The Effect of Film Thickness on the Structural Properties of Vacuum Evaporated Poly(3-methylthiophene) Thin Films

This paper reports on the structural properties of poly(3-methylthiophene) P3MeT thin films prepared by vacuum evaporation on the glass substrates. The structural and surface morphology, wettability, adhesion, and intrinsic stress of these thin films were studied for three different thicknesses. The variation of the film thickness affects the structure, surface, and mechanical properties of P3MeT thin films. Vapor chopping also strongly influences the surface morphology, surface roughness, and wettability of the thin films. It was found that there is a decrease in the intrinsic stress and (RMS) roughness, while the adhesion increases with increase in film thickness.

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The Study of the Surface Morphology of PVDF/MgO Nanocomposites Thin Films

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.626.311 ◽

2012 ◽

Vol 626 ◽

pp. 311-316 ◽

Cited By ~ 5

Author(s):

Adillah Nurashikin Arshad ◽

Rozana Mohd Dahan ◽

Mohamad Hafiz Mohd Wahid ◽

Zulkefle Habibah ◽

Nyl Ismail Lyly ◽

...

Keyword(s):

Thin Films ◽

Surface Roughness ◽

Surface Morphology ◽

Magnesium Oxide ◽

Chemical Bonding ◽

Nanocomposite Film ◽

Glass Substrates ◽

Β Phase

This study investigates the effect of varying loading percentages of MgO on the topography and morphology of Poly (vinylideneflouride)/Magnesium Oxide (PVDF/MgO) nanocomposites thin films. PVDF/MgO nanocomposites spin coated thin films with thicknesses ranging from 200nm to 456nm were successfully characterized. The nanocomposite solutions were spin coated on Al-glass substrates at 1500rpm. The topography and surface roughness of PVDF/MgO nanocomposites were characterized by using AFM. FE-SEM was used to investigate the surface morphology of the nanocomposites thin films and ATR-FTIR was used to determine the chemical bonding of PVDF/MgO nanocomposites. MgO (7%) was found to be the optimum loading percentage for PVDF/MgO nanocomposite film with favorable distribution of MgO particles, minimum defects and high content of β-phase as evident by FESEM and FTIR.

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Crystallite structure, surface morphology and optical properties of In2O3–TiO2 composite thin films by sol–gel method

Materials Science and Engineering B ◽

10.1016/j.mseb.2008.05.019 ◽

2008 ◽

Vol 151 (2) ◽

pp. 179-186 ◽

Cited By ~ 38

Author(s):

Yunxia Chen ◽

Xuedong Zhou ◽

Xiujian Zhao ◽

Xin He ◽

Xingyong Gu

Keyword(s):

Thin Films ◽

Optical Properties ◽

Surface Morphology ◽

Sol Gel ◽

Composite Thin Films ◽

Gel Method ◽

Sol Gel Method ◽

Structure Surface ◽

Crystallite Structure

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Dependence of Film Thickness on Properties of Al Doped ZnO Thin Films

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.194-196.2305 ◽

2011 ◽

Vol 194-196 ◽

pp. 2305-2311

Author(s):

Ying Ge Yang ◽

Dong Mei Zeng ◽

Hai Zhou ◽

Wen Ran Feng ◽

Shan Lu ◽

...

Keyword(s):

Thin Films ◽

Film Thickness ◽

Electrical Parameter ◽

Substrate Surface ◽

Rf Magnetron Sputtering ◽

Thickness Effect ◽

Visible Range ◽

Glass Substrates ◽

Doped Zno

In this study high quality of Al doped ZnO (ZAO) thin films were prepared by RF magnetron sputtering on glass substrates at room temperature in order to study the thickness effect upon their structure, electrical and optical properties. XRD results show that the films are polycrystalline and with strongly preferred (002) orientation perpendicular to substrate surface whatever the thickness is. The crystallite size was calculated by Williamson-Hall method, while it increases as the film thickness increased. The lattice stress is mainly caused by the growth process. Hall measurements revealed electrical parameter very dependent upon thickness when the thickness of ZAO film is lower than 700 nm. The resistivity decreased and the carrier concentration and Hall mobility increases as the film thickness increased. When film thickness becomes larger, only a little change in the above properties was observed. All the films have high transmittance above 90% in visible range. Red shift of the absorption edge was observed as thickness increased. The optical energy bandgap decreased from 3.41eV to 3.30 eV with the increase of film thickness.

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Mechanical Properties of Electroplated Copper Thin Films

MRS Proceedings ◽

10.1557/proc-594-63 ◽

1999 ◽

Vol 594 ◽

Cited By ~ 5

Author(s):

R. Spolenak ◽

C. A. Volkert ◽

K. Takahashi ◽

S. Fiorillo ◽

J. Miner ◽

...

