Characterization of Tetrahedrally Bonded Amorphous Carbon Via Capacitance Techniques

1998 ◽  
Vol 509 ◽  
Author(s):  
Kimon C. Palinginis ◽  
A. Ilie ◽  
B. Kleinsorge ◽  
W.I. Milne ◽  
J. D. Cohen
Keyword(s):  
Amorphous Carbon ◽  
Thermal Activation ◽  
Activation Process ◽  
Defect States ◽  
Capacitance Measurements ◽  
Tetrahedral Amorphous Carbon ◽  
Thermal Activation Process ◽  
Order Of Magnitude ◽  
Defect Densities

AbstractWe report the results of junction capacitance measurements on thin tetrahedral amorphous carbon (ta-C) films to deduce their defect densities. We find defect densities in the range 3 - 7 × 1017 cm−3 in the undoped ta-C films, and roughly an order of magnitude larger in the nitrogen doped (n-type) films. In some cases fairly uniform defect profiles were obtained covering a thickness of a couple of hundreds angstroems. We also observed a thermal activation process of carriers from defect states at the ta-C/c-Si interface with an activation energy in the range of 0.4eV to 0.5eV.

Characterization of Tetrahedrally Bonded Amorphous Carbon Via Capacitance Techniques

1998 ◽  
Vol 508 ◽  
Author(s):  
Kimon C. Palinginis ◽  
A. Ilie ◽  
B. Kleinsorge ◽  
W.I. Milne ◽  
J. D. Cohen
Keyword(s):  
Amorphous Carbon ◽  
Thermal Activation ◽  
Activation Process ◽  
Defect States ◽  
Capacitance Measurements ◽  
Tetrahedral Amorphous Carbon ◽  
Thermal Activation Process ◽  
Order Of Magnitude ◽  
Defect Densities

AbstractWe report the results of junction capacitance measurements on thin tetrahedral amorphous carbon (ta-C) films to deduce their defect densities. We find defect densities in the range 3 - 7 × 1017 cm−3 in the undoped ta-C films, and roughly an order of magnitude larger in the nitrogen doped (n-type) films. In some cases fairly uniform defect profiles were obtained covering a thickness of a couple of hundreds angstroems. We also observed a thermal activation process of carriers from defect states at the ta-C/c-Si interface with an activation energy in the range of 0.4eV to 0.5eV.

Thermal Degradation Behavior of Hydrogen Permeability of Pd-Coated V-Alloy Membrane for Hydrogen Separation and Purification

2021 ◽  
Vol 1016 ◽  
pp. 1710-1714
Author(s):  
Hiroshi Yukawa ◽  
Tomonori Nambu ◽  
Yoshihisa Matsumoto
Keyword(s):  
Thermal Activation ◽  
Hydrogen Permeability ◽  
Testing Temperature ◽  
Hydrogen Separation ◽  
Activation Process ◽  
Degradation Behavior ◽  
Separation And Purification ◽  
Accelerated Degradation ◽  
Thermal Degradation Behavior ◽  
Thermal Activation Process

A series of accelerated degradation experiments at high temperatures have been performed for Pd-coated V-10 mol% Fe alloy membranes in order to investigate the degradation behavior of hydrogen permeability. The degradation of the membrane becomes severer with increasing testing temperature. The temperature dependence of the 20% degradation rate almost obeys the Arrhenius relationship, suggesting that the degradation phenomenon occurs by a kind of thermal activation process. It is found that the addition of a small amount of W into Pd overlayer improves the durability of the membrane significantly.

Characterization of Tetrahedral Amorphous Carbon (Ta-C) Thin Films with >6GPa Compressive Stress and Application in Sub-32nm p-MOSFET Strain Engineering

2019 ◽  
Vol 44 (1) ◽  
pp. 395-399
Author(s):  
Xiaolong Ma ◽  
Zuozhen Fu ◽  
Huaxiang Yin ◽  
Haiqiang Zhang ◽  
Xu Zhang
Keyword(s):  
Thin Films ◽  
Compressive Stress ◽  
Amorphous Carbon ◽  
Strain Engineering ◽  
Tetrahedral Amorphous Carbon

