Characterization of Thin PtSI/p-Si Schottky Diodes

1985 ◽  
Vol 54 ◽  
Author(s):  
J. Silverman ◽  
P. Pellegrini ◽  
J. Comer ◽  
A. Golvbovic ◽  
M. Weeks ◽  
...  
Keyword(s):  
Schottky Diodes ◽  
Electrical Current ◽  
Processing Parameters ◽  
Silicon Substrates ◽  
Unexpected Result ◽  
State Diffusion ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
P Type

ABSTRACTA series of PtSi on p-type Si diodes have been characterized in order to establish correlations among processing parameters, metallurgical features and electrical properties. Characterization techniques include analytical (TED, TEM), electrical (current-voltage characteristics), and optical (photoemission and absorption). The fabrication techniques involve e-beam evaporation of platinum layers at UHV levels onto VLSI grade (100) p-type silicon substrates. The silicide layers are formed via sub-eutectic solid state diffusion at 350°C. The main trends with thickness as well as possible interrelationships are described. An unexpected result is the presence of unreacted polycrystalline Pt and Pt2Si at the interface.

scholarly journals Growth and Characterization of CuO Nanostructures on Si for the Fabrication of CuO/p-Si Schottky Diodes

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
S. Çetinkaya ◽  
H. A. Çetinkara ◽  
F. Bayansal ◽  
S. Kahraman
Keyword(s):  
Schottky Diodes ◽  
Sol Gel ◽  
Sem Images ◽  
Gel Method ◽  
Sol Gel Method ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Cbd Method ◽  
Xrd Techniques

CuO interlayers in the CuO/p-Si Schottky diodes were fabricated by using CBD and sol-gel methods. Deposited CuO layers were characterized by SEM and XRD techniques. From the SEM images, it was seen that the film grown by CBD method is denser than the film grown by sol-gel method. This result is compatible with XRD results which show that the crystallization in CBD method is higher than it is in sol-gel method. For the electrical investigations, current-voltage characteristics of the diodes have been studied at room temperature. ConventionalI-Vand Norde’s methods were used in order to determine the ideality factor, barrier height, and series resistance values. It was seen that the morphological and structural analysis are compatible with the results of electrical investigations.

Comparison of current-voltage characteristics of n- and p-type 6H-SiC Schottky diodes

2001 ◽  
Vol 30 (3) ◽  
pp. 196-201 ◽  
Author(s):  
Q. Zhang ◽  
V. Madangarli ◽  
M. Tarplee ◽  
T. S. Sudarshan
Keyword(s):  
Schottky Diodes ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
P Type

Schottky Barrier Height Dependence on the Metal Work Function for p-type Si Schottky Diodes

2004 ◽  
Vol 59 (11) ◽  
pp. 795-798 ◽  
Author(s):  
Güven Çankaya ◽  
Nazım Uçar
Keyword(s):  
Fermi Level ◽  
Schottky Barrier ◽  
Schottky Diodes ◽  
Metal Work Function ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Work Functions ◽  
P Type ◽  
Relationship Of ◽  
Metal Work

We investigated Schottky barrier diodes of 9 metals (Mn, Cd, Al, Bi, Pb, Sn, Sb, Fe, and Ni) having different metal work functions to p-type Si using current-voltage characteristics. Most Schottky contacts show good characteristics with an ideality factor range from 1.057 to 1.831. Based on our measurements for p-type Si, the barrier heights and metal work functions show a linear relationship of current-voltage characteristics at room temperature with a slope (S=ϕb/ϕm) of 0.162, even though the Fermi level is partially pinned. From this linear dependency, the density of interface states was determined to be about 4.5 · 1013 1/eV per cm2, and the average pinning position of the Fermi level as 0.661 eV below the conduction band

scholarly journals Characterization of Schottky Diodes on 4H-SiC with Various Off-Axis Angles Grown by Sublimation Epitaxy

2008 ◽  
Vol 600-603 ◽  
pp. 967-970 ◽  
Author(s):  
Mitsutaka Nakamura ◽  
Yoshikazu Hashino ◽  
Tomoaki Furusho ◽  
Hiroyuki Kinoshita ◽  
Hiromu Shiomi ◽  
...  
Keyword(s):  
Ideality Factor ◽  
Basal Plane ◽  
Reverse Bias ◽  
Schottky Barrier Height ◽  
Schottky Diodes ◽  
Bias Current ◽  
Device Performance ◽  
Current Voltage ◽  
Current Voltage Characteristics

The effects of basal-plane defects on the performance of 4H-SiC Schottky diodes using a Ni electrode are demonstrated. Systematic characterization was performed using 4H-SiC epitaxial layers grown by sublimation epitaxy on substrates with various off-axis angles. As the off-axis angle increases, the ideality factor of the current-voltage characteristics increases, and the Schottky barrier height decreases, corresponding to an increase in the number of basal-plane defects. The reverse-bias current degrades for high off-axis samples. These results indicate that basal-plane defects degrade the device performance. Schottky diodes that possesses good characteristics were obtained for samples with low off-axis angles (2o- and 4o-off samples).

