scholarly journals Fabrication and Optical Property of PeriodicSn1-xTixO2Nanostructures Patterned by the Polystyrene Microsphere Templates

2011 ◽  
Vol 2011 ◽  
pp. 1-7
Author(s):  
Shutian Chen ◽  
Zhengcao Li ◽  
Zhengjun Zhang
Keyword(s):  
Refractive Index ◽  
Optical Property ◽  
Sputter Deposition ◽  
Polystyrene Microspheres ◽  
Polystyrene Microsphere ◽  
Sphere Size ◽  
Sputtering Power ◽  
Glancing Angle ◽  
Anisotropic Morphology ◽  
Regular Arrays

Regular arrays ofSn1-xTixO2nanostructures were fabricated by glancing angle sputter deposition onto self-assembled close-packed arrays of 200 nm diameter, 500 nm diameter, and 1 μm diameter polystyrene microspheres, respectively. The morphology of the nanostructures could be modulated by the variation of the sputtering power of Ti target and the size of polystyrene microspheres templates. Accordingly, the performance of reflection which was dependent on the morphology of nanostructures could be tuned by optimizing the parameters. The anisotropic morphology of nanoflakes achieved by adjusting the sputtering power of Ti target could generate the anisotropism of reflectance. With the increase of the PS sphere size, the anisotropism of nanostructures weakened; however, they exhibited excellent antireflection effects by creating a smaller gradient of refractive index.

scholarly journals Synthesis and characterization of thiol-polystyrene microsphere and its adsorption properties of thallium

2021 ◽  
Vol 237 ◽  
pp. 01001
Author(s):  
Youze Xu ◽  
Yuehui Chen ◽  
Yuanyuan Zhao ◽  
Shuang Zhou ◽  
Guangyi Fu ◽  
...  
Keyword(s):  
Adsorption Capacity ◽  
Raw Materials ◽  
Removal Rate ◽  
Adsorption Properties ◽  
Membrane Diffusion ◽  
Polystyrene Microspheres ◽  
Polystyrene Microsphere ◽  
Control Step ◽  
Ft Ir ◽  
Modified Polystyrene

Thallium (Tl) is highly toxic in the environment. In order to solve the harm of Tl pollution to the environment, thiol-polystyrene microsphere (TPM) with good adsorption properties for Tl were prepared in this paper. The GAUSSIAN software was used to calculate the adsorption performance of the TPM on Tl+, and the adsorption mechanism was discussed. The thermogravimetric analysis show that the TPM prepared with chloromethyl polystyrene microspheres (CPM) and thiourea as the main raw materials has good chemical thermal stability. In the Tl+ solution of 1mg/L, the adsorption and removal rate of the TPMs in was 99%, with a significant adsorption of Tl+ properties. When the dosage of TPM is 0.4L/g, pH is 6-10, temperature is 5-20 °C, and adsorption time reaches 640min, thallium-containing water with Tl+ concentration of 5mg/L can be treated to within the national discharge standard (5μg/L). The analytical effect of 0.5mol/L dilute sulfuric acid on TPM can reach 99.96%, and the adsorption capacity of TPM on Tl+ is reduced by only 0.1% after repeated use 4 times, which has good regeneration performance. The modified polystyrene microspheres were characterized by EDS, FT-IR, Raman spectra and XPS, and it was proved that the TPM were ligated with Tl+ through the grafted mercapto group, so as to adsorb and remove Tl+ from the solution. According to the isotherm and kinetic model of TPM adsorption Tl+, the maximum saturated adsorption amount of TPM to Tl+ can reach 3.47mg/g, mainly chemical adsorption, and the membrane diffusion stage is the main control step of TPM adsorption Tl+. The results showed that the TPM could be a promising adsorbent with good adsorption capacity and reusability for Tl+ removal from wastewater

Tuning silicon nitride refractive index through radio-frequency sputtering power

2021 ◽  
pp. 138951
Author(s):  
Daniela De Luca ◽  
Emiliano Di Gennaro ◽  
Davide De Maio ◽  
Carmine D’Alessandro ◽  
Antonio Caldarelli ◽  
...  
Keyword(s):  
Refractive Index ◽  
Silicon Nitride ◽  
Radio Frequency ◽  
Radio Frequency Sputtering ◽  
Sputtering Power

Investigation on Optical Property and Negative Refractive Index in Double-Layer Chiral Structure of Optical Region

2014 ◽  
Vol 34 (1) ◽  
pp. 0116003
Author(s):  
刘锦景 Liu Jinjing ◽  
罗孝阳 Luo Xiaoyang ◽  
刘道亚 Liu Daoya ◽  
董建峰 Dong Jianfeng
Keyword(s):  
Refractive Index ◽  
Optical Property ◽  
Double Layer ◽  
Negative Refractive Index ◽  
Chiral Structure ◽  
Optical Region

Conformality of PVD shell layers on GLAD-nanorods investigated by Monte Carlo simulations

MRS Advances ◽  
2020 ◽  
Vol 5 (43) ◽  
pp. 2241-2248
Author(s):  
Mesut Yurukcu ◽  
Fatma M. Yurtsever ◽  
Serkan Demirel ◽  
Tansel Karabacak
Keyword(s):  
High Pressure ◽  
Monte Carlo ◽  
Physical Vapor Deposition ◽  
Normal Incidence ◽  
Sputter Deposition ◽  
Glancing Angle ◽  
Device Applications ◽  
Coating Formation ◽  
Normal Angle

