scholarly journals Measurement of ellipsometric data and surface orientations by modulated circular polarized light / Messung von ellipsometrischen Daten und Oberflächenorientierungen durch moduliertes zirkular polarisiertes Licht

2019 ◽  
Vol 86 (s1) ◽  
pp. 32-36 ◽  
Author(s):  
Chia-Wei Chen ◽  
Matthias Hartrumpf ◽  
Thomas Längle ◽  
Jürgen Beyerer
Keyword(s):  
Polarized Light ◽  
Angle Of Incidence ◽  
Reflectance Measurement ◽  
Small Deviations ◽  
Flat Surfaces ◽  
Experimental Errors ◽  
Illumination Method ◽  
Characterization Of Materials ◽  
Circular Polarized Light

AbstractEllipsometry is a widely used optical method for the characterization of materials and thin films. However, only flat or nearly flat surfaces can be measured since small deviations of the angle of incidence might lead to significant experimental errors. In order to overcome the geometrical limitations of ellipsometry, the retroreflex ellipsometry developed at Fraunhofer IOSB is used. Based on this configuration, a new illumination method is proposed. When the sample is illuminated by modulated circular polarized light (LCP and RCP), the ellipsometric parameters (Ψ, Δ) and the tilted angle (Φ) can be determined directly. Combined with reflectance measurement or prior knowledge of optical properties of samples, the surface orientation can be obtained.

Some applications of electron beam microanalysis techniques in VLSI process evaluation

1983 ◽  
Vol 41 ◽  
pp. 160-161
Author(s):  
Simon Thomas
Keyword(s):  
Integrated Circuits ◽  
Process Evaluation ◽  
Large Scale ◽  
Technology Development ◽  
Analytical Techniques ◽  
Successful Implementation ◽  
Analysis Of Failures ◽  
Characterization Of Materials ◽  
Circuits Vlsi

Trends in the technology development of very large scale integrated circuits (VLSI) have been in the direction of higher density of components with smaller dimensions. The scaling down of device dimensions has been not only laterally but also in depth. Such efforts in miniaturization bring with them new developments in materials and processing. Successful implementation of these efforts is, to a large extent, dependent on the proper understanding of the material properties, process technologies and reliability issues, through adequate analytical studies. The analytical instrumentation technology has, fortunately, kept pace with the basic requirements of devices with lateral dimensions in the micron/ submicron range and depths of the order of nonometers. Often, newer analytical techniques have emerged or the more conventional techniques have been adapted to meet the more stringent requirements. As such, a variety of analytical techniques are available today to aid an analyst in the efforts of VLSI process evaluation. Generally such analytical efforts are divided into the characterization of materials, evaluation of processing steps and the analysis of failures.

On resolving fine periodic microstructures in the optical microscope

1989 ◽  
Vol 47 ◽  
pp. 364-365
Author(s):  
W.S. Putnam ◽  
C. Viney
Keyword(s):  
Liquid Crystalline ◽  
Numerical Aperture ◽  
Polarized Light ◽  
Normal Incidence ◽  
Optical Microscope ◽  
Angle Of Incidence ◽  
Resolution Limit ◽  
Crystalline Materials ◽  
Periodic Microstructures ◽  
Liquid Crystalline Materials

Many sheared liquid crystalline materials (fibers, films and moldings) exhibit a fine banded microstructure when observed in the polarized light microscope. In some cases, for example Kevlar® fiber, the periodicity is close to the resolution limit of even the highest numerical aperture objectives. The periodic microstructure reflects a non-uniform alignment of the constituent molecules, and consequently is an indication that the mechanical properties will be less than optimal. Thus it is necessary to obtain quality micrographs for characterization, which in turn requires that fine detail should contribute significantly to image formation.It is textbook knowledge that the resolution achievable with a given microscope objective (numerical aperture NA) and a given wavelength of light (λ) increases as the angle of incidence of light at the specimen surface is increased. Stated in terms of the Abbe resolution criterion, resolution improves from λ/NA to λ/2NA with increasing departure from normal incidence.

Applications of ultramicrotomy for materials characterization

1993 ◽  
Vol 51 ◽  
pp. 232-233
Author(s):  
R.T. Blackham ◽  
J.J. Haugh ◽  
C.W. Hughes ◽  
M.G. Burke
Keyword(s):  
Materials Science ◽  
Microstructural Analysis ◽  
Analytical Electron Microscopy ◽  
Austenitic Stainless Steels ◽  
Specimen Preparation ◽  
Preparation Technique ◽  
Thermally Induced ◽  
Radiation Induced ◽  
Characterization Of Materials

Essential to the characterization of materials using analytical electron microscopy (AEM) techniques is the specimen itself. Without suitable samples, detailed microstructural analysis is not possible. Ultramicrotomy, or diamond knife sectioning, is a well-known mechanical specimen preparation technique which has been gaining attention in the materials science area. Malis and co-workers and Glanvill have demonstrated the usefulness and applicability of this technique to the study of a wide variety of materials including Al alloys, composites, and semiconductors. Ultramicrotomed specimens have uniform thickness with relatively large electron-transparent areas which are suitable for AEM anaysis.Interface Analysis in Type 316 Austenitic Stainless Steel: STEM-EDS microanalysis of grain boundaries in austenitic stainless steels provides important information concerning the development of Cr-depleted zones which accompany M23C6 precipitation, and documentation of radiation induced segregation (RIS). Conventional methods of TEM sample preparation are suitable for the evaluation of thermally induced segregation, but neutron irradiated samples present a variety of problems in both the preparation and in the AEM analysis, in addition to the handling hazard.

Free-Space Electromagnetic Characterization of Materials for Microwave and Radar Applications

PIERS Online ◽  
2005 ◽  
Vol 1 (2) ◽  
pp. 128-132 ◽  
Author(s):  
Habiba Hafdallah Ouslimani ◽  
Redha Abdeddaim ◽  
Alain Priou
Keyword(s):  
Free Space ◽  
Radar Applications ◽  
Characterization Of Materials

scholarly journals Vocabulary of radioanalytical methods (IUPAC Recommendations 2020)

2020 ◽  
Vol 0 (0) ◽  
Author(s):  
Zhifang Chai ◽  
Amares Chatt ◽  
Peter Bode ◽  
Jan Kučera ◽  
Robert Greenberg ◽  
...  
Keyword(s):  
Nuclear Reactions ◽  
Hyperfine Interactions ◽  
Chemical Species ◽  
Radiation Detectors ◽  
Nuclear Analysis ◽  
Characterization Of Materials ◽  
Nuclear Effects ◽  
Nuclear Processes ◽  
Radioanalytical Methods

AbstractThese recommendations are a vocabulary of basic radioanalytical terms which are relevant to radioanalysis, nuclear analysis and related techniques. Radioanalytical methods consider all nuclear-related techniques for the characterization of materials where ‘characterization’ refers to compositional (in terms of the identity and quantity of specified elements, nuclides, and their chemical species) and structural (in terms of location, dislocation, etc. of specified elements, nuclides, and their species) analyses, involving nuclear processes (nuclear reactions, nuclear radiations, etc.), nuclear techniques (reactors, accelerators, radiation detectors, etc.), and nuclear effects (hyperfine interactions, etc.). In the present compilation, basic radioanalytical terms are included which are relevant to radioanalysis, nuclear analysis and related techniques.

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