Thickness Dependent Magnetic and Structural Properties of CoxCr1–x Thin Films Evaporated on Si(100) and Glass Substrates

2011 ◽  
Vol 11 (6) ◽  
pp. 4757-4764 ◽  
Author(s):  
A. Kharmouche
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Glass Substrates

Morphology and structural properties of nanocrystalline and nanocolumnar aluminum thin films grown on glass and Ti/glass substrates

2012 ◽  
Vol 60 (10) ◽  
pp. 1491-1497 ◽  
Author(s):  
S. K. Sharma ◽  
Bo-Gyun Kim ◽  
Heang-Seuk Lee ◽  
Chi Kyu Choi ◽  
A. I. Inamdar ◽  
...  
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Glass Substrates

Effect of Second Complexing Agent of N2H4 on the Optical and Structural Properties of ZnS Thin Films

2013 ◽  
Vol 591 ◽  
pp. 297-300
Author(s):  
Huan Ke ◽  
Shu Wang Duo ◽  
Ting Zhi Liu ◽  
Hao Zhang ◽  
Xiao Yan Fei
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Structural Properties ◽  
Band Gaps ◽  
Complexing Agent ◽  
X Ray Diffraction ◽  
Sphalerite Structure ◽  
X Ray ◽  
Glass Substrates ◽  
Zns Films

ZnS films have been deposited on glass substrates by chemical bath deposition (CBD). The optical and structural properties were analyzed by UV-VIS spectrophotometer and X-ray diffraction (XRD). The results showed that the prepared thin films from the solution using N2H4 as second complexing agent were thicker than those from the solution without adding N2H4 in; this is due to using second complexing agent of N2H4, the deposition mechanisms change which is conductive to heterogeneous deposition. When using N2H4 as second complexing agent, the crystallinity of ZnS thin films improved with a significant peak at 2θ=28.96°which can be assigned to the (111) reflection of the sphalerite structure. The transmittances of the prepared films from the solution adding N2H4 in as second complexing agent were over 85%, compared to those from the solution without N2H4 (over 95%). The band gaps of the ZnS films from the solution using N2H4 as second complexing agent were larger (about 4.0eV) than that from those from the solution without N2H4 (about 3.98eV), which indicated that the prepared ZnS films from the solution adding N2H4 in as second complexing agent were better used as buffer layer of solar cells with adequate optical properties. In short, using N2H4 as second complexing agent, can greatly improve the optical and structural properties of the ZnS thin films.

scholarly journals The Effect of Film Thickness on the Structural Properties of Vacuum Evaporated Poly(3-methylthiophene) Thin Films

2012 ◽  
Vol 2012 ◽  
pp. 1-8 ◽  
Author(s):  
Sandip V. Kamat ◽  
Vijaya Puri ◽  
R. K. Puri
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Surface Roughness ◽  
Surface Morphology ◽  
Film Thickness ◽  
Structural Properties ◽  
Vacuum Evaporation ◽  
Intrinsic Stress ◽  
Glass Substrates ◽  
Structure Surface

This paper reports on the structural properties of poly(3-methylthiophene) P3MeT thin films prepared by vacuum evaporation on the glass substrates. The structural and surface morphology, wettability, adhesion, and intrinsic stress of these thin films were studied for three different thicknesses. The variation of the film thickness affects the structure, surface, and mechanical properties of P3MeT thin films. Vapor chopping also strongly influences the surface morphology, surface roughness, and wettability of the thin films. It was found that there is a decrease in the intrinsic stress and (RMS) roughness, while the adhesion increases with increase in film thickness.

Electrical and Structural Properties of TiO2 Thin Film Prepared at Different Annealing Temperatures by Sol-Gel Spin-Coating Method

2013 ◽  
Vol 667 ◽  
pp. 371-374 ◽  
Author(s):  
M. Basri ◽  
Mohd Nor Asiah ◽  
Mohd Khairul bin Ahmad ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop Mahmood
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Structural Properties ◽  
Spin Coating ◽  
Sol Gel ◽  
Annealing Treatment ◽  
Tio2 Thin Films ◽  
Glass Substrates ◽  
Annealing Temperatures ◽  
Coating Method

Titanium Dioxide (TiO2) thin films have been prepared on glass substrates by using sol-gel method and spin-coating technique. The samples have been annealed at temperatures of 350°C ~ 500oC. The electrical and structural properties of the thin films due to the changes of annealing treatment process were investigated by 2 point probes I-V measurement and X-ray Diffraction (XRD) respectively. The result show that resistivity of the thin film decreased with annealing temperatures. XRD characterization indicates crystalline structure of TiO2 thin films improved as annealed at higher temperatures.

