X-Ray Photoelectron Spectroscopy Investigation of the Interaction of NF3 with Silicon

1996 ◽  
Vol 439 ◽  
Author(s):  
T. W. Little ◽  
F. S. Ohuchi
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Plasma Processing ◽  
Ion Bombardment ◽  
Nitrogen Trifluoride ◽  
X Ray ◽  
Controlled Conditions

AbstractThe interaction of nitrogen trifluoride (NF3) with silicon (Si) surfaces has been investigated by x-ray photoelectron spectroscopy (XPS). Si (100) surfaces were subjected to NF3 ion bombardment as a means of approximating plasma processing under controlled conditions. Samples were also exposed to actual NF3 DC plasmas and the results compared to ion beam and plasma processing using nitrogen (N2). The results indicate that nitridation of silicon is possible using NF3 although it seems to be limited by simultaneous etching. Additionally, results suggest bonding between both Si-F and Si-N species and perhaps F-N-Si moieties. NF3 plasma processing has lead to curious results for F 1s spectra which are not fully understood at present.

X-Ray Photoelectron Spectroscopy Investigation of the Interaction of NF3 with Silicon

1996 ◽  
Vol 438 ◽  
Author(s):  
T. W. Little ◽  
F. S. Ohuchi
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Plasma Processing ◽  
Ion Bombardment ◽  
Nitrogen Trifluoride ◽  
X Ray ◽  
Controlled Conditions

AbstractThe interaction of nitrogen trifluoride (NF3) with silicon (Si) surfaces has been investigated by x-ray photoelectron spectroscopy (XPS). Si (100) surfaces were subjected to NF3 ion bombardment as a means of approximating plasma processing under controlled conditions. Samples were also exposed to actual NF3 DC plasmas and the results compared to ion beam and plasma processing using nitrogen (N2). The results indicate that nitridation of silicon is possible using NF3 although it seems to be limited by simultaneous etching. Additionally, results suggest bonding between both Si-F and Si-N species and perhaps F-N-Si moieties. NF3 plasma processing has lead to curious results for F ls spectra which are not fully understood at present.

XPS Investigation of Ion Implanted PMMA

1991 ◽  
Vol 235 ◽  
Author(s):  
R. Kallweit ◽  
U. Roll ◽  
H. Strack ◽  
A. Pocker
Keyword(s):  
Chemical Modification ◽  
Energy Dependence ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Ion Bombardment ◽  
Beam Current ◽  
Ion Energy ◽  
X Ray ◽  
Constant Dose ◽  
Energy Dependent

ABSTRACTDuring ion bombardment, polymethylmethacrylate (PMMA) shows degassing of polymer components with a fluence and energy dependent contraction of the material, which leads to a material modification.The ion beam induced chemical modification of the implanted layers was examined by means of X-ray photoelectron spectroscopy (XPS). The dependence of the chemical modification on beam current, ion fluence and ion energy was investigated for nitrogen implantations at energies ranging from 50 keV to 400 keV for ion fluences between 7×1013 / cm2 and 7×1015/cm2. Compared with the C-spectrum of virgin PMMA, the spectra of the implanted layers exhibited an increase of intensity of the 284.5 eV peak and the 286.4 eV peak. The ion beam induced modification led basically to generation of new C-o-groups. These generations show drastical changes in the dependence of the beam current and the ion fluence. Nevertheless, at a constant dose of 2×1014/cm2 the concentrations of the new groups did not indicate any energy dependence.

