Potential Driven Chemical Expansion of La0.6Sr0.4Co1-xFexO3-δ Thin Films on Yttria Stabilized Zirconia

2013 ◽  
Vol 1494 ◽  
pp. 259-264
Author(s):  
Kee-Chul Chang ◽  
Brian J. Ingram ◽  
E. Mitchell Hopper ◽  
Miaolei Yan ◽  
Paul Salvador ◽  
...  
Keyword(s):  
Thin Films ◽  
Vacancy Concentration ◽  
Lattice Parameter ◽  
Oxygen Vacancy Concentration ◽  
Applied Potential ◽  
X Ray Diffraction ◽  
Chemical Expansion ◽  
Bulk Data ◽  
Bulk Chemical

ABSTRACTTo better understand the response of oxygen vacancy concentration to applied potential, the lattice parameter of pulsed laser deposited La0.6Sr0.4Co1-xFexO3-δ thin films was monitored using in situ X-ray diffraction. We demonstrate that the chemical expansion under applied potential depends on the cathode morphology, which determines the contribution of different reaction pathways. We investigated applied potential dependent lattice expansion on La0.6Sr0.4Co1-xFexO3-δ with 3 different Co:Fe ratios in an attempt to connect bulk chemical expansion data to thin films. We find that the chemical expansion trends in thin films are different than expected from bulk data.

Giant Magnetoresistance Phenomenon in Laser Ablated La0.6y0.07ca0.33mnox Thin Films

1995 ◽  
Vol 397 ◽  
Author(s):  
Dhananjay Kumar ◽  
R. Kalyanaraman ◽  
J. Narayan ◽  
David K. Christen
Keyword(s):  
Thin Films ◽  
Giant Magnetoresistance ◽  
Lattice Parameter ◽  
Insulator Transition ◽  
X Ray Diffraction ◽  
Metal Insulator Transition ◽  
Metal Insulator ◽  
Spin Dependent Scattering ◽  
Resistance Peak

ABSTRACTMicrostructural and magnetoresistance properties of La0.6Y0.07Ca0.33MnOx (Y-doped LCMO) thin films grown in-situ by pulsed laser ablation have been studied. Transmission election microscopy and x-ray diffraction measurements have shown that the Y-doped LCMO thin films grow epitaxially on (100) LaAl03 substrates and are cubic with a lattice parameter of 3.849 ?. The as-deposited films exhibited a metal-insulator transition at 130 K and a giant magnetoresistance (GMR) at 125 K with a MR ratio (dR/RH) of 1500% in the presence of a magnetic field of 6 Tesla. Such a colossal value of MR ratio for as-deposited Y-doped LCMO films is quite promising keeping in view the fact that these films were unannealed and not optimized. We ascribe this magnetoresistance to spin-dependent electron scattering coupled with the presence of intervening O2. ions across Mn3+ and Mn4+ with suppressed separation between Mn-O layers caused by smaller sized Y-dopant. The effect of annealing on the positive-shift of metal-insulator transition temperature and the improvement in GMR ratio has also been discussed. We also report a non-ohmic response in the Y-doped LCMO films which is observed only in the region of the resistance peak and lends support to a conduction mechanism in these materials based on spin-dependent scattering of electrons.

Epitaxy and texture analysis of Bi-Sr-Ca-Cu-O thin films on (100) MgO using Transmission Electron Microscopy

1990 ◽  
Vol 48 (4) ◽  
pp. 68-69
Author(s):  
J. T. Sizemore ◽  
D. G. Schlom ◽  
Z. J. Chen ◽  
J. N. Eckstein ◽  
I. Bozovic ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Critical Currents ◽  
Unit Cell ◽  
X Ray Diffraction ◽  
Cell Axis ◽  
Transmission Electron ◽  
Synthesis Procedure

Investigators observe large critical currents for superconducting thin films deposited epitaxially on single crystal substrates. The orientation of these films is often characterized by specifying the unit cell axis that is perpendicular to the substrate. This omits specifying the orientation of the other unit cell axes and grain boundary angles between grains of the thin film. Misorientation between grains of YBa2Cu3O7−δ decreases the critical current, even in those films that are c axis oriented. We presume that these results are similar for bismuth based superconductors and report the epitaxial orientations and textures observed in such films.Thin films of nominally Bi2Sr2CaCu2Ox were deposited on MgO using molecular beam epitaxy (MBE). These films were in situ grown (during growth oxygen was incorporated and the films were not oxygen post-annealed) and shuttering was used to encourage c axis growth. Other papers report the details of the synthesis procedure. The films were characterized using x-ray diffraction (XRD) and transmission electron microscopy (TEM).

