Ferroelectric domain structure of epitaxial (Pb,Sr)TiO3 thin films

2001 ◽  
Vol 16 (9) ◽  
pp. 2463-2466 ◽  
Author(s):  
Yong Kwan Kim ◽  
Kyeong Seok Lee ◽  
Sunggi Baik
Keyword(s):  
Thin Films ◽  
Curie Temperature ◽  
Transformation Strain ◽  
Systematic Change ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Rocking Curve ◽  
Lattice Constants ◽  
Ferroelectric Domain Structure

Epitaxial (Pb1−xSrx)TiO3 (PST, x = 4 0.0–0.24) thin films were grown on MgO(001) single-crystal substrates by pulsed laser deposition. General x-ray diffraction techniques including θ–2θ scan and rocking curve were used to determine lattice constants, degree of c-axis orientation, and crystal quality of the tetragonal thin films. The degree of c-axis orientation in the epitaxial PST films increased as Sr concentration (x) increased, which in turn induces the systematic change in the Curie temperature as well as the transformation strain at and below the Curie temperature. An inverse relation between the c-domain abundances and the transformation strains is established.

Domain Structure of Tetragonal Plt Epitaxial Thin Films on Mgo (001) Single Crystal Substrates

1996 ◽  
Vol 433 ◽  
Author(s):  
Y. M. Kang ◽  
J. K. Ku ◽  
S. Baik
Keyword(s):  
Thin Films ◽  
Domain Structure ◽  
Crystal Quality ◽  
Epitaxial Thin Films ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
X Ray ◽  
Lattice Constants ◽  
Temperature Lattice

AbstractFerroelectric Pb1−xLaxTiO3 (PLT, x = 0.00 ˜ 0.28) thin films have been prepared on MgO(001) substrates using pulsed laser deposition. The degree of c-axis orientation in PLT films increased as the La concentration (x) increased with systematic changes in lattice constants and transformation strains. For x ≥ 12, the PLT films showed full c-axis orientation.In order to understand why the domain evolution in PLT films changes with the La concentration, we have conducted high temperature X-ray diffraction to simulate the cooling process during which the domain structure is evolved. Lattice constants, degree of c-axis orientation, crystal quality of PLT films were characterized as a function of temperature. Lattice constants along substrate normal direction showed similar characteristics with those of powder. The degree of c-axis orientation just after the phase transformation at the Curie temperature also increased with La concentration. The crystal quality, which is quantified by the line width of diffraction peak, is insensitive to La concentration in paraelectric phase. However, it shows significant variation after the domain structure is evolved.

Growth of Highly C-Axis Oriented AlN Films at Water Cooling Condition

2013 ◽  
Vol 718-720 ◽  
pp. 20-24
Author(s):  
J. Yang ◽  
X.Q. Jiao ◽  
R. Zhang ◽  
H. Zhong ◽  
Y. Shi ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Rf Sputtering ◽  
Cooling Condition ◽  
Water Cooling ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
Aln Film ◽  
Influence Of Water

In this work, the aluminum nitride (AlN) thin film with highly c-axis orientation was prepared successfully at water cooling condition by RF sputtering. The influence of water cooling on the crystalline quality of AlN thin film is researched. The crystalline characteristics and microstructure of AlN thin films deposited on Si (111) and Mo/Si (111) were researched by X-ray diffraction (XRD) and field emission scanning electron microscope (FESEM). The results indicated that highly c-axis AlN films can be synthetized at water cooling condition. The AlN film deposited on Mo thin film is titled to the surface, when that is perpendicular to the silicon substrate. Different models are proposed to explain the growth behaviors of AlN thin films on the two kinds of substrates.

Determination of domain structure and abundance of epitaxial Pb(Zr, Ti)O3 thin films grown on MgO(001) by rf magnetron sputtering

1999 ◽  
Vol 14 (1) ◽  
pp. 132-141 ◽  
Author(s):  
Kyeong Seok Lee ◽  
Young Min Kang ◽  
Sunggi Baik
Keyword(s):  
Thin Films ◽  
Curie Temperature ◽  
Magnetron Sputtering ◽  
Domain Structure ◽  
Rf Magnetron Sputtering ◽  
Curve Analysis ◽  
Crystalline Quality ◽  
Rocking Curve ◽  
X Ray

Epitaxial Pb(ZrxTi1−x)O3 (x = 0.0−0.32) ferroelectric thin films of 500 nm thickness were grown on MgO(001) single crystal substrates by in situ rf magnetron sputtering, and evolution of their domain structures is characterized by employing various x-ray diffraction techniques. X-ray θ-2θ scan showed the films were grown highly c-axis oriented with a tetragonal perovskite structure. 90° domain configuration was investigated using the x-ray rocking curve analysis for PZT 100 peaks in two different Φphi; angles. The rocking curve analysis showed that the degree of c-axis orientation and the crystalline quality of the films were improved continuously with increasing Zr concentration. The c-domain abundance as a function of Zr concentration was quantified using the x-ray rocking curves of PZT 001 and 100, taking account of structural factors and Lorentz-polarization factors. High temperature x-ray technique was also employed to quantify the domain structure as a function of temperature during cooling after reheating the samples to 650 °C. During the cooling process, c-domain abundance was found to increase continuously while the crystalline quality of the films was deteriorated below the Curie temperature. The results led us to conclude that the transformation strain of the film at and below the Curie temperature plays a significant role in the final domain structure and abundance of epitaxial PZT thin films.