EFFECT OF ANNEALING TEMPERATURE ON THE OPTICAL AND STRUCTURAL PROPERTIES OF DIP-COATED Al2O3 THIN FILMS PREPARED BY SOL–GEL ROUTE

2005 ◽  
Vol 12 (05n06) ◽  
pp. 793-797 ◽  
Author(s):  
F. E. GHODSI ◽  
M. MAFAKHERI ◽  
A. NOVINROOZ
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Annealing Temperature ◽  
Sol Gel ◽  
Dip Coating ◽  
X Ray Diffraction ◽  
Glass Substrates ◽  
Sol Gel Process ◽  
Dip Coating Technique

Thin films of Al 2 O 3 were prepared by the sol–gel process. Dip-coating technique was used for deposition of the Al 2 O 3 thin films onto glass substrates. Optical and structural properties of the films were investigated with respect to the annealing temperature (100–500°C). The structure of these films was determined by X-ray diffraction (XRD). Scanning electron microscopy (SEM) was performed for the analysis of surface morphology. For determination of the optical constants of Al 2 O 3 thin films, UV-Visible spectrophotometry measurements were carried out. Annealing temperature affects the structural and optical properties of the Al 2 O 3 thin films. The refractive index and extinction coefficient of the films at 550 nm wavelength increase from 1.56 to 1.66, and from 3.41 × 10-5 to 5.54 × 10-5, respectively while optical band gap and thickness of the films decrease from 4.15 eV to 4.11 eV, and 360 nm to 260 nm, respectively, by increasing annealing temperature from 100°C to 500°C.

Crystalline and Structural Properties Dependence on RF Power and Deposition Temperature of Sputtered Nanocrystalline Silicon Thin Films on Teflon and Glass Substrates

2012 ◽  
Vol 576 ◽  
pp. 475-479
Author(s):  
Norhidayatul Hikmee Mahzan ◽  
Shaiful Bakhtiar Hashim ◽  
Sukreen Hana Herman ◽  
M. Rusop
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Structural Properties ◽  
Deposition Temperature ◽  
Rf Magnetron Sputtering ◽  
Nanocrystalline Silicon ◽  
Rf Power ◽  
Glass Substrates ◽  
Silicon Thin Films ◽  
Scanning Electron

Nanocrystalline silicon (nc-Si) thin films were deposited on glass and polytetrafluoroethylene (PTFE, teflon) substrates using Radio frequency (RF) magnetron sputtering. The effect of RF power and deposition temperature on the physical and structural properties of nc-Si on the glass and Teflon substrate was studied. The thin films properties were examined by Raman spectroscopy and field emission scanning electron microscopy (FESEM). We found that the thickness of thin films increased with increased RF power and deposition temperature. Raman spectroscopy results it showed that, with increasing RF power and deposition temperature can cause the changing of crystallinity on both glass and Teflon substrate.

Optical and Structural Properties of MEH-PPV: ZnO Nanocomposites

2011 ◽  
Vol 364 ◽  
pp. 124-128
Author(s):  
Zayana Yahya Nurul ◽  
Mohamad Rusop Mahmood
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Zno Nanoparticles ◽  
Blue Shift ◽  
Weight Percent ◽  
Absorption Bands ◽  
Sem Images ◽  
Glass Substrates ◽  
Red Color ◽  
Slight Blue Shift

Thin films of conducting unsaturated polymer of red color poly [2-methoxy-5(2’-ethyl hexyloxy)-phenylene vinylene] (MEH-PPV) containing different weight percent of ZnO nanoparticles were deposited by spin coating techniques. The MEH-PPV: ZnO solutions were spin coated onto 2 × 2 cm glass substrates. The spun MEH-PPV: ZnO thin films were used for investigating the optical properties by using Ultraviolet-Visible Spectrometer (UV-Vis). The structural properties of the thin films were investigated by Scanning Electron Microscopy (SEM). For MEH-PPV: ZnO nanocomposites, the UV-Vis absorption bands increases and showing slight blue shift compared to the pure MEH-PPV. The optical bandgap of MEH-PPV: ZnO nanocomposites slightly decrease when the amount of ZnO nanoparticles increase. ZnO nanoparticles apparently no effect on conjugation segments of MEH-PPV. From the SEM images of MEH-PPV: ZnO nanocomposites, it can be seen that ZnO nanoparticles form agglomerated regions.

Effect of Different Thicknesses of ZnS Thin Films on its Optical and Structural Properties

2014 ◽  
Vol 556-562 ◽  
pp. 185-188
Author(s):  
Shu Wang Duo ◽  
Huan Ke ◽  
Ting Zhi Liu ◽  
Hao Zhang
Keyword(s):  
Thin Films ◽  
Structural Properties ◽  
Glass Substrate ◽  
Band Gaps ◽  
The Other ◽  
X Ray Diffraction ◽  
Sphalerite Structure ◽  
X Ray ◽  
Glass Substrates ◽  
Zns Films

ZnS films have been deposited on glass by chemical bath deposition (CBD). The optical and structural properties were analyzed by UV-VIS spectrophotometer and X-ray diffraction (XRD). The results showed that different sides of glass substrate have different thicknesses of the ZnS thin films, which can affect the optical and structural properties of ZnS thin films. The ZnS films of the side of glass substrates back to the solution center are thicker than that of the other side, and the ZnS films from ZnSO4 are thicker than that from Zn (NO3)2. The transmittances lower with the thicknesses of ZnS films increasing. The band gaps exhibit blue response with the thicknesses of ZnS films increasing. From the sides of glass substrates back to the solution center, the (111) reflection of the sphalerite structure can be observed at about 2θ=29.1°, while from the other side toward the solution center showed no significant peak.

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