Capacitance and Transient Photocapacitance Studies of Tetrahedral Amorphous Carbon

2000 ◽  
Vol 621 ◽  
Author(s):  
Kimon C. Palinginis ◽  
A. Ilie ◽  
W.I. Milne ◽  
J. David Cohen
Keyword(s):  
Amorphous Carbon ◽  
Urbach Energy ◽  
Defect Density ◽  
Intrinsic Property ◽  
Band Tail ◽  
Junction Capacitance ◽  
Tetrahedral Amorphous Carbon ◽  
Thermally Activated ◽  
A Value ◽  
Defect Densities

ABSTRACTWe have applied junction capacitance and transient photocapacitance measurements to undoped tetrahedral amorphous carbon (ta-C)/silicon carbide (SiC) heterostructures to deduce defect densities and defect distributions in ta-C. The junction capacitance measurements show two thermally activated processes. One can be related to the activation of carriers out of defects at the ta-C/SiC interface while the other one with an activation energy of 0.36eV is an intrinsic property of the ta-C. The defect density at the ta-C/SiC interface is estimated to be roughly 9 ± 2 × 109 cm−2. The transient photocapacitance measurements have allowed us to observe the broader band tail of ta-C, giving a value (Urbach energy) of 230meV.

scholarly journals Characterization of Tetrahedral Amorphous Carbon Film with Various Thickness by High Through-put Method

2018 ◽  
Vol 33 (11) ◽  
pp. 1173
Author(s):  
WEI Jing ◽  
LI Han-Chao ◽  
KE Pei-Ling ◽  
WANG Ai-Ying
Keyword(s):  
Amorphous Carbon ◽  
Carbon Film ◽  
Amorphous Carbon Film ◽  
Tetrahedral Amorphous Carbon

Recent progress of Mg-ion implantation and thermal activation process for p-doping in GaN (Conference Presentation)

2019 ◽  
Author(s):  
Hideki Sakurai ◽  
Masato Omori ◽  
Shinji Yamada ◽  
Yukihiro Furukawa ◽  
Hideo Suzuki ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Thermal Activation ◽  
Recent Progress ◽  
Activation Process ◽  
Thermal Activation Process

scholarly journals Dissolution Process Observation of Methane Bubbles in the Deep Ocean Simulator Facility

Energies ◽  
2020 ◽  
Vol 13 (15) ◽  
pp. 3938
Author(s):  
Tsutomu Uchida ◽  
Ike Nagamine ◽  
Itsuka Yabe ◽  
Tatsunori Fukumaki ◽  
Ai Oyama ◽  
...  
Keyword(s):  
Dissolution Rate ◽  
Thermal Activation ◽  
Pure Water ◽  
Deep Ocean ◽  
Ccd Camera ◽  
Activation Process ◽  
Thermal Activation Process ◽  
Methane Bubble ◽  
Expected Values ◽  
Process Observation

To investigate the temperature dependency of the methane bubble dissolution rate, buoyant single methane bubbles were held stationary in a countercurrent water flow at a pressure of 6.9 MPa and temperatures ranging from 288 K to 303 K. The 1 to 3 mm diameter bubbles were analyzed by observation through the pressure chamber viewport using a bi-telecentric CCD camera. The dissolution rate in artificial seawater was approximately two times smaller than that in pure water. Furthermore, it was observed that the methane bubble dissolution rate increased with temperature, suggesting that bubble dissolution is a thermal activation process (the activation energy is estimated to be 9.0 kJ/mol). The results were different from the expected values calculated using the governing equation for methane dissolution in water. The dissolution modeling of methane bubbles in the mid-to-shallow depth of seawater was revised based on the current results.

Raman characterization of boron doped tetrahedral amorphous carbon films

2008 ◽  
Vol 43 (2) ◽  
pp. 453-462 ◽  
Author(s):  
Manlin Tan ◽  
Jiaqi Zhu ◽  
Jiecai Han ◽  
Wei Gao ◽  
Aiping Liu ◽  
...  
Keyword(s):  
Amorphous Carbon ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Tetrahedral Amorphous Carbon ◽  
Boron Doped ◽  
Raman Characterization
Sign in / Sign up

Export Citation Format

Share Document