scholarly journals Pre-particle filtration and moisture control by efficient purging in various inlet and outlet of a 450 mm wafer front-opening unified pod

2015 ◽  
Vol 4 (2) ◽  
pp. 304 ◽  
Author(s):  
Bill Chiu ◽  
Shih-Cheng Hu ◽  
Angus Shiue ◽  
Yu-Yun Shiue ◽  
Zhe-Yu Huang
Keyword(s):  
Metal Corrosion ◽  
Native Oxide ◽  
Moisture Concentration ◽  
Contamination Control ◽  
Point Of Use ◽  
Particle Contamination ◽  
Film Cracking ◽  
New Generation ◽  
And Storage ◽  
Wafer Surfaces

The trend toward narrower line width in semiconductor manufacturing has made contamination control more and more important. The presence of moisture in wafer containers, such as front opening unified pods (FOUP), can lead to the native oxide residues growth, metal corrosion, and thin film cracking on wafer surfaces. Accordingly, decreasing contamination methods and improving factory efficiency are continuously researched. Single or multi-layer particulate shields on top of wafers in FOUPs may be used to prevent pollutant accumulation. In addition, point-of-use (POU) filtration may also been used to control particle contamination in FOUPs during wafer transformation and storage. The demand for stricter filtration led to the usage of 0.10 and 0.20 µm membranes to control the contamination. However, with the introduction of finer membranes end users may have concerns about deleterious remainders on wafers from undergoing filtration. There are a total of 25 pieces of wafers in the FOUP and the arrangement is from the bottom (wafer No. 1) to the top (wafer No. 25) with arising manner. Purging FOUPs to expel moisture vapors with Clean Dry Air (CDA) is one of the most popular methods.There was no previous research for investigating the purge performance on new-generation 450mm FOUPs. This research aims to study main factors influencing the performance of the purge system on 450mm FOUPs, including moisture concentration, CDA flow rate, and filter pressure.

scholarly journals Effects of processing, moisture, and storage length on the fermentation profile, particle size, and ruminal disappearance of reconstituted corn grain

2020 ◽  
Vol 98 (11) ◽  
Author(s):  
Ana L M Gomes ◽  
Antonio V I Bueno ◽  
Fernando A Jacovaci ◽  
Guilherme Donadel ◽  
Luiz F Ferraretto ◽  
...  
Keyword(s):  
Particle Size ◽  
Lactic Acid ◽  
Butyric Acid ◽  
Hammer Mill ◽  
Moisture Concentration ◽  
Fermentation Profile ◽  
And Storage ◽  
Ground Corn ◽  
Corn Grain

Abstract Our objective was to examine the effects of processing, moisture, and anaerobic storage length of reconstituted corn grain (RCG) on the fermentation profile, geometric mean particle size (GMPS), and ruminal dry matter disappearance (DMD). Dry corn kernels were ground (hammer mill, 5-mm screen) or rolled, then rehydrated to 30%, 35%, or 40% moisture, and stored for 0, 14, 30, 60, 90, 120, or 180 d in laboratory silos. Rolled corn had an increased GMPS compared with ground corn (2.24 and 1.13 mm, respectively, at ensiling). However, there was a trend for an interaction between processing and moisture concentration to affect particle size, with GMPS increasing with increased moisture concentration, especially in ground corn. Longer storage periods also slightly increased GMPS. Processing, moisture, and storage length interacted to affect the fermentation pattern (two- or three-way interactions). Overall, pH decreased, whereas lactic acid, acetic acid, ethanol, and NH3-N increased with storage length. RCG with 30% moisture had less lactic acid than corn with 35% and 40% moisture, indicating that fermentation might have been curtailed and also due to the clostridial fermentation that converts lactic acid to butyric acid. Ensiling reconstituted ground corn with 30% of moisture led to greater concentrations of ethanol and butyric acid, resulting in greater DM loss than grain rehydrated to 35% or 40% of moisture. Ammonia-N and in situ ruminal DMD were highest for reconstituted ground corn with 35% or 40% of moisture, mainly after 60 d of storage. Therefore, longer storage periods and greater moisture contents did not offset the negative effect of greater particle size on the in situ ruminal DMD of rolled RCG. Nonetheless, RCG should be ensiled with more than 30% moisture and stored for at least 2 mo to improve the ruminal DMD and reduce the formation of ethanol and butyric acid.

