
Effect Of Oxygen ◽  
Corning Glass Substrate

Effect of Oxygen Flow Rate on the Memristive Behavior of Reactively Sputtered TiO2 Thin Films

2014 ◽  
Vol 1024 ◽  
pp. 64-67 ◽  
Author(s):  
Nur Syahirah Kamarozaman ◽  
Muhamad Uzair Shamsul ◽  
Sukreen Hana Herman ◽  
Wan Fazlida Hanim Abdullah
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Rf Magnetron Sputtering ◽  
Deposition Process ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Switching Behavior ◽  
Memristive Behavior ◽  
Effect Of Oxygen

The paper presents the memristive behavior of sputtered titania thin films on ITO substrate. Titania thin films were deposited by RF magnetron sputtering method while varying the oxygen flow rate of (O2/ (O2 + Ar) x100 = 10, 20 and 30 %) during deposition process. The effect of oxygen flow rate to the structural properties was studied including the physical thickness, and also the effect towards switching behavior. It was found that sample deposited at 20 % oxygen flow rate gave better memristive behavior compared to other samples, with larger ROFF/RON ratio of 9. The characterization of memristive behavior includes the effect of electroforming process and successive of I-V measurements are discussed.

Effect of oxygen flow rate on microstructure properties of SiO2 thin films prepared by ion beam sputtering

2018 ◽  
Vol 482 ◽  
pp. 203-207 ◽  
Author(s):  
Lishuan Wang ◽  
Yugang Jiang ◽  
Chenghui Jiang ◽  
Huasong Liu ◽  
Yiqin Ji ◽  
...  
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Ion Beam ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Effect Of Oxygen

Effect of Oxygen Flow Rate on Surface Morphology and Optical Properties of Reactive DC Magnetron Sputtered TiO2 Thin Films

2021 ◽  
Vol 903 ◽  
pp. 51-56
Author(s):  
Lavanya Mekala ◽  
Sunita Ratnam Srirangam ◽  
Rajesh Kumar Borra ◽  
Subba Rao Thota
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Flow Rate ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
X Ray Diffraction ◽  
X Ray ◽  
Glass Substrates ◽  
Diffraction Patterns ◽  
Effect Of Oxygen

In the present work, reactive DC magnetron sputtering method is used to deposit TiO2 thin films on glass substrates. The structural, surface morphology and optical studies of TiO2 thin films were discussed by varying the oxygen flow rates from 1 to 4 sccm. X-ray diffraction patterns of TiO2 thin films show amorphous nature. The surface morphological and elemental composition of TiO2 thin films were examined by field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. From the optical absorption spectra, the shifting of absorption edge towards the longer wavelength leads to the decrement of optical bandgap from 3.48 to 3.19 eV with an increase of oxygen flow rate from 1 to 4 sccm.

Effect of oxygen flow rate on ITO thin films deposited by facing targets sputtering

2010 ◽  
Vol 518 (22) ◽  
pp. 6241-6244 ◽  
Author(s):  
Youn J. Kim ◽  
Su B. Jin ◽  
Sung I. Kim ◽  
Yoon S. Choi ◽  
In S. Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Flow Rate ◽  
Oxygen Flow Rate ◽  
Oxygen Flow ◽  
Ito Thin Films ◽  
Effect Of Oxygen

Effect of oxygen flow rate on properties of Cu4O3 thin films fabricated by radio frequency magnetron sputtering

2020 ◽  
Vol 127 (8) ◽  
pp. 085302 ◽  
Author(s):  
Md Abdul Majed Patwary ◽  
Chun Yuen Ho ◽  
Katsuhiko Saito ◽  
Qixin Guo ◽  
Kin Man Yu ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Flow Rate ◽  
Oxygen Flow Rate ◽  
Radio Frequency Magnetron ◽  
Oxygen Flow ◽  
Radio Frequency Magnetron Sputtering ◽  
Effect Of Oxygen
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