Sputter deposited ZnO porous films for sensing applications

2013 ◽  
Vol 1494 ◽  
pp. 71-76 ◽  
Author(s):  
Michał A. Borysiewicz ◽  
Elżbieta Dynowska ◽  
Valery Kolkovsky ◽  
Maciej Wielgus ◽  
Krystyna Gołaszewska ◽  
...  
Keyword(s):  
Sputter Deposition ◽  
Oxygen Flow ◽  
Ex Situ ◽  
Zno Films ◽  
Porous Films ◽  
Sensing Applications ◽  
Sputter Deposited

ABSTRACTNanoporous ZnO films are fabricated using a two step approach: sputter deposition of porous Zn followed by an ex-situ annealing in an oxygen flow at 400°C. The created structures have a porosity of 34% enabling use in surface-based absorption sensors. The films are used in a resistance-based sensor allowing easy discrimination between liquid methanol and ethanol by resistance measurements and also in a transmission-based sensor to detect NO2, NH3 and H2 gases in concentration as low as 500 ppm.

scholarly journals Effects of Alloying Elements on the Corrosion Behavior of Sputter–deposited Zr–(12–21)Cr–W Alloys in 0.5 M NaCl Solution

1970 ◽  
Vol 25 ◽  
pp. 75-82
Author(s):  
Basu Ram Aryal ◽  
Jagadeesh Bhattarai
Keyword(s):  
Corrosion Test ◽  
Open Circuit Potential ◽  
Chemical Society ◽  
Open Circuit ◽  
Sputter Deposition ◽  
Nacl Solution ◽  
Corrosion Rates ◽  
Sputter Deposited ◽  
Stable Passivity ◽  
Zirconium Metal

The synergistic effect of the simultaneous additions of tungsten and zirconium in thesputter-deposited amorphous or nanocrystalline Zr-(12-21)Cr-W alloys is studied in 0.5 MNaCl solution open to air at 25°C using corrosion tests and open circuit potentialmeasurements. Corrosion rates of the sputter-deposited Zr-(12-21)Cr-W alloys containing10-80 at % tungsten (that is, 0.95-1.85 x 10-2 mm.y-1) are more than one order of magnitudelower than that of the sputter-deposited tungsten and even lower than those of zirconium aswell as chromium in 0.5 M NaCl solution. The addition of 8-73 at % zirconium content inthe sputter-deposited binary W-(12-21)Cr alloys seems to be more effective to improve thecorrosion-resistant properties of the sputter-deposited ternary Zr-Cr-W alloys containing12-21 at % chromium in 0.5 M NaCl solution. The sputter-deposited Zr-(17-21)Cr-W alloyscontaining an adequate amounts of zirconium metal showed the more stable passivity andshowed higher corrosion resistance than those of alloy-constituting elements in 0.5 M NaClsolution open to air at 25°C.Keywords: Zr-(12-21)Cr-W alloys, sputter deposition, corrosion test, open circuit potential,0.5 M NaCl.DOI:  10.3126/jncs.v25i0.3305Journal of Nepal Chemical Society Volume 25, 2010 pp 75-82

scholarly journals Sputter Deposited Metal Layers Embedded in Composites—From Fundamentals to Applications

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 190
Author(s):  
Florian Cougnon ◽  
Mathias Kersemans ◽  
Wim Van Paepegem ◽  
Diederik Depla
Keyword(s):  
Thin Films ◽  
Heat Flux ◽  
Sputter Deposition ◽  
Image Correlation ◽  
Fiber Reinforced Polymers ◽  
Thermal Probe ◽  
Reinforced Polymers ◽  
Magnetron Sputter Deposition ◽  
Sputter Deposited ◽  
Metal Layers

Due to the low heat flux towards the substrate, magnetron sputter deposition offers the possibility to deposit thin films on heat sensitive materials such as fiber-reinforced polymers, also known as composite materials. Passive thermal probe measurements during the sputter deposition of metal layers show indeed that the temperature increase remains well below 25 °C for film thicknesses up to 600 nm. The latter thickness threshold is based on the influence of embedded metal films on the adhesion of the composite plies. Films thicker than this threshold deteriorate the mechanical integrity of the composite. The introduction of the uncured composite in the vacuum chamber strongly affects the base pressure by outgassing of impurities from the composite. The impurities affect the film properties as illustrated by their impact on the Seebeck coefficient of sputter deposited thermocouples. The restrictions to embed thin films in composites, as illustrated by both the heat flux measurements, and the study on the influence of impurities, are however not insurmountable. The possibility to use embedded thin films will be briefly demonstrated in different applications such as digital volume image correlation, thermocouples, and de-icing.

Properties of Sputter Deposited ZnO Films Co-doped with Lithium and Phosphorus

2013 ◽  
Vol 1494 ◽  
pp. 77-82
Author(s):  
T. N. Oder ◽  
A. Smith ◽  
M. Freeman ◽  
M. McMaster ◽  
B. Cai ◽  
...  
Keyword(s):  
Rf Magnetron Sputtering ◽  
Zno Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
Sapphire Substrates ◽  
Hall Effect Measurements ◽  
Sputter Deposited ◽  
P Type ◽  
Post Deposition ◽  
Co Doped

ABSTRACTThin films of ZnO co-doped with lithium and phosphorus were deposited on sapphire substrates by RF magnetron sputtering. The films were sequentially deposited from ultra pure ZnO and Li3PO4 solid targets. Post deposition annealing was carried using a rapid thermal processor in O2 and N2 at temperatures ranging from 500 °C to 1000 °C for 3 min. Analyses performed using low temperature photoluminescence spectroscopy measurements reveal luminescence peaks at 3.359, 3.306, 3.245 eV for the co-doped samples. The x-ray diffraction 2θ-scans for all the films showed a single peak at about 34.4° with full width at half maximum of about 0.17°. Hall Effect measurements revealed conductivities that change from p-type to n-type over time.

