Heteroepitaxial Growth of In203 on Ysz (100) Single Crystal Surface
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ABSTRACTIn203 films were deposited on YSZ (001) single crystal surface at 800°C at an oxygen pressure of 14 Pa by pulsed laser deposition (PLD) method. A heteroepitaxial relationship between the film and the substrate was seen in TEM photographs and X-ray diffraction measurements. The w locking curve full width of half maximum (FWHM) of the In203 (004) x-ray diffraction was 0.06°. Film conductivities were ∼10 S/cm or less, while carriers on the order of lO18/cm3 were generated.
1997 ◽
Vol 12
(5)
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pp. 1297-1305
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2010 ◽
Vol 123-125
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pp. 375-378
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2001 ◽
Vol 16
(9)
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pp. 2467-2470
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Keyword(s):
2002 ◽
Vol 16
(01n02)
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pp. 173-180
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