Hierarchical Photocatalytic Surfaces: From 1D to 3D Photoactive TiO2 Nanotubes Grown By Plasma Assisted Deposition Techniques

Particles of BN,and C are added in amounts of 1 to 40% to SiC and Si3N4 ceramics in order to improve their mechanical properties. The ceramics are then processed by sintering, hot-pressing and chemical vapor deposition techniques to produce dense products. Crack deflection at the particles can increase toughness. However the high temperature strength and toughness are determined byphase interactions in the environmental conditions used for testing. Examination of the ceramics by transmission electron microscopy has shown that the carbon and boron nitride particles have a fibrous texture. In the sintered aSiC ceramic the carbon appears as graphite fiber bundles in the triple junctions and as compact graphite particles within some grains. Examples of these inclusions are shown in Fig. 1A and B.

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Ultra high resolution SEM at high voltage images individual fab fragments applied as molecular label to cell surface receptors

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s042482010015232x ◽

1989 ◽

Vol 47 ◽

pp. 70-71

Author(s):

Klaus-Ruediger Peters

Keyword(s):

High Resolution ◽

High Energy ◽

Metal Coating ◽

Beam Diameter ◽

Surface Receptors ◽

Surface Mobility ◽

Metal Atoms ◽

Shadowing Effect ◽

Imaging Mode ◽

Deposition Techniques

Topographic ultra high resolution can now routinely be established on bulk samples in cold field emission scanning electron microscopy with a second generation of microscopes (FSEM) designed to provide 0.5 nm probe diameters. If such small probes are used for high magnification imaging, topographic contrast is so high that remarkably fine details can be imaged on 2DMSO/osmium-impregnated specimens at ribosome surfaces even without a metal coating. On TCH/osmium-impregnated specimens topographic resolution can be increased further if the SE-I imaging mode is applied. This requires that beam diameter and metal coating thickness be made smaller than the SE range of ~1 nm and background signal contributions be reduced. Subnanometer small probes can be obtained (only) at high accelerating voltages. Subnanometer thin continuous metal films can be produced under the following conditions: self-shadowing effect between metal atoms must be reduced through appropriate deposition techniques and surface mobility of metal atoms must be diminished through high energy sputtering and/or specimen cooling.

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Drug Delivery Systems Based on Titania Nanotubes and Active Agents for Enhanced Osseointegration of Bone Implants

Current Medicinal Chemistry ◽

10.2174/0929867326666190726123229 ◽

2020 ◽

Vol 27 (6) ◽

pp. 854-902 ◽

Cited By ~ 5

Author(s):

Raluca Ion ◽

Madalina Georgiana Necula ◽

Anca Mazare ◽

Valentina Mitran ◽

Patricia Neacsu ◽

...

Keyword(s):

Drug Delivery ◽

Tio2 Nanotubes ◽

Therapeutic Agent ◽

Bone Defects ◽

Delivery Systems ◽

Antimicrobial Compounds ◽

Bone Implant ◽

Bioactive Agents ◽

Localized Drug Delivery ◽

Regeneration Of Bone

TiO2 nanotubes (TNTs) are attractive nanostructures for localized drug delivery. Owing to their excellent biocompatibility and physicochemical properties, numerous functionalizations of TNTs have been attempted for their use as therapeutic agent delivery platforms. In this review, we discuss the current advances in the applications of TNT-based delivery systems with an emphasis on the various functionalizations of TNTs for enhancing osteogenesis at the bone-implant interface and for preventing implant-related infection. Innovation of therapies for enhancing osteogenesis still represents a critical challenge in regeneration of bone defects. The overall concept focuses on the use of osteoconductive materials in combination with the use of osteoinductive or osteopromotive factors. In this context, we highlight the strategies for improving the functionality of TNTs, using five classes of bioactive agents: growth factors (GFs), statins, plant derived molecules, inorganic therapeutic ions/nanoparticles (NPs) and antimicrobial compounds.

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Review of Patent Publications from 1990 to 2010 on Catalytic Coatings on Different Substrates, Including Microstructured Channels: Preparation, Deposition Techniques, Applications

Recent Patents on Chemical Engineering ◽

10.2174/1874478811205010028 ◽

2012 ◽

Vol 5 (1) ◽

pp. 28-44 ◽

Cited By ~ 7

Author(s):

L. N. Protasova ◽

M. H.J.M. de Croon ◽

V. V.

Keyword(s):

Deposition Techniques

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Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽

10.3390/ma13132931 ◽

2020 ◽

Vol 13 (13) ◽

pp. 2931

Author(s):

Soumya Banerjee ◽

Ek Adhikari ◽

Pitambar Sapkota ◽

Amal Sebastian ◽

Sylwia Ptasinska

Keyword(s):

Atmospheric Pressure ◽

Gas Flow ◽

Plasma Deposition ◽

Atmospheric Pressure Plasma ◽

Cost Savings ◽

Historical Background ◽

Pressure Plasma ◽

Wide Range ◽

The Status ◽

Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

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A Novel High-Stress Pre-Metal Dielectric Film to Improve Device Performance for sub-65nm CMOS Manufacturing

MRS Proceedings ◽

10.1557/proc-0913-d02-01 ◽

2006 ◽

Vol 913 ◽

Author(s):

Young Way Teh ◽

John Sudijono ◽

Alok Jain ◽

Shankar Venkataraman ◽

Sunder Thirupapuliyur ◽

...

Keyword(s):

Performance Improvement ◽

Dielectric Film ◽

High Stress ◽

Significant Degree ◽

Strain Effect ◽

Device Performance ◽

Hot Carrier ◽

Tcad Simulation ◽

Improve Device ◽

Deposition Techniques

AbstractThis work focuses on the development and physical characteristics of a novel dielectric film for a pre-metal dielectric (PMD) application which induces a significant degree of tensile stress in the channel of a sub-65nm node CMOS structure. The film can be deposited at low temperatures to meet the requirements of NiSi integration while maintaining void-free gap fill and superior film quality such as moisture content and uniformity. A manufacturable and highly reliable oxide film has been demonstrated through both TCAD simulation and real device data, showing ~6% NMOS Ion-Ioff improvement; no Ion-Ioff improvement or degradation on PMOS. A new concept has been proposed to explain the PMD strain effect on device performance improvement. Improvement in Hot Carrier immunity is observed compared to similar existing technologies using high density plasma (HDP) deposition techniques.

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