Deep Levels in Type-II Superlattices

1993 ◽  
Vol 325 ◽  
Author(s):  
John D. Dow ◽  
Jun Shen ◽  
Shang Yuan Ren ◽  
William E. Packard

AbstractQuantum confinement in superlattices affects shallow levels and band edges considerably (length scale of order 100 Å), but not deep levels (length scale of order 5 Å). Thus by band-gap engineering, one can move a band edge through a deep level, causing the defect responsible for the level to change its doping character. For example, the cation-on-anion-site defect in AlxGa1−xSb alloys is predicted to change from a shallow acceptor to a deep acceptor-like trap as the valence band edge passes through its T2 deep level with increasing At alloy content x. In a, Type-II superlattice, such as InAs/AlxGa1−xSb for x>0.2, where the conduction band minimum of the InAs should lie energetically below the antisite defect's T2 level in bulk AlxGa1−xSb, the electrons normally trapped in this deep level (when the defect is neutral) remotely dope the InAs n-type in the superlattice, leaving the defect positively charged. Thus a native defect that is thought of as an acceptor can actually be a donor and control the n-type doping of InAs quantum wells. The physics of such deep levels in superlattices and in quantum wells is summarized, and related to high-speed devices.

1993 ◽  
Vol 63 (25) ◽  
pp. 3509-3511 ◽  
Author(s):  
Deepak K. Nayak ◽  
Noritaka Usami ◽  
Susumu Fukatsu ◽  
Yasuhiro Shiraki

1989 ◽  
Vol 163 ◽  
Author(s):  
John D. Dow ◽  
Shang Yuan Ren ◽  
Jun Shen ◽  
Min-Hsiung Tsai

AbstractThe physics of deep levels in semiconductors is reviewed, with emphasis on the fact that all substitutional impurities produce deep levels - some of which may not lie within the fundamental band gap. The character of a dopant changes when one of the deep levels moves into or out of the fundamental gap in response to a perturbation such as pressure or change of host composition. For example, Si on a Ga site in GaAs is a shallow donor, but becomes a deep trap for x>0.3 in AℓxGa1-xAs. Such shallow-deep transitions can be induced in superlattices by changing the period-widths and quantum confinement. A good rule of thumb for deep levels in superlattices is that the energy levels with respect to vacuum are relatively insensitive (on a >0.1 eV scale) to superlattice period-widths, but that the band edges of the superlattices are sensitive to changes of period. Hence the deep level positions relative to the band edges are sensitive to the period-widths, and shallow-deep transitions can be induced by band-gap engineering the superlattice periods.


2017 ◽  
Vol 897 ◽  
pp. 467-470 ◽  
Author(s):  
Kohei Ebihara ◽  
Koutarou Kawahara ◽  
Hiroshi Watanabe ◽  
Shuhei Nakata ◽  
Satoshi Yamakawa

SiC devices such as MOSFETs and SBDs reduce power loss in fast-switching condition as compared to Si devices. However, shallow and deep levels in SiC significantly affect dynamic characteristics of SiC devices. We already reported that high densities of deep levels were discovered in Al+-implanted samples other than the shallow Al acceptor level. In this work, we applied the deep level to the TCAD simulation, and examined the behavior of the carriers at high dV/dt conditions.


2018 ◽  
Vol 30 (4) ◽  
pp. 399-402 ◽  
Author(s):  
Bassem Tossoun ◽  
Robert Stephens ◽  
Ye Wang ◽  
Sadhvikas Addamane ◽  
Ganesh Balakrishnan ◽  
...  

1993 ◽  
Vol 32 (Part 2, No. 10A) ◽  
pp. L1391-L1393 ◽  
Author(s):  
Deepak K. Nayak ◽  
Noritaka Usami ◽  
Hiroshi Sunamura ◽  
Susumu Fukatsu ◽  
Yasuhiro Shiraki

1994 ◽  
Vol 37 (4-6) ◽  
pp. 933-936 ◽  
Author(s):  
D.K. Nayak ◽  
N. Usami ◽  
H. Sunamura ◽  
S. Fukatsu ◽  
Y. Shiraki

2005 ◽  
Vol 892 ◽  
Author(s):  
Antonio Castaldini ◽  
Anna Cavallini ◽  
Lorenzo Rigutti ◽  
Matteo Meneghini ◽  
Simone Levada ◽  
...  

AbstractWe present a combined Capacitance-Voltage (C-V), Deep Level Transient Spectroscopy (DLTS) and Photocurrent (PC) study of short-term instabilities of InGaN/GaN LEDs submitted to forward current aging tests at room temperature. C-V profiles detect changes consisting in apparent doping and/or charge concentration increase within the quantum wells. This increase is correlated to dramatic modifications in the DLTS spectrum when the reverse bias and filling pulse are properly adjusted in order to probe the quantum well region. The new distribution of the electronic levels detected by DLTS could explain the observed decrease in the light emission efficiency [1,2] of the device, as the deep levels generated during the stress may provide alternative recombination paths for free carriers. The photocurrent spectra do not change in shape during stress, although their amplitude slightly decreases. This is related to a decrease of the device yield, in this photodetector configuration, with increasing aging time. Thus, we can suggest that the introduction of new defect levels in the bulk material lowers the free carrier mobility.


1993 ◽  
Vol 325 ◽  
Author(s):  
Pallab Bhattaci-Iarya ◽  
Shin-Hwa Li ◽  
Jinju Lee ◽  
Steve Smith

AbstractDeep levels and luminescence in SiGe/Si heterostructures and quantum wells have been investigated. We have studied the effects of Be- and B-doping on the luminescent properties of Si1−xGex/Si single and multiquantum wells. No new levels, or enhancement of luminescence, from that in undoped samples, is detected in samples which are selectively doped in the well-regions, implying that the observed luminescence in the undoped quantum wells is a result of alloy disordering. Slight enhancement of luminescence is observed in disordered wells and in quantum wires made by electron beam lithography and dry etching. Deep levels have been identified and characterized in undoped Si1-xGex alloys. Hole traps in the p-type layers have activation energies ranging from 0.029-0.45 eV and capture cross sections (σ∞) ranging from 10−9 to 10−20 cm2. Possible origins of these centers are discussed. Some possibilities of obtaining enhanced electro-optic coefficients in SiGe/Si heterostructures are discussed.


1987 ◽  
Vol 48 (C5) ◽  
pp. C5-525-C5-528 ◽  
Author(s):  
K. J. MOORE ◽  
P. DAWSON ◽  
C. T. FOXON
Keyword(s):  
Type I ◽  
Type Ii ◽  

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