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Grain Size ◽

Film Thickness ◽

Yield Stress ◽

Laser Scanning ◽

Focused Ion Beam ◽

Ion Beam ◽

Cu Films ◽

Electroplated Copper

AbstractIt is well known that the mechanical properties of thin films depend critically on film thickness However, the contributions from film thickness and grain size are difficult to separate, because they typically scale with each other. In one study by Venkatraman and Bravman, Al films, which were thinned using anodic oxidation to reduce film thickness without changing grain size, showed a clear increase in yield stress with decreasing film thickness.We have performed a similar study on both electroplated and sputtered Cu films by using chemical-mechanical polishing (CMP) to reduce the film thickness without changing the grain size. Stress-temperature curves were measured for both the electroplated and sputtered Cu films with thicknesses between 0.1 and 1.8 microns using a laser scanning wafer curvature technique. The yield stress at room temperature was found to increase with decreasing film thickness for both sets of samples. The sputtered films, however, showed higher yield stresses in comparison to the electroplated films. Most of these differences can be attributed to the different microstructures of the films, which were determined by focused ion beam (FIB) microscopy and x-ray diffraction.

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Effects of the thickness on resistive switching characteristics of CrOx thin films

Science and Technology Development Journal ◽

10.32508/stdj.v19i2.794 ◽

2016 ◽

Vol 19 (2) ◽

pp. 92-100

Author(s):

Ngoc Kim Pham ◽

Thang Bach Phan ◽

Vinh Cao Tran

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Resistive Switching ◽

High Reliability ◽

Switching Behavior ◽

Ftir Analysis ◽

Resistive Switching Behavior ◽

Bipolar Resistive Switching ◽

Structure Surface ◽

Switching Characteristics

In this study, we have investigated influences of the thickness on the structure, surface morphology and resistive switching characteristics of CrOx thin films prepared by using DC reactive sputtering technique. The Raman and FTIR analysis revealed that multiphases including Cr2O3, CrO2, Cr8O21... phases coexist in the microstructure of CrOx film. It is noticed that the amount of stoichiometric Cr2O3 phase increased significantly as well as the surface morphology were more visible with less voids and more densed particles with larger thickness films. The Ag/CrOx/FTO devices exhibited bipolar resistive switching behavior and high reliability. The resistive switching ratio has decreased slightly with the thickness increments and was best achieved at CrOx – 100 nm devices.

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Microstructure and Mechanical Properties of Chromium Carbide Coatings Deposited by Magnetron Sputtering Technique

Defect and Diffusion Forum ◽

10.4028/www.scientific.net/ddf.397.118 ◽

2019 ◽

Vol 397 ◽

pp. 118-124

Author(s):

Linda Aissani ◽

Khaoula Rahmouni ◽

Laala Guelani ◽

Mourad Zaabat ◽

Akram Alhussein

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Magnetron Sputtering ◽

Structural Properties ◽

Annealing Temperature ◽

Diffusion Mechanism ◽

X Ray Diffraction ◽

Chromium Carbides ◽

X Ray ◽

Mechanical And Structural Properties

From the hard and anti-corrosions coatings, we found the chromium carbides, these components were discovered by large studies; like thin films since years ago. They were pointed a good quality for the protection of steel, because of their thermal and mechanical properties for this reason, it was used in many fields for protection. Plus: their hardness and their important function in mechanical coatings. The aim of this work joins a study of the effect of the thermal treatment on mechanical and structural properties of the Cr/steel system. Thin films were deposited by cathodic magnetron sputtering on the steel substrates of 100C6, contain 1% wt of carbon. Samples were annealing in vacuum temperature interval between 700 to 1000 °C since 45 min, it forms the chromium carbides. Then pieces are characterising by X-ray diffraction, X-ray microanalysis and scanning electron microscopy. Mechanical properties are analysing by Vickers test. The X-ray diffraction analyse point the formation of the Cr7C3, Cr23C6 carbides at 900°C; they transformed to ternary carbides in a highest temperature, but the Cr3C2 doesn’t appear. The X-ray microanalysis shows the diffusion mechanism between the chromium film and the steel sample; from the variation of: Cr, Fe, C, O elements concentration with the change of annealing temperature. The variation of annealing temperature shows a clean improvement in mechanical and structural properties, like the adhesion and the micro-hardness.

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Texture and Nano Mechanical Properties of YSZ Electrolyte Thin Films Prepared by CCVD and PLD

MRS Proceedings ◽

10.1557/proc-778-u6.10 ◽

2003 ◽

Vol 778 ◽

Author(s):

Z. Xu ◽

C. Waters ◽

X. Wang ◽

N. Sudhir ◽

S. Yarmolenko ◽

...