scholarly journals Faecal contamination of drinking water during collection and household storage: the need to extend protection to the point of use

2003 ◽  
Vol 1 (3) ◽  
pp. 109-115 ◽  
Author(s):  
Thomas F. Clasen ◽  
Andrew Bastable
Keyword(s):  
Drinking Water ◽  
Geometric Mean ◽  
Arithmetic Mean ◽  
Faecal Contamination ◽  
Household Level ◽  
Safe Water ◽  
Female Head ◽  
Point Of Use ◽  
Thermotolerant Coliforms ◽  
And Storage

Paired water samples were collected and analysed for thermotolerant coliforms (TTC) from 20 sources (17 developed or rehabilitated by Oxfam and 3 others) and from the stored household water supplies of 100 households (5 from each source) in 13 towns and villages in the Kailahun District of Sierra Leone. In addition, the female head of the 85 households drawing water from Oxfam improved sources was interviewed and information recorded on demographics, hygiene instruction and practices, sanitation facilities and water collection and storage practices. At the non-improved sources, the arithmetic mean TTC load was 407/100 ml at the point of distribution, rising to a mean count of 882/100 ml at the household level. Water from the improved sources met WHO guidelines, with no faecal contamination. At the household level, however, even this safe water was subject to frequent and extensive faecal contamination; 92.9% of stored household samples contained some level of TTC, 76.5% contained more than the 10 TTC per 100 ml threshold set by the Sphere Project for emergency conditions. The arithmetic mean TTC count for all samples from the sampled households was 244 TTC per 100 ml (geometric mean was 77). These results are consistent with other studies that demonstrate substantial levels of faecal contamination of even safe water during collection, storage and access in the home. They point to the need to extend drinking water quality beyond the point of distribution to the point of consumption. The options for such extended protection, including improved collection and storage methods and household-based water treatment, are discussed.

Identification and Removal of Storage Induced Particle Contamination on Silicon Wafer Surfaces

1991 ◽  
pp. 271-276
Author(s):  
Brent Carlson ◽  
Lillian Gulbrandsen ◽  
Donald C. Grant
Keyword(s):  
Silicon Wafer ◽  
Particle Contamination ◽  
Wafer Surfaces

Adhesion and Removal of Alumina Slurry Particles on Wafer Surfaces in Cu CMP

2005 ◽  
Vol 103-104 ◽  
pp. 275-278
Author(s):  
Yi Koan Hong ◽  
Ja Hyung Han ◽  
Jin Hyung Lee ◽  
Jin Goo Park ◽  
Ahmed A. Busnaina
Keyword(s):  
Alumina Particle ◽  
Adhesion Force ◽  
Interaction Force ◽  
Zeta Potentials ◽  
Alumina Particles ◽  
Particle Contamination ◽  
Cu Cmp ◽  
Wafer Surfaces

The adhesion force and removal of alumina particles on Cu, Ta, TEOS, SILKTM, Aurora and FSG wafer surfaces were experimentally and theoretically investigated in slurry solutions of different pHs. These wafer surfaces showed negative zeta potentials in the investigated pH ranges with exception of FSG and Ta. However, the zeta potentials of FSG surface drastically decreased with increasing pH. The lowest adhesion force and smallest number of alumina particles were measured between alumina particle and FSG surface in a slurry solution of pH 11. Alkaline slurry was much more desirable in controlling the level of particle contamination during Cu CMP. The pH of the slurry and zeta potentials of the surfaces played important roles in controlling the interaction force.

