High-power impulse magnetron sputtering and its applications

2010 ◽  
Vol 82 (6) ◽  
pp. 1247-1258 ◽  
Author(s):  
Arutiun P. Ehiasarian
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Physical Vapor Deposition ◽  
Peak Power ◽  
High Peak Power ◽  
Degree Of Ionization ◽  
Physical Vapor Deposition Method ◽  
Metal Flux ◽  
High Degree ◽  
Deposition Technology

High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm–2 on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic, and optical coatings.

scholarly journals Fabrication and Mechanical Properties of Cr2AlC MAX Phase Coatings on TiBw/Ti6Al4V Composite Prepared by HiPIMS

Materials ◽  
2021 ◽  
Vol 14 (4) ◽  
pp. 826
Author(s):  
Muhammad Waqas Qureshi ◽  
Xinxin Ma ◽  
Guangze Tang ◽  
Bin Miao ◽  
Junbo Niu
Keyword(s):  
Magnetron Sputtering ◽  
Deposition Rate ◽  
Pulse Width ◽  
Average Power ◽  
Max Phase ◽  
Ex Situ ◽  
Gas Temperature ◽  
Degree Of Ionization ◽  
Force Microscopy ◽  
High Degree

The high-power impulse magnetron sputtering (HiPIMS) technique is widely used owing to the high degree of ionization and the ability to synthesize high-quality coatings with a dense structure and smooth morphology. However, limited efforts have been made in the deposition of MAX phase coatings through HiPIMS compared with direct current magnetron sputtering (DCMS), and tailoring of the coatings’ properties by process parameters such as pulse width and frequency is lacking. In this study, the Cr2AlC MAX phase coatings are deposited through HiPIMS on network structured TiBw/Ti6Al4V composite. A comparative study was made to investigate the effect of average power by varying frequency (1.2–1.6 kHz) and pulse width (20–60 μs) on the deposition rate, microstructure, crystal orientation, and current waveforms of Cr2AlC MAX phase coatings. X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) were used to characterize the deposited coatings. The influence of pulse width was more profound than the frequency in increasing the average power of HiPIMS. The XRD results showed that ex situ annealing converted amorphous Cr-Al-C coatings into polycrystalline Cr2AlC MAX phase. It was noticed that the deposition rate, gas temperature, and roughness of Cr2AlC coatings depend on the average power, and the deposition rate increased from 16.5 to 56.3 nm/min. Moreover, the Cr2AlC MAX phase coatings produced by HiPIMS exhibits the improved hardness and modulus of 19.7 GPa and 286 GPa, with excellent fracture toughness and wear resistance because of dense and column-free morphology as the main characteristic.

Power supply with arc handling for high peak power magnetron sputtering

2004 ◽  
Vol 22 (4) ◽  
pp. 1415-1419 ◽  
Author(s):  
D. J. Christie ◽  
F. Tomasel ◽  
W. D. Sproul ◽  
D. C. Carter
Keyword(s):  
Magnetron Sputtering ◽  
Power Supply ◽  
Peak Power ◽  
High Peak ◽  
High Peak Power

scholarly journals Deposition of 3YSZ-TiC PVD Coatings with High-Power Impulse Magnetron Sputtering (HiPIMS)

2021 ◽  
Vol 11 (6) ◽  
pp. 2753
Author(s):  
Bastian Gaedike ◽  
Svenja Guth ◽  
Frank Kern ◽  
Andreas Killinger ◽  
Rainer Gadow
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Physical Vapor Deposition ◽  
Target Material ◽  
Electrical Insulation ◽  
Electrically Conductive ◽  
New Approach ◽  
Conductive Oxide ◽  
Short Circuits ◽  
Carbide Ceramics

Optimized coating adhesion and strength are the advantages of high-power impulse magnetron sputtering (HiPIMS) as an innovative physical vapor deposition (PVD) process. When depositing electrically non-conductive oxide ceramics as coatings with HiPIMS without dual magnetron sputtering (DMS) or mid-frequency (MF) sputtering, the growing coating leads to increasing electrical insulation of the anode. As a consequence, short circuits occur, and the process breaks down. This phenomenon is also known as the disappearing anode effect. In this study, a new approach involving adding electrically conductive carbide ceramics was tried to prevent the electrical insulation of the anode and thereby guarantee process stability. Yttria-stabilized zirconia (3YSZ) with 30 vol.% titanium carbide (TiC) targets are used in a non-reactive HiPIMS process. The main focus of this study is a parameter inquisition. Different HiPIMS parameters and their impact on the measured current at the substrate table are analyzed. This study shows the successful use of electrically conductive carbide ceramics in a non-conductive oxide as the target material. In addition, we discuss the observed high table currents with a low inert gas mix, where the process was not expected to be stable.