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Surface Roughness ◽

Chemical Vapor ◽

Film Deposition ◽

Advanced Materials ◽

State University ◽

Composite Thin Films ◽

Ysz Electrolyte ◽

T State

AbstractComposite thin films of yttria stabilized zirconia (YSZ) and alumina (Al2O3) have been synthesized using liquid fuel combustion chemical vapor deposition (CCVD) and pulsed laser deposition (PLD) in the NSF Center for Advanced Materials and Smart Structures (CAMSS) at North Carolina A&T State University. With the CCVD technique, addition of alumina was realized by adding the designated amount of aluminum-organic in the reagent solution; while with PLD, doping of alumina in YSZ was accomplished by alternative ablations of an YSZ target and an alumina target. Variations in morphology, surface roughness and nano-mechanical properties of the composite thin films of Al2O3/YSZ were characterized. Crystal size of the films processed by CCVD was much larger than that processed by PLD; surface roughness follows the similar tendency. Upon high-temperature annealing, crystals in the PLD processed thin films grew up to 300 nm. The effect of Al2O3 in YSZ thin films on their nano-mechanical properties was dependent on the film deposition techniques in our research. For the films deposited by CCVD, addition of Al2O3 improved the nano hardness and elastic modulus of YSZ thin films, while a decline was observed in the mechanical properties of the films deposited by PLD.

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Studies on the Optical Properties and Surface Morphology of Nickel Phthalocyanine Thin Films

E-Journal of Chemistry ◽

10.1155/2007/643834 ◽

2007 ◽

Vol 4 (2) ◽

pp. 255-264 ◽

Cited By ~ 5

Author(s):

Benny Joseph ◽

C. S. Menon

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Band Gap ◽

Electron Micrographs ◽

Optical Band Gap ◽

Scanning Electron Micrographs ◽

Nickel Phthalocyanine ◽

Glass Substrates ◽

Substrate Temperatures ◽

Scanning Electron

Thin films of Nickel Phthalocyanine (NiPc) are fabricated at a base pressure of 10-5m.bar using Hind-Hivac thermal evaporation plant. The films are deposited on to glass substrates at various temperatures 318, 363, 408 and 458K. The optical absorption spectra of these thin films are measured. Present studies reveal that the optical band gap energies of NiPc thin films are highly dependent on the substrate temperatures. The structure and surface morphology of the films deposited on glass substrates of temperatures 303, 363 and 458K are studied using X-ray diffractograms and Scanning Electron Micrographs (SEM), show that there is a change in the crystallinity and surface morphology due to change in the substrate temperatures. Full width at half maximum (FWHM) intensity of the diffraction peaks is also found reduced with increasing substrate temperatures. Scanning electron micrographs show that these crystals are fiber like at high substrate temperatures. The optical band gap increases with increase in substrate temperature and is then reduced with fiber-like grains at 408K. The band gap increases again at 458K with full of fiber like grains. Trap energy levels are also observed for these films.

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EFFECTS OF SPRAY PYROLYSIS DEPOSITION PARAMETERS ON MORPHOLOGICAL, OPTICAL AND STRUCTURAL PROPERTIES OF WO3 NANOSTRUCTURED THIN FILMS

Surface Review and Letters ◽

10.1142/s0218625x19502032 ◽

2020 ◽

Vol 27 (09) ◽

pp. 1950203

Author(s):

ALI AKHAVAN MAVARDIANI ◽

MOHAMMAD BAGHER RAHMANI

Keyword(s):

Thin Films ◽

Surface Morphology ◽

Spray Pyrolysis ◽

Precursor Solution ◽

Cost Effective ◽

Solution Concentration ◽

Visible Range ◽

Glass Substrates ◽

Deposition Parameters ◽

Vis Spectroscopy

In this experimental research, tungsten trioxide (WO3) thin films were deposited using ammonium tungstate ((NH4)2WO4) by a simple and cost-effective technique of spray pyrolysis on top of glass substrates. The surface morphology, structural and optical properties of prepared samples were studied using field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD) pattern analysis and UV–Vis spectroscopy techniques, respectively. Studied deposition parameters were: substrate temperature (300, 350, 400, 450 and 500∘C), concentration of the precursor solution (0.01, 0.02, 0.04, 0.08, 0.1 and 0.2[Formula: see text]M), volume of the precursor solution (50, 100, 150 and 200[Formula: see text]mL) and the effect of pulsed spraying at different concentrations (0.01, 0.1 and 0.2[Formula: see text]M). FESEM images showed that the surface morphology has formed like nested micro-fibrous rings with a uniform distribution all over the surface. The XRD patterns revealed that increasing the solution concentration to 0.2[Formula: see text]M shows some peaks which can be attributed to WO3 with the hexagonal crystal structure. Transmission spectra of the samples indicate that all of the prepared samples are transparent in the visible range, with the calculated direct bandgap ranging from about 2.93[Formula: see text]eV to 3.96[Formula: see text]eV, depending on the deposition conditions.

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