Change in drinking water quality from source to point-of-use and storage: a case study from Guwahati, India

2011 ◽  
Vol 184 (9) ◽  
pp. 5343-5361 ◽  
Author(s):  
Gajanan Kisan Khadse ◽  
Moromi D. Kalita ◽  
Pawan K. Labhsetwar
Keyword(s):  
Water Quality ◽  
Drinking Water ◽  
Drinking Water Quality ◽  
Point Of Use ◽  
And Storage

Enrichment — the way to create a new generation of food products

2020 ◽  
pp. 36-40
Author(s):  
O.V. Sycheva ◽  
V.G. Kayshev
Keyword(s):  
Raw Materials ◽  
Caloric Intake ◽  
Food Products ◽  
Short Supply ◽  
Mass Consumption ◽  
Organoleptic Characteristics ◽  
Physiological Properties ◽  
Physico Chemical ◽  
New Generation ◽  
And Storage

The main dysnutrition of the Russian population is the excess of caloric intake over an indicator of the energy consumption level. One of the ways to solve this problem is the production of functional food products or enriched functional products. The essence of this is that only those micronutrients that are really in short supply should be used in the fortification of products. These should be products of mass consumption, and especially those that undergo refining, which results in the loss of micronutrients. The use of raw materials and ingredients only of natural (animal, vegetable, mineral) origin allows creating active complexes that qualitatively alter the physiological properties of the product and can affect many product characteristics and processes such as physico-chemical, structural, mechanical and organoleptic characteristics of the product, the processes of color formation, fermentation, oxidation, and storage capacity. However, sometimes a strong passion for enriching the product with useful macro- and micronutrients affects the taste characteristics. Therefore, when developing recipes and technologies for new-generation products, it is crucial that the enrichment of the product with important and necessary elements should not deteriorate the organoleptic characteristics. At the same time, it is essential to ensure the safety of products without compromising consumer properties. The diet should contain all the nutrients necessary for a person in sufficient quantities and balanced with each other in the most favorable proportions

Fog Computing and Virtualization

2018 ◽  
pp. 53-67
Author(s):  
Siddhartha Duggirala
Keyword(s):  
Cloud Computing ◽  
Fog Computing ◽  
Main Concern ◽  
Time Data ◽  
Human Machine Interaction ◽  
Processing Power ◽  
New Generation ◽  
And Storage ◽  
Virtual Services ◽  
Machine Interaction

The essence of cloud computing is moving out the processing from the local systems to remote systems. Cloud is an umbrella of physical/virtual services/resources easily accessible over the internet. With more companies adopting cloud either fully through public cloud or hybrid model, the challenges in maintaining a cloud capable infrastructure is also increasing. About 42% of CTOs say that security is their main concern for moving into cloud. Another problem, which is mainly problem with infrastructure, is the connectivity issue. The datacenter could be considered as the backbone of cloud computing architecture. Handling this new generation of requirements of volume, variety, and velocity in IoT data requires us to evaluate the tools and technologies. As the processing power and storage capabilities of the end devices like mobile phones, routers, sensor hubs improve, we can increase leverage these resources to improve your quality and reliability of services. Applications of fog computing is as diverse as IoT and cloud computing itself. What IoT and fog computing have in common is to monitor and analyse real-time data from network connected things and acting on them. Machine-to-machine coordination or human-machine interaction can be a part of this action. This chapter explores fog computing and virtualization.

Method of Particle Contamination Control for Yield Enhancement in the Cleanroom

2007 ◽  
Vol 31 (6) ◽  
pp. 522-530 ◽  
Author(s):  
Kwang-Chul Noh ◽  
Hyeon-Cheol Lee ◽  
Dae-Young Kim ◽  
Myung-Do Oh
Keyword(s):  
Yield Enhancement ◽  
Contamination Control ◽  
Particle Contamination

Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

2002 ◽  
Vol 41 (Part 1, No. 9) ◽  
pp. 5835-5840
Author(s):  
Kiminobu Akeno ◽  
Munehiro Ogasawara ◽  
Kenji Ooki ◽  
Toru Tojo ◽  
Ryoichi Hirano ◽  
...  
Keyword(s):  
Electron Beam ◽  
Control Technology ◽  
Writing System ◽  
Next Generation ◽  
Contamination Control ◽  
Particle Contamination ◽  
Mask Fabrication

Advanced particle contamination control in EUV scanners

2019 ◽  
Author(s):  
Mark A. van de Kerkhof ◽  
Tjarko van Empel ◽  
Michael Lercel ◽  
Christophe Smeets ◽  
Ferdi van de Wetering ◽  
...  
Keyword(s):  
Contamination Control ◽  
Particle Contamination
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