Sputter Deposition of Fe-Co Nitride for Ferromagnetic Granular Nitride Thin Film

2009 ◽  
Vol 631-632 ◽  
pp. 327-331 ◽  
Author(s):  
K. Sakon ◽  
Y. Hirokawa ◽  
Yasuji Masubuchi ◽  
Shinichi Kikkawa
Keyword(s):  
Thin Film ◽  
Solid Solution ◽  
Thermal Decomposition ◽  
Sputter Deposition ◽  
Composite Target ◽  
Zinc Blende ◽  
Alloy Particles ◽  
Sputter Deposited ◽  
Magneto Resistance ◽  
Zinc Blende Structure

Sputter deposited Fe0.7Co0.3 nitride thin film had zinc blende structure. It was thermally decomposed completely back to the ferromagnetic Fe0.7Co0.3 alloy above 400°C. As-deposited nitride thin films obtained in cosputtering of (Fe0.7Co0.3)1-xAlx composite target with nitrogen sputter gas were solid solutions with zinc blende (x≤0.44) and wurtzite (x>0.5) type structure, respectively. The largest magneto resistance ratio of 0.24% was observed on the Fe0.7Co0.3 alloy particles dispersed in AlN thin film obtained by thermal decomposition of the nitride solid solution with x=0.66 at 500°C.

scholarly journals Superlayer Residual Stress Effect on the Indentation Adhesion Measurements

1999 ◽  
Vol 594 ◽  
Author(s):  
Alex A. Volinsky ◽  
Neville R. Moody ◽  
William W. Gerberich
Keyword(s):  
Residual Stress ◽  
Sputter Deposition ◽  
Work Of Adhesion ◽  
Stress Effect ◽  
Aluminum Films ◽  
Nanoindentation Testing ◽  
Deposition Parameters ◽  
Thin Aluminum ◽  
Residual Stress Effect ◽  
Sputter Deposited

AbstractThe practical work of adhesion has been measured in thin aluminum films as a function of film thickness and residual stress. These films were sputter deposited onto thermally oxidized silicon wafers followed by sputter deposition of a one micron thick W superlayer. The superlayer deposition parameters were controlled to produce either a compressive residual stress of 1 GPa or a tensile residual stress of 100 MPa. Nanoindentation testing was then used to induce delamination and a mechanics based model for circular blister formation was used to determine practical works of adhesion. The resulting measured works of adhesion for all films between 100 nm and 1 μm thick was 30 J/m2 regardless of superlayer stress. However, films with the compressively stressed superlayers produced larger blisters than films with tensile stressed superlayers. In addition, these films were susceptible to radial cracking producing a high variability in average adhesion values.

Oxygen bombardment effects on average crystallite size of sputter-deposited ZnO films

2008 ◽  
Vol 354 (17) ◽  
pp. 1926-1931 ◽  
Author(s):  
Mamoru Furuta ◽  
Takahiro Hiramatsu ◽  
Tokiyoshi Matsuda ◽  
Chaoyang Li ◽  
Hiroshi Furuta ◽  
...  
Keyword(s):  
Crystallite Size ◽  
Average Crystallite Size ◽  
Zno Films ◽  
Sputter Deposited

Preparation and Influencing Factors of Molybdenum Targets and Magnetron-Sputter-Deposited Molybdenum Thin Films

2018 ◽  
Vol 913 ◽  
pp. 853-861 ◽  
Author(s):  
Geng An ◽  
Jun Sun ◽  
Yuan Jun Sun ◽  
Wei Cheng Cao
Keyword(s):  
Thin Films ◽  
Grain Orientation ◽  
Sputter Deposition ◽  
Powder Metallurgy Method ◽  
Total Deformation ◽  
Electrical Conductivities ◽  
Diffraction Peaks ◽  
Magnetron Sputter ◽  
Sputter Deposited ◽  
Surface Morphologies

Aiming to produce qualified molybdenum (Mo) target for sputter deposition, Mo targets were prepared by utilizing powder metallurgy method in this research. The influences of sintering modes, press working modes and total deformation on microstructure and properties of Mo target were studied. Furthermore, magnetron sputtering test was conducted in vacuum environment by using the prepared Mo targets to deposit Mo thin films of which the surface morphologies, electrical conductivities, and crystalline properties were analyzed. The results show that vacuum presintering followed by hydrogen sintering mode can greatly decrease the impurity contents of Mo slabs. It is favorable to obtain the Mo target with fine and uniform grains on size and distribution by using forging mode or forging cogging mode and more than 70% total deformation. With the increase of sputtering currents of Mo target, the grain size and the thickness of the Mo thin films significantly rise, while FWHM of diffraction peaks of grain orientation (110), surface roughness and electrical resistivity of thin films decrease accordingly.

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