On the enlargement of the lattice parameter c in sputter deposited in situ prepared thin films of YBa2Cu3Ox

1997 ◽  
Vol 292 (1-2) ◽  
pp. 277-281 ◽  
Author(s):  
D.K. Aswal ◽  
S.K. Gupta ◽  
Savita N. Narang ◽  
S.C. Sabharwal ◽  
M.K. Gupta
Keyword(s):  
Thin Films ◽  
Lattice Parameter ◽  
Sputter Deposited

scholarly journals Elaboration of nitride thin films by reactive sputtering

2006 ◽  
Vol 59 (2) ◽  
pp. 225-232 ◽  
Author(s):  
Pierre Yves Jouan ◽  
Arnaud Tricoteaux ◽  
Nicolas Horny
Keyword(s):  
Thin Films ◽  
Compressive Stress ◽  
Bias Voltage ◽  
Substrate Surface ◽  
Lattice Parameter ◽  
X Ray Diffraction ◽  
X Ray ◽  
A Value ◽  
Dc Reactive Magnetron Sputtering ◽  
Nitrogen Contents

The aim of this paper is first a better understanding of DC reactive magnetron sputtering and its implications, such as the hysteresis effect and the process instability. In a second part, this article is devoted to an example of specific application: Aluminium Nitride. AlN thin films have been deposited by reactive triode sputtering. We have studied the effect of the nitrogen contents in the discharge and the RF bias voltage on the growth of AlN films on Si(100) deposited by triode sputtering. Stoichiometry and crystal orientation of AlN films have been characterized by means of Fourier-transform infrared spectroscopy, X-ray diffraction and secondary electron microscopy. Dense and transparent AlN layers were obtained at high deposition rates. These films have a (002) orientation whatever the nitrogen content in the discharge, but the best crystallised ones are obtained at low value (10%). A linear relationship was observed between the AlN lattice parameter "c" (perpendicular to the substrate surface) and the in-plane compressive stress. Applying an RF bias to the substrate leads to a (100) texture, and films become amorphous. Moreover, the film's compressive stress increases up to a value of 8GPa before decreasing slowly as the bias voltage increases.

Electric-field-induced lattice distortion in epitaxial BiFeO3 thin films as determined by in situ time-resolved x-ray diffraction

2017 ◽  
Vol 111 (8) ◽  
pp. 082907 ◽  
Author(s):  
Seiji Nakashima ◽  
Osami Sakata ◽  
Hiroshi Funakubo ◽  
Takao Shimizu ◽  
Daichi Ichinose ◽  
...  
Keyword(s):  
Thin Films ◽  
Electric Field ◽  
Lattice Distortion ◽  
X Ray Diffraction ◽  
Time Resolved ◽  
X Ray ◽  
Bifeo3 Thin Films

Thermal stability and miscibility of co-evaporated methyl ammonium lead halide (MAPbX3, X = I, Br, Cl) thin films analysed by in situ X-ray diffraction

2018 ◽  
Vol 6 (24) ◽  
pp. 11496-11506 ◽  
Author(s):  
Paul Pistor ◽  
Thomas Burwig ◽  
Carlo Brzuska ◽  
Björn Weber ◽  
Wolfgang Fränzel
Keyword(s):  
Thin Films ◽  
Thermal Stability ◽  
Thermal Treatment ◽  
Phase Evolution ◽  
X Ray Diffraction ◽  
Crystalline Phases ◽  
X Ray ◽  
Subsequent Thermal Treatment ◽  
Lead Halide

We present the identification of crystalline phases by in situ X-ray diffraction during growth and monitor the phase evolution during subsequent thermal treatment of CH3NH3PbX3 (X = I, Br, Cl) perovskite thin films.

Classification of the Modes of Dissociation in Immiscible Cu-Alloy Thin Films

1999 ◽  
Vol 564 ◽  
Author(s):  
K. Barmak ◽  
G. A. Lucadamo ◽  
C. Cabral ◽  
C. Lavoie ◽  
J. M. E. Harper
Keyword(s):  
Thin Films ◽  
Driving Forces ◽  
Texture Evolution ◽  
Substantial Reduction ◽  
Alloying Elements ◽  
X Ray Diffraction ◽  
Cu Alloy ◽  
Transmission Electron ◽  
Evolution Of Microstructure

AbstractWe have found the dissociation behavior of immiscible Cu-alloy thin films to fall into three broad categories that correlate most closely with the form of the Cu-rich end of the binary alloy phase diagrams. The motivation for these studies was to use the energy released by the dissociation of an immiscible alloy, in addition to other driving forces commonly found in thin films and lines, to promote grain growth and texture evolution. In this work, the dissociation behavior of eight dilute (3.3 ± 0.5 at% solute) binary Cu-systems was investigated, with five alloying elements selected from group VB and VIB, two from group VillA, and one from group 1B. These alloying elements are respectively V, Nb, Ta, Cr, Mo, Fe, Ru and Ag. Several experimental techniques, including in situ resistance and stress measurements as well as in situ synchrotron x-ray diffraction, were used to follow the progress of solute precipitation in approximately 500 nm thick films. In addition, transmission electron microscopy was used to investigate the evolution of microstructure of Cu(Ta) and Cu(Ag). For all eight alloys, dissociation occurred upon heating, with the rejection of solute and evolution of microstructure and texture often occurring in multiple steps that range over several hundred degrees between approximately 100 and 900°C. However, in most cases, substantial reduction in resistivity of the films took place at temperatures of interest to metallization schemes, namely below 400°C.

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