Fabrication of heteroepitaxial thin films of layered oxychalcogenides LnCuOCh (Ln = La–Nd; Ch = S–Te) by reactive solid-phase epitaxy

2004 ◽  
Vol 19 (7) ◽  
pp. 2137-2143 ◽  
Author(s):  
Hidenori Hiramatsu ◽  
Kazushige Ueda ◽  
Kouhei Takafuji ◽  
Hiromichi Ohta ◽  
Masahiro Hirano ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid Phase ◽  
Epitaxial Films ◽  
Annealing Process ◽  
Epitaxial Thin Films ◽  
Solid Phase Epitaxy ◽  
X Ray Diffraction ◽  
X Ray ◽  
Preparation Conditions ◽  
Thermal Annealing Process

Processes and preparation conditions for growing epitaxial thin films of Cu-based, layered oxychalcogenides LnCuOCh (Ln = La, Ce, Pr or Nd; Ch = S1-xSex or Se1-yTey) are reported. Epitaxial thin films on MgO (001) substrates were prepared by a reactive solid-phase epitaxy method. Four-axes high-resolution x-ray diffraction measurements revealed that the crystallographic orientation is (001)[110] LnCuOCh || (001)[110] MgO and the internal stress of the crystalline lattices in the films are relaxed during thermal-annealing process of the reactive solid-phase epitaxy. Furthermore, except for CeCuOS, systematic variations in the lattice constant by chalcogen or lanthanide ion substitutions were observed. These results demonstrated that the reactive solid-phase epitaxy is an efficient technique for fabricating LnCuOCh epitaxial films.

Heteroepitaxial Bi2Sr2CaCu2Ox Superconducting thin films Deposited on LaA1O3 by Solid Phase Epitaxy and OMCVD

1992 ◽  
Vol 275 ◽  
Author(s):  
J. Chen ◽  
H. A. Lu ◽  
F. DiMeo ◽  
B. W. Wessels ◽  
D. L. Schulz ◽  
...  
Keyword(s):  
Thin Films ◽  
Solid Phase ◽  
Chemical Vapor ◽  
Superconducting Thin Films ◽  
Epitaxial Thin Films ◽  
Solid Phase Epitaxy ◽  
X Ray Diffraction ◽  
Cross Sectional ◽  
Transmission Electron ◽  
Film Substrate

ABSTRACT-Heteroepitaxial superconducting Bi,Sr2CaCu2Ox (BSCCO 2212) thin films have been formed by solid phase epitaxy from amorphous films deposited on (100) LaA1O3 single crystal substrates by organometallic chemical vapor deposition. The epitaxial structure of the film is confirmed by x-ray diffraction including θ/2θ and Φ (in plane rotation) scans. Cross-sectional high resolution transmission electron microscopy indicates that the film-substrate interface is nearly atomically abrupt. Improvements in superconducting properties of the epitaxial thin films are noted in comparison to highly textured films deposited on MgO.

Synthesis of Epitaxial Thin-Films of Tetragonal Perovskites Via a Solution Technique

1998 ◽  
Vol 547 ◽  
Author(s):  
David B. Beach ◽  
Jonathan S. Morrell ◽  
Ziling B. Xue ◽  
Eliot D. Specht
Keyword(s):  
Thin Films ◽  
Single Crystal ◽  
Epitaxial Films ◽  
Solution Chemistry ◽  
Solution Technique ◽  
Epitaxial Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Spin Casting

AbstractSolution chemistry has been used to synthesize epitaxial films of SrLaGaO4, SrPrGaO4, SrLaAlO4, and SrPrAlO4 on single crystal substrates of [100] SrTiO3 and [100] LaAlO3. Precursor solutions were prepared from metal methoxyethoxides in 2-methoxyethanol. Films were prepared by spin-casting from partially hydrolyzed solutions followed by firing for 20 minutes in air at 850°C. The structure of the films was determined using X-ray diffraction. Theta/2-theta scans and omega scans (rocking curves) indicated that the films were c-axis aligned. Phi scans proved that the films were also aligned in-plane.