AbstractThe quality of the shell coating around nanorods is critical in device applications. Conventional physical vapor deposition (PVD) techniques can be utilized for highly conformal shell coating formation in core-shell structure devices. To identify scalable fabrication techniques for conformal shell coatings, Monte Carlo (MC) simulations of PVD growth were performed under different atomic flux distributions and angles on arrays of glancing angle deposition (GLAD) nanorods, which were also generated by MC simulations. We investigated the conformality of PVD films (shell) around GLAD rod arrays (core) and analyzed the thickness uniformity of the shell layer across the sidewalls of rods. Our results show that Angular Flux-Normal Angle (A-NAD), which might correspond to high-pressure sputter deposition at normal incidence (HIPS at θ = 0o) can generate better conformal shell coating compared to others. In Uniform Flux-Normal Angle technique (U-NAD), which corresponds to a thermal evaporation deposition, the growth suffers from poor sidewall coverage. In addition, introducing a small angle to the flux also improves the shell conformality. Therefore, high-pressure sputter deposition technique is expected to provide superior conformality for a catalyst or semiconductor coating around base nanorods, for example for fuel cell and solar cell applications, with the help of obliquely incident atoms of the HIPS flux.

Determination of complex refractive index of polystyrene microspheres from 370 to 1610 nm

2003 ◽  
Vol 48 (24) ◽  
pp. 4165-4172 ◽  
Author(s):  
Xiaoyan Ma ◽  
Jun Q Lu ◽  
R Scott Brock ◽  
Kenneth M Jacobs ◽  
Ping Yang ◽  
...  
Keyword(s):  
Refractive Index ◽  
Complex Refractive Index ◽  
Polystyrene Microspheres

Structure-related antibacterial activity of a titanium nanostructured surface fabricated by glancing angle sputter deposition

2014 ◽  
Vol 25 (19) ◽  
pp. 195101 ◽  
Author(s):  
Christina Sengstock ◽  
Michael Lopian ◽  
Yahya Motemani ◽  
Anna Borgmann ◽  
Chinmay Khare ◽  
...  
Keyword(s):  
Antibacterial Activity ◽  
Sputter Deposition ◽  
Nanostructured Surface ◽  
Glancing Angle

Development of a polystyrene colloidal monolayer processin the technology of microsphere lithography

2020 ◽  
Author(s):  
E.V. Panfilova ◽  
T.H.H. Nguyen ◽  
V.A. Dyubanov
Keyword(s):  
Colloidal Suspension ◽  
Polystyrene Microspheres ◽  
Hexagonal Symmetry ◽  
Laboratory Equipment ◽  
Langmuir Blodgett ◽  
Colloidal Films ◽  
Atomic Force ◽  
Colloidal Monolayer ◽  
Regular Arrays ◽  
Research Show

The study introduces an operation of deposition of a polystyrene microspheres monolayer from a colloidal suspension, based on the Langmuir ― Blodgett method. The operation plays a key role in the technology of microsphere lithography. The paper describes the laboratory equipment developed to produce ordered colloidal films and monolayers, shows the main modes of the process, and presents the results of studying the surfaces of samples using an atomic force microscope. Findings of research show that the films obtained are close-packed monolayers of microspheres in accordance with the hexagonal symmetry, which are suitable to be used as templates. By means of them and by the method of microsphere lithography, it is possible to obtain regular arrays of nanoparticles of a given size for products of photonics, sensorics, and nanoelectronics.

Preparation and Character Measurements of AlN Films for RF Magnetron Sputtering

2013 ◽  
Vol 663 ◽  
pp. 409-412
Author(s):  
Tai Long Gui ◽  
Si Da Jiang ◽  
Chun Cheng Ban ◽  
Jia Qing Liu
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Refractive Index ◽  
Magnetron Sputtering ◽  
Total Pressure ◽  
Rf Magnetron Sputtering ◽  
Elliptical Polarization ◽  
Dielectric Thin Films ◽  
Temperature Changes ◽  
Sputtering Power

AlN dielectric thin films were deposited on N type Si(100) substrate by reactive radio frequency magnetron sputtering that directly bombardment AlN target under different sputtering-power and total pressure. The crystal structure,composition,surface and refractive index of the thin films were studied by XRD, SEM, AFM and elliptical polarization instrument. The results show that the surface and refractive of the thin films strongly depends on the sputtering-power and total pressure,the good uniformity and smoothness is found at 230 W, Ar flow ratio 5.0 LAr/sccm, substrate temperature 100°Cand 1.2 Pa. The crystal structure of the as-deposited thin-films is amorphous，then it transforms from blende structure to wurtzite structure as the rapid thermal annealing(RTA) temperature changes from 600 to 1200°C. The refractive index also increases with the RTA temperature it is increasing significantly from 800 to 1000°C．

Arbitrarily shaped Si nanostructures by glancing angle ion beam sputter deposition

2010 ◽  
Vol 247 (6) ◽  
pp. 1310-1321 ◽  
Author(s):  
Christian Patzig ◽  
André Miessler ◽  
Tansel Karabacak ◽  
Bernd Rauschenbach
Keyword(s):  
Ion Beam ◽  
Sputter Deposition ◽  
Glancing Angle ◽  
Si Nanostructures ◽  
Ion Beam Sputter Deposition
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