Formation of TiO2 Thin Film on Antibacterial Metal Injection Molding Stainless Steel Orthodontic Bracket 17-4 PH Using Physical Vapor Deposition Method

2020 ◽  
Vol 846 ◽  
pp. 169-174
Author(s):  
Sugeng Supriadi ◽  
Annisa Ovilia ◽  
Nurul Ilmaniar ◽  
Bambang Suharno
Keyword(s):  
Thin Film ◽  
Injection Molding ◽  
Magnetron Sputtering ◽  
Physical Vapor Deposition ◽  
Antibacterial Properties ◽  
Metal Injection Molding ◽  
Orthodontic Bracket ◽  
Sputtering Power ◽  
Physical Vapor Deposition Method ◽  
Thermal Debinding

This study aims to equip orthodontic bracket SS 17-4 PH fabricated using metal injection molding with antibacterial properties. This can be achieved by applying TiO2 coating on the surface of brackets using magnetron sputtering PVD method. This method is chosen due to its compatibility to be used on bulk metal and its ability to control thin-film stoichiometry. Samples were prepared using the series of following steps which comprised of metal injection molding, binder elimination with solvent and thermal debinding, sintering in vacuum and argon atmosphere, electropolishing, and magnetron sputtering PVD coatings as the final stage. Negative bias, sputtering power, and partial pressure on vacuum chamber were set as the constant parameters. The atmosphere inside the PVD chamber was controlled using oxygen and argon gases. XRD and SEM observations were carried out to obtain the information on the phase and morphology of the films. Rutile and anatase crystalline structures with 2,27 nm and 9,78 nm crystal size were measured in as-deposited PVD TiO2 respectively. The deposition films were achieved in the range of 3 μm-8 μm.

Tribological Performances of CrSiN Coatings Deposited by High Power Pulse Magnetron Sputtering

2018 ◽  
Vol 281 ◽  
pp. 540-545 ◽  
Author(s):  
Wei Jie Chang ◽  
Hao Zhang ◽  
Ying Ying Chen ◽  
Jun Li ◽  
Xue Zhang ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Magnetron Sputtering ◽  
High Power ◽  
Physical Vapor Deposition ◽  
Protective Coatings ◽  
Energy Dispersive Spectrometer ◽  
Testing Machine ◽  
Power Pulse ◽  
Pulse Magnetron ◽  
High Power Pulse

The coatings deposited by physical vapor deposition (PVD) technique have found a wide industrial application as protective coatings for their attractive properties such as high hardness, good wear resistance and chemical stability. In order to explore the triboligical performances of CrSiN coatings, CrSiN coatings were prepared o the surface of 316 stainless steel by high power pulse magnetron sputtering (HPPMS) in this paper. Sliding wear tests of CrSiN coatings against Si3N4 ceramic balls and titanium balls have been carried out on a friction abrasion testing machine under reciprocating sliding conditions. nanoindentation and scratch tester, field emission scanning electron microscopy equipped with energy dispersive spectrometer (FESEM/EDS) and a X-ray diffractometer (XRD) was used to study the tribological behaviors of CrSiN coatings systematically. Results showed that CrSiN coatings exhibited good wear resistance, which can be attributed to the smoother and denser surface of CrSiN coatings resulted from much fewer macroparticles and pitting defects. The differences on wear debris removal behaviors and wear mechanism were caused by the different microstructure of CrSiN coatings.

Advances in Thin Film Technology through the Application of Modulated Pulse Power Sputtering

2010 ◽  
Vol 638-642 ◽  
pp. 208-213 ◽  
Author(s):  
Brajendra Mishra ◽  
J.J. Moore ◽  
Jian Liang Lin ◽  
W.D. Sproul
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
High Power ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Pulse Power ◽  
Degree Of Ionization ◽  
Crn Coating ◽  
Short Period ◽  
Crn Coatings

High power pulsed magnetron sputtering (HPPMS) is an emerging thin film deposition technology that generate high ionization plasma by applying a very large amount of peak power to a sputtering target for a short period of time. HPPMS is also known as High Power Impulse Magnetron Sputtering (HiPIMS). However, HPPMS/HiPIMS exhibits decreased deposition rate as compared to continuous dc magnetron sputtering. Modulated pulse power (MPP) magnetron sputtering is an alternative HPPIMS deposition technique that overcomes the rate loss problem while still achieving a high degree of ionization of the sputtered material. In the present work, the principles and some important characteristics of MPP technology were presented. Technical examples of CrN coatings were deposited using MPP and continuous dc sources. The positive ion mass distributions were characterized using an electrostatic quadrupole plasma mass spectrometer. The structure and properties of MPP and dc CrN coatings were characterized using x-ray diffraction, scanning electron microscopy, nanoindentation tests, and ball-on-disc wear test. It was found that the MPP CrN coating exhibits denser microstructure and improved mechanical and tribological properties as compared to the dc CrN coating.

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