MODELING OF COAXIAL CARBON NANOTUBE SCHOTTKY DIODES

2010 ◽  
Vol 24 (17) ◽  
pp. 1883-1890
Author(s):  
ALIREZA KARGAR
Keyword(s):  
Carbon Nanotube ◽  
Field Effect Transistors ◽  
Schottky Diodes ◽  
Gate Insulator ◽  
Saturation Current ◽  
Electrical Parameters ◽  
Single Walled Carbon Nanotube ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
P Type

A carbon nanotube (CNT) Schottky diode based on coaxial geometry is presented. We show that coaxially gated CNT field effect transistors (FETs) with a p-type semiconducting single-walled carbon nanotube (s-SWNT) and asymmetric contacts can provide good diode characteristics. The effect of different physical and electrical parameters such as gate bias voltage, gate insulator thickness, and CNT diameter on the rectification current–voltage characteristics is investigated. We demonstrate that it is possible to tune the rectification characteristic, threshold voltage, reverse saturation current, and reverse turn-on voltage by using these parameters.

scholarly journals Spectroscopic Characterization of Electrodeposited Poly(o-toluidine) Thin Films and Electrical Properties of ITO/Poly(o-toluidine)/Aluminum Schottky Diodes

2007 ◽  
Vol 2007 ◽  
pp. 1-7 ◽  
Author(s):  
A. Elmansouri ◽  
A. Outzourhit ◽  
A. Oueriagli ◽  
A. Lachkar ◽  
N. Hadik ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrochemical Polymerization ◽  
Schottky Diodes ◽  
Supporting Electrolyte ◽  
Spectroscopic Characterization ◽  
Current Voltage ◽  
Current Voltage Characteristics ◽  
Deposited Films ◽  
Ft Raman

Poly(o-toluidine) (POT) thin films were synthesized by electrochemical polymerization under cyclic voltammetric conditions from o-toluidine monomer in an aqueous solution of HCl as a supporting electrolyte. The electrosynthesized films were characterized by UV-Visible, FT-Raman, and FTIR spectroscopies. The optical transmissions of the as-deposited films were measured in the 400–900 nm wavelength range. These measurements showed that the optical band gap of the polymer films is in the order of 2.52 eV. The FT-Raman and FTIR measurements showed that the POT film is composed of imine and amine units. ITO/POT/Al devices were fabricated by thermal evaporation of aluminum circular contacts on films deposited on ITO-coated glass. The nonlinear current-voltage characteristics of these devices indicate a rectifying behavior. The diode parameters were calculated from I-V characteristics using the modified Shockley equation. The measured C-V and C-F characteristics are presented.

GLANCING ANGLE REACTIVE PULSED LASER DEPOSITION (GRPLD) FOR Bi2O3/Si HETEROSTRUCTURE

2013 ◽  
Vol 27 (16) ◽  
pp. 1350122 ◽  
Author(s):  
EVAN T. SALIM ◽  
MARWA S. AL WAZNY ◽  
MAKRAM A. FAKHRY
Keyword(s):  
Crystalline Silicon ◽  
Silicon Substrates ◽  
In Situ Oxidation ◽  
Current Voltage ◽  
Glancing Angle ◽  
Heterojunction Device ◽  
Oxide Particles ◽  
Current Voltage Characteristics ◽  
P Type

Thin films of micro bismuth oxide particles were successfully prepared by in situ oxidation of the laser ablated bismuth metal. (111) oriented p-type crystalline silicon substrates were used. The effects of substrate tiled angle on the characteristics of the prepared film were studied. Also, the performance of n- Bi 2 O 3/p- Si heterojunction device was investigated. The obtained current–voltage characteristics in dark and under illumination insure the dependence of the fabricated device characteristic on the deposition angle. The I–V characteristics show that all prepared devices are of abrupt type.

Electrical Characterization of Laser-Irradiated 4H-SiC Wafer

2002 ◽  
Vol 719 ◽  
Author(s):  
I. Salama ◽  
N. R Quick ◽  
A. Kar ◽  
Gilyong Chung
Keyword(s):  
Electronic Properties ◽  
Electrical Characterization ◽  
Electric Resistance ◽  
Current Voltage ◽  
Impurity Doping ◽  
Current Voltage Characteristics ◽  
P Type ◽  
Sic Wafer ◽  
Conventional Annealing

AbstractHighly conductive tracks are generated in low-doped epilayers on 4H-SiC wafers using a laserdirect write technique. The current-voltage characteristics are measured to study the effect of the applied voltage on the electric resistance and the surface contact of the irradiated tracks. The effect of multiple irradiations on the electronic properties of the fabricated tracks was investigated and compared with the effect of the conventional annealing process. A laser doping process was used to achieve n-type as well as p-type impurity doping in the substrate. The electronic properties of the doped tracks are measured and compared with those of the untreated wafers. Microstructural observation and surface analysis of the irradiated tracks are studied. Laser fabrication of rectifying contact on SiC substrates is demonstrated.

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