Studies of Crystalunity for Sputter Deposited Bi-Based Oxide Films

1992 ◽  
Vol 275 ◽  
Author(s):  
Koichi Mizuno ◽  
Yo Ichikawa ◽  
Kentaro Setsune
Keyword(s):  
Thin Films ◽  
Oxide Films ◽  
Full Width ◽  
Half Maximum ◽  
X Ray Diffraction ◽  
Rocking Curve ◽  
X Ray ◽  
Ion Channeling ◽  
Sputter Deposited

ABSTRACTCrystalline quality of Bi-based oxide films has been evaluated by means of X-ray diffraction (XRD) and ion-channeling on the Rutherford backscattering (RBS). The films were sputter deposited 2201-phase Bi2Sr2Cu1O8-δ (BSCO) and 2212-phase Bi2Sr2Ca1Cu2O8-δ (BSCCO). They were prepared on MgO(100) and SrTiO3(100) substrates at the low temperature of 650°C during the deposition. The best quality, however thin films had poor crystallinity compared to single crystals, was obtained with the 2201-phase BSCO film that was deposited on a SrTiO3(100) substrate. The full width at half maximum (FWHM) value of the rocking curve on XRD for the film was estimated as 1560 (arc sec).

Growth of Ferroelectric PLT Thin Films on Various Single Crystal Substrates

1994 ◽  
Vol 361 ◽  
Author(s):  
Y.M. Kang ◽  
J.K. Ku ◽  
S. Baik
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Crystal Quality ◽  
Epitaxial Thin Films ◽  
Axis Orientation ◽  
X Ray ◽  
Lattice Constants ◽  
Tetragonal Phase Transition

ABSTRACTFerroelectric Pb1−xLaxTi1−x/4(x = 0 ∼ 0.28) epitaxial thin films were prepared on MgO(001), SrTiO3(001), and LaAlO3(001) single crystalline substrates using pulsed laser deposition. The change in lattice constants of PLT films by La concentration, x, was investigated systematically for each substrate. RBS studies revealed that the composition of PLT films is consistent with that of the targets. Lattice constants, degree of c-axis orientation, crystal quality of the PLT films were characterized by symmetric and asymmetric X-ray scans. The strain which occurred during the cubic to tetragonal phase transition seemed to be the major factor determining the c-axis orientation configuration, i.e., 90° domain structure and the crystal quality of PLT films.

Epitaxial Growth OF (001)- and (111)-Oriented PTMNSB Films and Multilayers

1995 ◽  
Vol 384 ◽  
Author(s):  
M.C. Kautzky ◽  
B.M. Clemens
Keyword(s):  
Kerr Effect ◽  
Single Phase ◽  
Single Layer ◽  
Film Structure ◽  
Interference Effects ◽  
X Ray Diffraction ◽  
Orientation Relationships ◽  
Rocking Curve ◽  
Large Rotations

ABSTRACTIn this paper we report the successful growth of single-phase epitaxial PtMnSb films and multilayers by dc magnetron cosputtering, both in the (001) orientation on MgO(001) and W(001), and in the (111) orientation on Al2O3 (0001). Single-layer films in the thickness range 50Å≤t≤1000Å were grown and characterized using x-ray diffraction (XRD), magneto-optic Kerr effect (MOKE), and vibrating sample magnetometry (VSM). The in-plane orientation relationships, as determined by asymmetric XRD, were PtMnSb[100]∥MgO[110], PtMnSb[100]∥W[100], and PtMnSb[101∥Al2O3[2110]. The crystalline quality of the films was found to depend strongly upon the substrate, growth temperature, film thickness, and presence of a capping layer, but rocking curve widths of 1° or less were achieved on each substrate. Measurement of the in-plane strain showed that the films were almost entirely relaxed, with strains <1%. In-plane magnetization was observed in all cases, with moments and coercivities in the 400-500 emu/cm3 and 100-200 Oe ranges respectively. Polar Kerr spectra showed large rotations (0.75° - 1.03°), whose peak wavelengths appear to depend on both film structure and optical interference effects.

