scholarly journals High Mobility SiGe/Si n-MODFET Structures and Devices on Sapphire Substrates

2004 ◽  
Vol 809 ◽  
Author(s):  
Carl Mueller ◽  
Samuel Alterovitz ◽  
Edward Croke ◽  
George Ponchak

ABSTRACTSiGe/Si n-type modulation doped field effect structures and transistors (n-MODFETs) have been fabricated on r-plane sapphire substrates. Mobilities as high as 1380 cm2/Vs were measured at room temperature. Excellent carrier confinement was shown by Shubnikov-de Haas measurements. Atomic force microscopy indicated smooth surfaces, with rms roughness less than 4 nm, similar to the quality of SiGe/Si n-MODFET structures made on Si substrates. Transistors with 2 μm gate lengths and 200 μm gate widths were fabricated and tested. An IDS of 9 mA was obtained by operating the transistor in an enhancement mode (positive VGS) and the maximum transconductance (gm) was 37 mS/mm at a VDS of 2.5 V. The transducer gain (Gt) measured with a loadpull system was 6.4 dB at 1 GHz for a VDS of 2.5 V and VGS=-0.4 V.

2006 ◽  
Vol 20 (02) ◽  
pp. 217-231 ◽  
Author(s):  
MUHAMMAD MAQBOOL ◽  
TAHIRZEB KHAN

Thin films of pure silver were deposited on glass substrate by thermal evaporation process at room temperature. Surface characterization of the films was performed using X-ray diffraction (XRD) and atomic force microscopy (AFM). Thickness of the films varied between 20 nm and 72.8 nm. XRD analysis provided a sharp peak at 38.75° from silver. These results indicated that the films deposited on glass substrates at room temperature are crystalline. Three-dimension and top view pictures of the films were obtained by AFM to study the grain size and its dependency on various factors. Average grain size increased with the thickness of the deposited films. A minimum grain size of 8 nm was obtained for 20 nm thick films, reaching 41.9 nm when the film size reaches 60 nm. Grain size was calculated from the information provided by the XRD spectrum and averaging method. We could not find any sequential variation in the grain size with the growth rate.


1995 ◽  
Vol 10 (9) ◽  
pp. 2159-2161 ◽  
Author(s):  
J.H. Schneibel ◽  
L. Martínez

Fe–40 at. % Al–0.1 at. % B specimens were polished flat, strained at room temperature, and examined in an atomic force microscope. The angles of height contours perpendicular to the slip lines were interpreted as shear strains and were statistically evaluated. The frequency distributions of these shear strains correlated well with the macroscopic strains. The maximum shear strains found were not much larger than the macroscopic strains. In particular, no steep slip steps corresponding to large local shears were found.


2011 ◽  
Vol 1359 ◽  
Author(s):  
Mathieu Palosse ◽  
Elena Bedel-Pereira ◽  
François Olivié ◽  
Isabelle Séguy ◽  
Christina Villeneuve ◽  
...  

ABSTRACTThis paper describes first steps in preparation of an organic spin valve based on a perylene derivative (PTCTE) sandwiched between magnetite (Fe3O4) and cobalt (Co) ferromagnetic electrodes. MgO(001)/Fe3O4/PTCTE (450 nm)/Co devices were prepared with different Co soft deposition methods: off-axis dc-sputtering or Joule evaporation. Vibrating Sample Magnetometer (VSM) studies of the Fe3O4/PTCTE/Co stacks evidence spin valve behavior with magnetically uncoupled electrodes. These results are correlated with a morphological study by atomic force microscopy (AFM) of each layer and tunneling AFM (TUNA) for the investigation of inhomogeneity of current distribution in the devices. Finally, macroscopic I-V characteristics performed on the same devices will be presented and compared with TUNA results.


2012 ◽  
Vol 545 ◽  
pp. 290-293
Author(s):  
Maryam Amirhoseiny ◽  
Hassan Zainuriah ◽  
Ng Shashiong ◽  
Mohd Anas Ahmad

We have studied the effects of deposition conditions on the crystal structure of InN films deposited on Si substrate. InN thin films have been deposited on Si(100) substrates by reactive radio frequency (RF) magnetron sputtering method with pure In target at room temperature. The nitrogen gas pressure, applied RF power and the distance between target and substrate were 2×10-2 Torr, 60 W and 8 cm, respectively. The effects of the Ar–N2 sputtering gas mixture on the structural properties of the films were investigated by using scanning electron microscope, energy-dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction techniques.


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