Effects of ion beam bombardment on electrochromic tungsten oxide films studied by X-ray photoelectron spectroscopy and Rutherford back-scattering

2000 ◽  
Vol 376 (1-2) ◽  
pp. 131-139 ◽  
Author(s):  
H.Y. Wong ◽  
C.W. Ong ◽  
R.W.M. Kwok ◽  
K.W. Wong ◽  
S.P. Wong ◽  
...  
Keyword(s):  
Tungsten Oxide ◽  
Photoelectron Spectroscopy ◽  
Ion Beam ◽  
Oxide Films ◽  
Rutherford Back Scattering ◽  
X Ray ◽  
Back Scattering

Oxidation of Alloy-X in Subcritical, Transition, and Supercritical Water

CORROSION ◽  
10.5006/3881 ◽  
2021 ◽  
Author(s):  
Zachary Karmiol ◽  
Dev Chidambaram
Keyword(s):  
Supercritical Water ◽  
Photoelectron Spectroscopy ◽  
Focused Ion Beam ◽  
Elevated Temperatures ◽  
Subcritical Water ◽  
Ion Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Nickel Based Superalloy ◽  
Before And After

This work investigates the oxidation of a nickel based superalloy, namely Alloy X, in water at elevated temperatures: subcritical water at 261°C and 27 MPa, the transition between subcritical and supercritical water at 374°C and 27 MPa, and supercritical water at 380°C and 27 MPa for 100 hours. The morphology of the sample surfaces were studied using scanning electron microscopy coupled with focused ion beam milling, and the surface chemistry was investigated using X-ray diffraction, Raman spectroscopy, energy dispersive X-ray spectroscopy, and X-ray photoelectron spectroscopy before and after exposure studies. Surfaces of all samples were identified to comprise of a ferrite spinel containing aluminum.

In situ analysis of Si(100) surface damage induced by low-energy rare-gas ion bombardment using x-ray photoelectron spectroscopy

1997 ◽  
Vol 15 (3) ◽  
pp. 820-824 ◽  
Author(s):  
Masahiko Ishii ◽  
Yoshiharu Hirose ◽  
Toshikazu Sato ◽  
Takeshi Ohwaki ◽  
Yasunori Taga
Keyword(s):  
Photoelectron Spectroscopy ◽  
Ion Bombardment ◽  
Surface Damage ◽  
Low Energy ◽  
In Situ Analysis ◽  
Rare Gas ◽  
X Ray

Modification of RbTiOPO 4 (001) crystal surface induced by Ar + ion bombardment: X-ray photoelectron spectroscopy and first-principles studies

Vacuum ◽  
2018 ◽  
Vol 147 ◽  
pp. 38-44 ◽  
Author(s):  
Xiulan Duan ◽  
Jian Liu ◽  
Yang Chen ◽  
Ziqing Li ◽  
Pengfei Zhu ◽  
...  
Keyword(s):  
First Principles ◽  
Photoelectron Spectroscopy ◽  
Crystal Surface ◽  
Ion Bombardment ◽  
X Ray

The Nc State Analytical Instrumentation Facility

1999 ◽  
Vol 5 (S2) ◽  
pp. 10-11
Author(s):  
J.R. Phillips ◽  
D.P. Griffis ◽  
P.E. Russell
Keyword(s):  
Surface Science ◽  
Photoelectron Spectroscopy ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Non Profit ◽  
X Ray ◽  
Industrial Organizations ◽  
Extensive Collection ◽  
Analytical Instrumentation ◽  
Analytical Services

The Analytical Instrumentation Facility (AIF) is a laboratory composed of scientists and engineers specializing in the development and application of advanced techniques for materials characterization (http://spm.aif.ncsu.edu/aif/index.html)http://www.nice.org.uk/page.aspx?o=43210. AIF facilities include an extensive collection of analytical instrumentation utilized in teaching, research, and in support of academic and industrial programs. General forms of analysis include: electron, ion, and photon microscopies, surface science and analysis, and scanned probe microscopies. An abbreviated listing of AIF capabilities follows: metallography/sample preparation, optical microscopy, X-ray Diffraction (XRD), X-ray Fluorescence (XRF), Secondary Ion Mass Spectroscopy (SIMS), Secondary Electron Microscopy (SEM), Scanned Probe Microscopy (SPM), Micro-Raman Spectroscopy, Focused Ion Beam Micro-machining (FIBM), Auger Electron Spectroscopy (AES), and X-Ray Photoelectron Spectroscopy (XPS or ESCA).AIF is a resource utilized not only by those within NC State requiring analytical services, but also by a large number of North Carolina non-profit and industrial organizations as well as the Materials Community at large.

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