PREPARATION AND CHARACTERIZATION OF MnSi1.7 THIN FILMS

2002 ◽  
Vol 16 (15n16) ◽  
pp. 583-588 ◽  
Author(s):  
ZHIMIN WANG ◽  
QINGRUN HOU ◽  
YUANJIN HE
Keyword(s):  
Solid Phase ◽  
Annealing Process ◽  
Silicon Substrates ◽  
Solid Phase Reaction ◽  
Phase Reaction ◽  
X Ray Diffraction ◽  
X Ray ◽  
Temperature Range ◽  
Thermal Annealing Process

MnSi 1.7 films were prepared by Solid Phase Reaction on Si(100) substrates under UHV conditions. Auger Electron Spectroscopy (AES) and X-ray diffraction (XRD) were used to study the composition and the structure of the MnSi x films. Compared with the reactive-deposited MnSi 1.7 films on silicon substrates, severe diffusion of manganese atoms into the silicon substrate during the thermal annealing process was observed. If the annealing process was not long enough, the phenomenon of coexistence of manganese-rich and silicon-rich silicides was found. The electrical resistivity of MnSi 1.7 films was measured in the temperature range of 30°C to 450°C. The resistivity increases gradually with temperature in the temperature range measured.

Convergent-beam parallel detection x-ray diffraction system for characterizing combinatorial epitaxial thin films

2000 ◽  
Author(s):  
Kazuhiko Omote ◽  
T. Kikuchi ◽  
J. Harada ◽  
Masashi Kawasaki ◽  
Akira Ohtomo ◽  
...  
Keyword(s):  
Thin Films ◽  
Epitaxial Thin Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Parallel Detection ◽  
Convergent Beam

scholarly journals A study of (111) oriented epitaxial thin films of In2O3 on cubic Y-doped ZrO2 by synchrotron based x-ray diffraction – ERRATUM

2012 ◽  
Vol 27 (18) ◽  
pp. 2447-2447 ◽  
Author(s):  
Anna Regoutz ◽  
Kelvin H.L. Zhang ◽  
Russell G. Egdell ◽  
Didier Wermeille ◽  
Roger A. Cowley
Keyword(s):  
Thin Films ◽  
Epitaxial Thin Films ◽  
X Ray Diffraction ◽  
X Ray

Electrical Activation of Heavily Doped Arsenic Implanted Silicon

1988 ◽  
Vol 128 ◽  
Author(s):  
J. Said ◽  
H. Jaouen ◽  
G. Ghibaudo ◽  
I. Stoemenos ◽  
P. Zaumseil
Keyword(s):  
Solid Phase ◽  
Electrical Activation ◽  
Activation Process ◽  
Solid Phase Epitaxy ◽  
X Ray Diffraction ◽  
Electrical Transmission ◽  
X Ray ◽  
Defect Migration ◽  
Transmission Electron ◽  
Heavily Doped

ABSTRACTThe combination of electrical, Transmission Electron Microscopy and Triple Crystal X-ray Diffraction measurements allow us to separate the existence of a local impurity activation process from the amorphous- crystal transformation. The local process occurs in the highly damaged surface layer induced by the arsenic implantation and is efficient well below the Solid Phase Epitaxy transition temperature. It is suggested that point defect migration should play an important role in the electrical impurity activation at low annealing temperatures.

X-Ray diffraction line broadening by stacking faults in SrBi2Nb2O9/SrTiO3 epitaxial thin films

2001 ◽  
Vol 391 (1) ◽  
pp. 42-46 ◽  
Author(s):  
A. Boulle ◽  
C. Legrand ◽  
R. Guinebretière ◽  
J.P. Mercurio ◽  
A. Dauger
Keyword(s):  
Thin Films ◽  
Stacking Faults ◽  
Diffraction Line ◽  
Epitaxial Thin Films ◽  
Line Broadening ◽  
X Ray Diffraction ◽  
X Ray
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