Annealing Time Dependence on 1.5μm Photoluminescence of Laser-Ablated β-FeSi2

2005 ◽  
Vol 891 ◽  
Author(s):  
Shin-ichiro Uekusa ◽  
Kunitoshi Aoki ◽  
Mohammad Zakir Hossain ◽  
Tomohiro Fukuda ◽  
Noboru Miura
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
Thermal Diffusion ◽  
Annealing Time ◽  
Crystal Quality ◽  
Photoluminescence Intensity ◽  
X Ray Diffraction ◽  
X Ray ◽  
Long Time

ABSTRACTWe prepared β-FeSi2 thin-films by using a Pulsed Laser Deposition (PLD) method and succeeded to observe photoluminescence (PL) around 1.5 μm corresponding to β-FeSi2 band from the long-time and high-temperature annealed β-FeSi2 thin-films. The β-FeSi2 thin-films were ablated on Si(111) substrates heated at 550°C. After ablation, long-time and high-temperature thermal annealing was performed in order to improve the crystal-quality. Annealing times were 5, 10, 20 and 40 hrs, and annealing temperature was kept at 900 °C. Crystallinity was evaluated by an X-ray diffraction (XRD) measurement. We have observed eminent improvement on crystal-quality of β-FeSi2 thin-films. Annealed samples show (220) or (202) X-ray diffraction signals of β-FeSi2 and the full width at half maximum (FWHM) of these peaks were 0.27° although the thickness of the samples decreased with annealing time. Thermal-diffusion of Si atoms was observed from substrate to thin-films. Fe atoms in the ablated thin-films also diffused into the substrate. The relationship between the thickness of β-FeSi2 thin-films and the thermal-diffusion were investigated with rutherford backscattering (RBS) measurement. Maximum photoluminescence intensity around 1.5 μm was observed from the thickest β-FeSi2 thin-film with only 5 hrs annealing.

GaN On 6H-SiC – Structural And Optical Properties

1994 ◽  
Vol 339 ◽  
Author(s):  
C. Wetzel ◽  
D. Volm ◽  
B. K. Meyer ◽  
K. Pressel ◽  
S. Nilsson ◽  
...  
Keyword(s):  
Optical Properties ◽  
Transition Metal Ions ◽  
Substrate Material ◽  
X Ray Diffraction ◽  
High Quality ◽  
Paramagnetic Resonance ◽  
Lattice Constants ◽  
Donor Acceptor ◽  
Related Donor

ABSTRACTRecent progress in the growth of high quality 6H-SiC single crystals has led to an ideal substrate material for GaN epitaxial films. Nearly matching lattice constants of wurzite GaN to 6H-SiC in the hexagonal plane can reduce strain effects at the interface. We employed the sublimation sandwich method to grow single crystal layers at reasonable growth rates with free carrier concentrations of 2×1017 cm-3. Very sharp x-ray diffraction peaks of the GaN (0002) plane are obtained indicating the high quality of this system (Δ(2θ) < 0.1 degrees). These findings are directly reflected in the optical properties. The photoluminescence is dominated by a single sharp exciton line, impurity related donor acceptor transitions are seen with very weak intensities. However, at lower energies the internal luminescence transitions of the 3d transition metal ions Fe and V are observable. The incorporation of Fe is confirmed by electron paramagnetic resonance.

Structural and Electrical Properties of Colossal Magnetoresistive LSMO Thin Films Prepared by KrF Laser Ablation Method

2001 ◽  
Vol 666 ◽  
Author(s):  
Fumiaki Mitsugi ◽  
Tomoaki Ikegami ◽  
Kenji Ebihara ◽  
Jagdish Narayan ◽  
Alexander M. Grishin
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Electrical Properties ◽  
Lattice Mismatch ◽  
X Ray Diffraction ◽  
Axis Orientation ◽  
X Ray ◽  
Colossal Magnetoresistive ◽  
Laser Ablation Method ◽  
Structural And Electrical Properties

ABSTRACTWe prepared colossal magnetoresistive La0.8Sr0.2MnO3 thin films on the MgO, SrTiO3 and LaAlO3 single crystal substrates using KrF excimer pulsed laser ablation technique. The structural and electrical properties of the La0.8Sr0.2MnO3 thin films which were strained by the lattice mismatch are reported. The in-plane lattice mismatch between the La0.8Sr0.2MnO3 and MgO, SrTiO3 and LaAlO3 substrates are -7.8 %, -0.5 % and +2.3 %, respectively. The X-ray diffraction spectra of the films exhibited c-axis orientation. In the case of the La0.8Sr0.2MnO3 / LaAlO3 thin films with thickness over 100 nm, the divided (00l) peaks were observed. The surface morphology and transport property of the strongly stressed La0.8Sr0.2MnO3 / LaAlO3 were different from those of La0.8Sr0.2MnO3 / MgO and La0.8Sr0.2MnO3 / SrTiO3thin films.

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